Abstract: A large-space high-temperature and high-pressure true triaxial flexible loading device includes a cylinder reaction frame, which includes a cylinder, a lower shear ring, an upper shear ring, a bottom cover, and a top cover, wherein the bottom cover and the top cover are detachably mounted at a bottom and a top inside the cylinder respectively, and an interior of the cylinder is divided to form a loading space for performing a triaxial test on a square test block; the lower shear ring is detachably embedded on an inner wall of the cylinder below the bottom cover; the upper shear ring is detachably embedded on the inner wall of the cylinder above the top cover; a confining pressure reaction frame, mounted in the loading space around the square test block; and, flexible loading mechanisms, disposed in pairs at two opposed side surfaces of the square test block.

Abstract: Nanocomposite ceramic or glass materials are disclosed herein, which include a matrix material and one or more nanostructures dispersed within the matrix material. The nanostructures may comprise one or more core-shell nanostructures including a core nanostructure and a shell material. The shell material may be different from the material making up the core nanostructure and may improve the wettability of the core-shell nanostructure, the dispersion of the core-shell nanostructure within the matrix material, or make the core-shell nanostructure more resistant to oxidation, when compared to the core nanostructure alone. Methods of making nanocomposite ceramic or glass materials are also disclosed herein.

Abstract: Systems and methods for detecting defects on a reticle are provided. One system is configured for generating different stacked difference images for multiple instances of first patterned areas in different rows on a wafer based on images generated for the first patterned areas in the different rows. The system is also configured for performing double detection based on the different stacked difference images. The system then identifies defects on the reticle based on the defects detected by the double detection. As described further herein, the systems and methods detect defects from multiple reticle rows printed on a wafer, which can reduce noise and enable detection of substantially small repeater defects. The embodiments are particularly useful for high sensitivity repeater defect detection for extreme ultraviolet (EUV) reticles and multi-die reticles (MDR).

Abstract: Methods and systems for detecting defects on a specimen are provided. One system computes different candidate reference images from different combinations of images of the specimen generated by an inspection subsystem and combines different portions of the candidate reference images without modification to thereby generate a final reference image. The final reference image is then used for defect detection, which may be single or double detection. The embodiments are particularly useful for defect detection in areas of specimens including only non-resolvable, repeating device patterns, like cell regions, but may be used for inspection of other types of areas as well.

Abstract: A rendered image is generated from a semiconductor device design file. The rendered image is segmented based on a grey level of the rendered image. Care areas are determined based on the segmenting. Defect inspection is performed in the care areas. This process can be performed on a wafer inspection tool that uses photon optics or electron beam optics.

Abstract: Methods and systems for detecting defects on a specimen are provided. One system computes different candidate reference images from different combinations of images of the specimen generated by an inspection subsystem and combines different portions of the candidate reference images without modification to thereby generate a final reference image. The final reference image is then used for defect detection, which may be single or double detection. The embodiments are particularly useful for defect detection in areas of specimens including only non-resolvable, repeating device patterns, like cell regions, but may be used for inspection of other types of areas as well.

Abstract: Methods and systems for detecting defects in an array region on a specimen are provided. One system includes an inspection subsystem configured for generating output responsive to patterned features formed in an array region on a specimen. The system also includes a computer subsystem configured for determining if a pitch of the patterned features in the output is an integer of pixels in a detector of the inspection subsystem that generated the output. When the pitch is not an integer of the pixels, the computer subsystem is configured for interpolating the output to generate interpolated output having a modified pitch of the patterned features in the interpolated output that is an integer of the pixels. The computer subsystem is also configured for detecting defects in the array region by applying a defect detection method to the interpolated output.

Abstract: Disclosures herein are directed to antibodies and epitope binding agents that specifically bind to the extracellular domain of Patched-1 and compositions thereof for use in clinical and non-clinical applications. Also provided are methods to treat and/or prevent Hedgehog pathway related disorders.

Abstract: Provided herein is a method of producing an oxide-dispersion strengthened (ODS) alloy that includes providing a master alloy powder comprising a metal or metal alloy and particles of a metal oxide; adding the master alloy powder to a molten diluent alloy to form an oxide-dispersion strengthened (ODS) alloy; and allowing the ODS to solidify. The molten diluent alloy includes a molten metal or metal alloy, and a wetting-enhancing metal is added to the molten diluent alloy either prior to, during, or after adding of the master alloy to the molten diluent alloy. The wetting-enhancing alloy reduces an interfacial energy and vdW attraction between the particles of the metal oxide and the molten alloy diluent to achieve a stable nanoparticulate ODS solid.

