Patents by Inventor Xianyun Ma

Xianyun Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7679381
    Abstract: An evaluation apparatus is taught to nondestructively characterize the electroluminescence behavior of the semiconductor-based or organic small-molecule or polymer-based light-emitting material as the finished light-emitting device functions through electroluminescence. An electrode probe is used to temporarily form a light-emitting device through forming an intimate electrical contact to the surface of the light emitting material. A testing system is provided for applying an electrical stimulus to the electrode probe and temporarily formed device and for measuring the electrical and optical/electroluminescence response to the electrical stimulus. The electrical and optical properties of the light-emitting material can be nondestructively determined from the measured response.
    Type: Grant
    Filed: January 23, 2006
    Date of Patent: March 16, 2010
    Assignee: MaxMile Technologies, LLC
    Inventor: Xianyun Ma
  • Publication number: 20070170933
    Abstract: An evaluation apparatus is taught to nondestructively characterize the electroluminescence behavior of the semiconductor-based or organic small-molecule or polymer-based light-emitting material as the finished light-emitting device functions through electroluminescence. An electrode probe is used to temporarily form a light-emitting device through forming an intimate electrical contact to the surface of the light emitting material. A testing system is provided for applying an electrical stimulus to the electrode probe and temporarily formed device and for measuring the electrical and optical/electroluminescence response to the electrical stimulus. The electrical and optical properties of the light-emitting material can be nondestructively determined from the measured response.
    Type: Application
    Filed: January 23, 2006
    Publication date: July 26, 2007
    Applicant: MAXMILE TECHNOLOGIES, LLC
    Inventor: Xianyun Ma
  • Publication number: 20070170934
    Abstract: An evaluation apparatus is taught to nondestructively characterize the material that can be any type of any semiconductor or dielectric materials, or a coating or film deposit on the semiconductor wafer. An electrode probe is used to temporarily form a Schottky or metal oxide semiconductor (MOS) device through forming an intimate electrical contact to the surface of the material. A testing system is provided for applying an electrical stimulus to the temporarily formed device through the electrode probe, and for measuring the response to the electrical stimulus. Various properties of the material can be nondestructively determined from the measured response.
    Type: Application
    Filed: January 23, 2006
    Publication date: July 26, 2007
    Applicant: MAXMILE TECHNOLOGIES, LLC
    Inventor: Xianyun Ma
  • Patent number: 7220978
    Abstract: A system and method for detecting defects in semiconductor wafers in a rapid non-destructive manner. Defects in semiconductor wafers can include micropipes and screw dislocations, stress striations, planer defects, polytype inclusions, and others. When a wafer is illuminated by polarized light, the defects induce birefringence of the polarized light that can be visualized by a polariscope to detect defects in wafers. Defects can cause linearly inputted polarized light to emerge as elliptically polarized light after transmission through a wafer having defects. Placing the wafer between a set of polarizers under the cross poles condition allows for a rapid non-destructive system and method for delineating and locating defects within a semiconductor wafer.
    Type: Grant
    Filed: April 15, 2003
    Date of Patent: May 22, 2007
    Assignee: The University of South Carolina
    Inventors: Xianyun Ma, Tangali S. Sudarshan
  • Publication number: 20040206891
    Abstract: A system and method for detecting defects in semiconductor wafers in a rapid non-destructive manner. Defects in semiconductor wafers can include micropipes and screw dislocations, stress striations, planer defects, polytype inclusions, and others. When a wafer is illuminated by polarized light, the defects induce birefringence of the polarized light that can be visualized by a polariscope to detect defects in wafers. Defects can cause linearly inputted polarized light to emerge as elliptically polarized light after transmission through a wafer having defects. Placing the wafer between a set of polarizers under the cross poles condition allows for a rapid non-destructive system and method for delineating and locating defects within a semiconductor wafer.
    Type: Application
    Filed: April 15, 2003
    Publication date: October 21, 2004
    Inventors: Xianyun Ma, Tangali S. Sudarshan
  • Patent number: 5973492
    Abstract: An improved magneto optical current transducer for measuring electrical current is taught that significantly reduces birefringence resulting from thermal transients and construction-induced stresses. The transducer includes a housing made of a material that readily transfers heat throughout itself. Inside the housing and surrounding the magneto optical material is a buffer made of a material that does not readily tranfer heat from the housing to the magneto optical material, but rather slows its transference to that material material. The buffer material has a thermal expansion coefficient that is preferably very close to that of the magneto optical material, so that when the magneto optical material responds to changes in its temperature by expanding or contracting, the buffer expands with it at very nearly the same rate to avoid stresses.
    Type: Grant
    Filed: April 16, 1997
    Date of Patent: October 26, 1999
    Inventor: Xianyun Ma