Abstract: A write pole of a write head of a hard disk drive can be manufactured by forming a photoresist layer over a magnetic material layer located over a substrate, disposing a tri-tone lithographic mask over the photoresist layer, lithographically exposing the photoresist layer through the lithographic mask, developing the photoresist layer to form a patterned photoresist layer, and patterning the magnetic material layer into the write pole by removing portions of the magnetic material layer that are not covered by the photoresist layer. The tri-tone lithographic mask includes a patterned opaque material layer and a patterned partially-transparent material layer located over a transparent substrate. The patterned opaque material layer includes a uniform width region and a flare region. The patterned partially-transparent material layer includes a pair of partially-transparent strips extending adjacent to a respective edge of the patterned opaque material layer, and partially-transparent assist bars.

Abstract: The present invention discloses a multi-bar warp knitted fabric and a knitting method thereof. The fabric comprises a ground weave and at least one group of elastic yarns, wherein each group of elastic yarns is composed of two elastic yarns, characterized in that the two elastic yarns of each group are inlaid in opposite directions on at least 90% of the loops in one same wale of the ground weave. The fabric has excellent characteristics, including: in addition to maintaining the soft and comfortable hand feel and general physical properties of the fabric, the elastic yarns are not easy to wash out and fly out, and the fabric can be used with a lower finished density, thereby reducing production costs.

Abstract: The present invention discloses a multi-bar warp knitted fabric and a knitting method thereof. The fabric comprises a ground weave, a pattern weave and at least one group of elastic yarns, wherein each group of elastic yarns is composed of two elastic yarns, characterized in that the two elastic yarns of each group are inlaid in opposite directions on at least 90% of the loops in one same wale of the ground weave. The fabric has excellent characteristics, including: in addition to maintaining the soft and comfortable hand feel and general physical properties of the fabric, the elastic yarns are not easy to wash out and fly out, and the fabric can be used with a lower finished density, thereby reducing production costs.

Abstract: A method and system provide microelectric devices on fields on a substrate. Each field includes at least one microelectric device having a critical device feature and remaining device feature(s) distal from the critical device feature. The method and system include providing a photoresist layer for fabricating the microelectric devices and exposing the photoresist layer using a dark field mask. The dark field mask is for defining a critical mask feature corresponding to the critical device feature and exposing a first portion of the fields. The first portion includes not more than five percent of each field. The method and system further include exposing the photoresist layer using a clear field mask. The clear field mask is for defining remaining mask feature(s) corresponding to the remaining device feature(s). The clear field mask exposes a second portion of the fields that is different from the first portion.

Abstract: A method and system provide microelectric devices on fields on a substrate. Each field includes at least one microelectric device having a critical device feature and remaining device feature(s) distal from the critical device feature. The method and system include providing a photoresist layer for fabricating the microelectric devices and exposing the photoresist layer using a dark field mask. The dark field mask is for defining a critical mask feature corresponding to the critical device feature and exposing a first portion of the fields. The first portion includes not more than five percent of each field. The method and system further include exposing the photoresist layer using a clear field mask. The clear field mask is for defining remaining mask feature(s) corresponding to the remaining device feature(s). The clear field mask exposes a second portion of the fields that is different from the first portion.

Abstract: Various embodiments of the subject disclosure provide a double patterning process that uses two patterning steps to produce a write structure having a nose shape with sharp corners. In one embodiment, a method for forming a write structure on a multi-layer structure comprising a substrate and an insulator layer on the substrate is provided. The method comprises forming a hard mask layer over the insulator layer, performing a first patterning process to form a pole and yoke opening in the hard mask layer, performing a second patterning process to remove rounded corners of the pole and yoke opening in the hard mask layer, removing a portion of the insulator layer corresponding to the pole and yoke opening in the hard mask layer to form a trench in the insulator layer, and filling the trench with a magnetic material.

Abstract: DUV lithography process that eliminates post exposure baking of a photoresist. Thick photoresist may be processed to obtain enhanced sidewall profiles for microelectronic devices.

Abstract: System and methods are provided for the manufacture of a magnetic write head including a pole and yoke region, and a nose shape transition region connecting the yoke to the pole having very small minimum radius of curvature, providing for a sharp transition. A double mask technique is used providing for the adjustment of an offset and illumination conditions between the first and second mask, which provides the capability of tuning the shape of the transition region, and achieving features that would otherwise not be achievable due to distortions caused by optical proximity effect.

Abstract: A method and system provide a magnetic transducer having an air-bearing surface (ABS) location, a pole and a gap. The pole has a bottom and a top wider than the bottom. The gap is on the top of the pole and at least as wide as the top of the pole such that an overhang is formed between a top edge of the gap and a bottom edge of the bottom of the pole. The method includes providing a plurality of bottom antireflective coatings (BARCs). The plurality of BARCs form a BARC layer that fills the overhang. A shield photoresist mask is provided on at least a portion of the BARC layer. The shield, which includes at least one side shield, is provided.