Abstract: Methods and systems for determining information for a specimen are provided. One system includes a model configured for generating a rendered image for an alignment target on a specimen from information for a design of the alignment target. The rendered image is a simulation of images of the alignment target on the specimen generated by an imaging subsystem. The system also includes a computer subsystem configured for modifying parameter(s) of the model based on variation in parameter(s) of the imaging subsystem and/or variation in process condition(s) used to fabricate the specimen. Subsequent to the modifying, the computer subsystem is configured for 10 generating an additional rendered image for the alignment target by inputting the information for the design of the alignment target into the model and aligning the additional rendered image to an image of the alignment target generated by the imaging subsystem.

Abstract: Systems and methods for detecting defects on a reticle are provided. One system is configured for generating different stacked difference images for multiple instances of first patterned areas in different rows on a wafer based on images generated for the first patterned areas in the different rows. The system is also configured for performing double detection based on the different stacked difference images. The system then identifies defects on the reticle based on the defects detected by the double detection. As described further herein, the systems and methods detect defects from multiple reticle rows printed on a wafer, which can reduce noise and enable detection of substantially small repeater defects. The embodiments are particularly useful for high sensitivity repeater defect detection for extreme ultraviolet (EUV) reticles and multi-die reticles (MDR).

Abstract: Methods and systems for deep learning alignment for semiconductor applications are provided. One method includes transforming design information for an alignment target on a specimen to a predicted image of the alignment target by inputting the design information into a deep learning model and aligning the predicted image to an image of the alignment target on the specimen generated by an imaging subsystem. The method also includes determining an offset between the predicted image and the image generated by the imaging subsystem based on results of the aligning and storing the determined offset as an align-to-design offset for use in a process performed on the specimen with the imaging subsystem.

Abstract: Methods and systems for detecting defects on a specimen are provided. One system performs double detection in which at least one of the reference images compared to a test image is a computed reference image generated from multiple images corresponding to the test image. The other reference image may or may not be computed from more than one of the multiple images. Such a computed reference image may also be a median-based computed reference generated from multiple-median images generated from different subsets of images in a job of images generated by an inspection subsystem for a specimen. Such a system may also group images for a die row on a specimen into different jobs based on color so that different jobs have different color value ranges. Such grouping may also be performed so that each of the jobs includes a number of images greater than a predetermined, minimum job size.

Abstract: The present disclosure provides a modified montmorillonite self-repairing agent and a preparation method and use thereof, and belongs to the technical field of cement repairing materials. Montmorillonite is mixed with water, such that water is fully adsorbed between montmorillonite layers. The structure of montmorillonite is modified by supercritical CO2 treatment at a temperature of 50-60° C. and a pressure of 8-12 MPa, and the self-repairing efficiency of cement is improved by adding the modified montmorillonite into cement. Supercritical CO2 is adsorbed by montmorillonite, such that the montmorillonite is activated and an interlayer distance is increased to improve the repairing efficiency. When a crack is formed in cement, the adsorbed supercritical CO2 in montmorillonite is released into the crack and combined with positive ions to generate carbonate deposition, such that the crack is sealed and the self-repairing activity of the cement is improved.

Abstract: Provided herein are compositions, methods and kits for targeting Cystinosin protein. These compositions, methods and kits may be used for detecting and quantifying Cystinosin in clinical and non-clinical samples.

Abstract: An error information processing method includes, in response to a memory error triggering an interrupt, collecting error information of the memory error that includes a first memory area where the memory error occurs, obtaining a second memory area for writing log information, determining whether the second memory area contains the first memory area, and, in response to determining that the second memory area contains the first memory area, skipping a process of writing the log information into the second memory area.

Abstract: Global and local alignment energies are used in an image contrast metric. The image contrast metric can be used to find optical targets. Some pixels from a gradient magnitude image and a context range image from an optical image can be used to determine the image contrast metric. A heatmap from the image contrast metrics across part of a wafer can then be used to make a list of targets. Upper and lower confidence values can be applied to rank the available targets.