Abstract: The present disclosure provides a fixed-position defect doping method for a micro-nanostructure based on a self-alignment process, including: S1, sequentially forming a sacrificial layer and a photoresist layer on a surface of a crystal substrate; S2, performing a lithography on the photoresist layer to form a mask hole according to a micro-nano pattern; S3, performing an isotropic etching on the sacrificial layer through the mask hole, and amplifying the micro-nano pattern to the sacrificial layer; S4, performing an ion implantation doping on an exposed crystal surface below the mask hole; S5, removing the photoresist layer, and depositing a mask material; S6, removing the sacrificial layer, and transferring a micro-nano amplified pattern in the sacrificial layer to a mask material pattern; and S7, etching an exposed crystal surface, and removing the mask material on the surface and forming a specific defect by annealing.

Abstract: An active resonance C-type buoyant flap wave energy converter includes a rigid frame, a flap, a mass center adjustment assembly and a power generation assembly. The rigid frame is connected to a marine facility, and includes a main body and a support shaft provided at a bottom thereof. The flap is swingingly arranged on the support shaft. The flap is located under water surface, and swings back and forth around the support shaft under an action of a wave. The mass center adjustment assembly is configured to adjust a mass center of the flap to make a natural period of the flap same as a wave period, so as to achieve a resonance between the flap and the wave. The power generation assembly is arranged on the support shaft and is located in the flap.

Abstract: An active resonance C-type buoyant flap wave energy converter includes a rigid frame, a flap, a mass center adjustment assembly and a power generation assembly. The rigid frame is connected to a marine facility, and includes a main body and a support shaft provided at a bottom thereof. The flap is swingingly arranged on the support shaft. The flap is located under water surface, and swings back and forth around the support shaft under an action of a wave. The mass center adjustment assembly is configured to adjust a mass center of the flap to make a natural period of the flap same as a wave period, so as to achieve a resonance between the flap and the wave. The power generation assembly is arranged on the support shaft and is located in the flap.