Abstract: A method for fabricating a side shield for a magnetic transducer is described. The magnetic transducer has a nonmagnetic layer and a pole on the nonmagnetic layer. The pole has sidewalls and an air-bearing surface location (ABS location) corresponding to an air-bearing surface (ABS). A developable bottom antireflective coating (D-BARC) layer covering the pole and at least a portion of the nonmagnetic layer is provided. The D-BARC layer is photosensitive. A photosensitive mask layer is provided on the D-BARC layer. A first portion of the mask layer and a first portion of the D-BARC layer are removed to form a bi-layer mask. The bi-layer mask has an aperture in the mask layer and the D-BARC layer. At least one side shield layer is deposited. At least a portion of the at least one side shield layer resides in the aperture. The bi-layer mask is also removed.

Abstract: A process is provided for etching a mask layer and removal of residue from a structure having an area sheltered from directional etching. The structure has a shape that forms a silhouette area obstructed from being etched by anisotropic bombardment originating from a first direction, and a mask formed over the mask layer over the structure; A first etch process removes at least a part of the mask layer and retains at least a part of mask layer in the sheltered area. A second etch process removes at least a part of the mask layer in the sheltered area by hydrogen based microwave plasma etching.

Abstract: Methods of patterning a material are disclosed. A first resist pattern is formed on a field. A protective layer is formed over the first resist pattern and at least a portion of the field. A second resist pattern is formed over a portion of the protective layer. A portion of a material to be patterned deposited adjacent to the first and second resist patterns is removed.

Abstract: A method for fabricating a magnetic transducer is described. The magnetic transducer includes a pole having a pole tip and a flared region. The method Includes providing a first mask layer on the pole and providing a second mask layer on the first mask layer. The first mask layer is soluble in a predetermined solution and has a first thickness. The second mask layer has a second thickness greater than the first thickness. The method also includes forming a mask from the first mask layer and the second mask layer. The step of forming the mask layer includes using the predetermined solution. The mask has a pattern that exposes a portion of the pole tip and covers a portion of the flared region. The method also includes providing a wrap-around shield on at least the pole tip.

Abstract: A method for fabricating a magnetic transducer having a nonmagnetic intermediate layer is described. A pole is provided on the intermediate layer. The pole has sides, a bottom, a top wider than the bottom and a leading bevel proximate to an ABS location. A side gap is provided adjacent to at least the sides of the pole. A bottom antireflective coating (BARC) layer is provided on the intermediate layer. The BARC layer is removable using a wet etchant and is adjacent to at least a portion of the side gap. A mask layer is provided on the BARC layer. A pattern is photolithographically transferred into the mask layer, forming a shield mask. Part of the BARC layer is exposed to the wet etchant such that the sides of the pole and the side gap are free of the BARC layer. At least a magnetic side shield is provided.

Abstract: A method and system for exposing a plurality of fields on a substrate. The substrate has a center and an edge. The fields include a plurality of rows. The method and system include determining an exposure sequence for the plurality of fields. Each of the plurality of fields has a distance from the center and a placement in the exposure sequence. The placement of a field in the exposure sequence is based on the distance and excludes placing each of the plurality of fields in a row of the plurality of rows next to an adjacent field in the row in combination with placing each of the plurality of rows next to an adjacent row. The method and system also include exposing the plurality of fields in the exposure sequence in order of the placement.

Abstract: Various embodiments of the subject disclosure provide a double patterning process that uses two patterning steps to produce a write structure having a nose shape with sharp corners. In one embodiment, a method for forming a write structure on a multi-layer structure comprising a substrate and an insulator layer on the substrate is provided. The method comprises forming a hard mask layer over the insulator layer, performing a first patterning process to form a pole and yoke opening in the hard mask layer, performing a second patterning process to remove rounded corners of the pole and yoke opening in the hard mask layer, removing a portion of the insulator layer corresponding to the pole and yoke opening in the hard mask layer to form a trench in the insulator layer, and filling the trench with a magnetic material.

Abstract: An optical mask for providing a pattern for portion of an electronic device, such as a magnetic recording transducer, is disclosed. The optical mask includes a device feature and at least one detached correction feature. The device feature includes a corner corresponding to a device corner of the pattern. The device corner has an angle of greater than zero degrees and less than one hundred eighty degrees. The at least one detached correction feature resides in proximity to but is physically separated from the corner. Each of the at least one detached correction feature is sub-resolution.

Abstract: A method and system for providing a microelectric device, such as a magnetoresistive read sensor are described. The method and system include providing a mask layer on the microelectric device. The method and system further include exposing the mask layer to provide a mask. A portion of the mask covers a portion of the microelectric device. The step of exposing the mask layer further includes utilizing a chromeless alt-phase shift mask for providing the portion of the mask.

Abstract: A method and system for fabricating a magnetic recording device are described. The method and system include providing a mask layer on the magnetic recording device and imprinting a pattern in the mask layer to form a mask. The method and system also include transferring the pattern from the mask to the magnetic recording device. In another aspect, the method and system include providing a malleable mask layer on the magnetic recording device. In this aspect, the method and system also include depressing an imprint mask into the mask layer and curing the mask layer while the imprint mask is depressed into the mask layer to provide a mask having a pattern. The pattern may correspond to a read sensor and/or a perpendicular magnetic recording pole. The method and system also include transferring the pattern from the mask to the magnetic recording device.