Abstract: Disclosed are an optical anti-counterfeiting element and an optical anti-counterfeiting product utilizing the same, the optical anti-counterfeiting element comprising: a substrate (12) including a first surface and a second surface opposite to each other; micro-sampling tools (11) on the first surface; and one or more micro graphic and text units formed on the second surface, wherein the micro graphic and text unit includes micro graphic and text strokes, the micro graphic and text strokes are arranged in a non-periodic and non-fixed-geometry manner, and when the second surface is observed through the micro-sampling tools, a stereoscopic animated anti-counterfeiting feature can be seen.

Abstract: Disclosed are an unblocking apparatus for a furnace discharging pipe and a use method. The unblocking apparatus includes a rail, a rail car that may move along the rail, an unblocking drive mechanism arranged on the rail car, a heat-unblocking component, a cold-unblocking component, and a material receiving component that is used to receive a blocking material in the discharging pipe, and a drive end of the unblocking drive mechanism is detachably connected with one end of the heat-unblocking component and the cold-unblocking component respectively. The present application effectively handles different blockage situations of the furnace discharging pipe by connecting the unblocking drive mechanism with an unblocking rod capable of heat-unblocking and a drilling rod capable of cold-unblocking, thereby two modes of heat-unblocking and cold-unblocking are performed on the furnace discharging pipe; and the discharging pipe may be unblocked by a remote operation.

Abstract: Provided are an optical anti-counterfeiting element and a product thereof, the optical anti-counterfeiting element includes: a substrate; a reflective curved mirror array, located on a surface of the substrate; and a micro graphic-text array, formed on the reflective curved mirror array, the micro graphic-text array and the reflective curved mirror array are located in a same plane and are overlapped without an interval, and after the reflective curved mirror array samples to synthesize the micro graphic-text array with a coupling effect with the same, a dynamic effect is formed.

Abstract: An illuminant estimation method, including acquiring two image frames, wherein a distance between the two image frames is greater than a predetermined distance; detecting shadows included in the two image frames, extracting pixel feature points corresponding to the shadows, determining point cloud information about the shadows, and distinguishing a point cloud of each shadow based on the point cloud information about the shadows; acquiring point cloud information about multiple objects, and distinguishing a point cloud of each object based on the point cloud information corresponding to the multiple objects; matching the point cloud of the each shadow and the point cloud of the each object in order to determine corresponding shadows associated with the multiple objects; and determining a position of an illuminant according to a positional relation between the multiple objects and the corresponding shadows.

Abstract: The present invention discloses a novel method of preparing 8-methyldecanal, a flavor and fragrance material. Specifically, starting from cheap and readily available material 6-chloro-1-hexanol, first, the hydroxyl group was protected with dihydropyran catalyzed by para-toluene sulfonic acid to produce 6-chloro-hexyl tetrahydropyran ether. Then 6-chloro-hexyl tetrahydropyran ether reacted with magnesium turnings to form a Grignard reagent and reacted with 1-bromo-2-methyl-butane under the catalysis of cuprous bromide to give the intermediate 8-methyl-sunny tetrahydropyran ether. Without purification, crude 8-methyl-sunny tetrahydropyran ether was treated under acidic conditions to remove the protecting group to generate 8-methyl-1-decyl alcohol. Finally, 8-methyl decanal was obtained after oxidation with 2, 2, 6, 6-tetramethylpiperidinyloxy.

Abstract: The present invention discloses a novel method of preparing 8-methyldecanal, a flavor and fragrance material. Specifically, starting from cheap and readily available material 6-chloro-1-hexanol, first, the hydroxyl group was protected with dihydropyran catalyzed by para-toluene sulfonic acid to produce 6-chloro-hexyl tetrahydropyran ether. Then 6-chloro-hexyl tetrahydropyran ether reacted with magnesium turnings to form a Grignard reagent and reacted with 1-bromo-2-methyl-butane under the catalysis of cuprous bromide to give the intermediate 8-methyl-sunny tetrahydropyran ether. Without purification, crude 8-methyl-sunny tetrahydropyran ether was treated under acidic conditions to remove the protecting group to generate 8-methyl-1-decyl alcohol. Finally, 8-methyl decanal was obtained after oxidation with 2, 2, 6, 6-tetramethylpiperidinyloxy.

Abstract: A defect detection system for an extreme ultraviolet lithography mask comprises an extreme ultraviolet light source (1), extreme ultraviolet light transmission parts (2, 3), an extreme ultraviolet lithography mask (4), a photon sieve (6) and a collection (7) and analysis (8) system. Point light source beams emitted by the extreme ultraviolet light source (1) are focused on the extreme ultraviolet lithography mask (4) through the extreme ultraviolet light transmission parts (2, 3); the extreme ultraviolet lithography mask (4) emits scattered light and illuminates the photon sieve (6); and the photon sieve (6) forms a dark field image and transmits the same to the collection (7) and analysis (8) system. The defect detection system for the extreme ultraviolet photolithographic mask uses the photon sieve to replace a Schwarzchild objective, thereby realizing lower cost, relatively small size and high resolution.

Abstract: A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition.

Abstract: A defect detection system for an extreme ultraviolet lithography mask comprises an extreme ultraviolet light source (1), extreme ultraviolet light transmission parts (2, 3), an extreme ultraviolet lithography mask (4), a photon sieve (6) and a collection (7) and analysis (8) system. Point light source beams emitted by the extreme ultraviolet light source (1) are focused on the extreme ultraviolet lithography mask (4) through the extreme ultraviolet light transmission parts (2, 3); the extreme ultraviolet lithography mask (4) emits scattered light and illuminates the photon sieve (6); and the photon sieve (6) forms a dark field image and transmits the same to the collection (7) and analysis (8) system. The defect detection system for the extreme ultraviolet photolithographic mask uses the photon sieve to replace a Schwarzchild objective, thereby realizing lower cost, relatively small size and high resolution.

Abstract: A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition.

Abstract: The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve.

Abstract: The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve.

Abstract: A method for testing anticorrosion performance of an aqueous protective fluid by immersing a testing electrode comprising a plurality of individual electrodes insulated from and spaced with respect to one another into an aqueous protective fluid; immersing a reference electrode into the aqueous protective fluid at a predetermined distance from the testing electrode; connecting an Ohmmeter sequentially between each of the individual electrodes and the reference electrode to measure a plurality of electrical resistances between each of the individual electrodes and the reference electrode whereby obtaining a distribution of resistances. The distribution of resistances defines the anticorrosion performance of the aqueous protective fluid.

Abstract: This relates to a direct testing method and apparatus for testing anticorrosion performance of aqueous protective fluids with a wire beam electrode sensor, wherein N electrodes pieces insulated from each other are assembled to form a working electrode whose working face functions as a detecting sensor, and is submerged for a predetermined time interval in aqueous protective fluids along with a reference electrode; a power source, a working electrode, aqueous protective fluids, and a reference electrode comprise a closed electric circuit for performing the resistance test; the anticorrosion performance of different aqueous protective fluids is compared by the measured distribution of resistances, wherein the larger the resistance of aqueous protective fluids, the better its anticorrosion ability.