Patents by Inventor Xiaoli Zhu

Xiaoli Zhu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11981157
    Abstract: Disclosed are an optical anti-counterfeiting element and an optical anti-counterfeiting product utilizing the same, the optical anti-counterfeiting element comprising: a substrate (12) including a first surface and a second surface opposite to each other; micro-sampling tools (11) on the first surface; and one or more micro graphic and text units formed on the second surface, wherein the micro graphic and text unit includes micro graphic and text strokes, the micro graphic and text strokes are arranged in a non-periodic and non-fixed-geometry manner, and when the second surface is observed through the micro-sampling tools, a stereoscopic animated anti-counterfeiting feature can be seen.
    Type: Grant
    Filed: February 10, 2021
    Date of Patent: May 14, 2024
    Assignees: ZHONGCHAO SPECIAL SECURITY TECHNOLOGY CO., LTD, CHINA BANKNOTE PRINTING AND MINTING CORP.
    Inventors: Kai Sun, Baoli Zhang, Jun Zhu, Xiaoli Wang
  • Publication number: 20240142175
    Abstract: Disclosed are an unblocking apparatus for a furnace discharging pipe and a use method. The unblocking apparatus includes a rail, a rail car that may move along the rail, an unblocking drive mechanism arranged on the rail car, a heat-unblocking component, a cold-unblocking component, and a material receiving component that is used to receive a blocking material in the discharging pipe, and a drive end of the unblocking drive mechanism is detachably connected with one end of the heat-unblocking component and the cold-unblocking component respectively. The present application effectively handles different blockage situations of the furnace discharging pipe by connecting the unblocking drive mechanism with an unblocking rod capable of heat-unblocking and a drilling rod capable of cold-unblocking, thereby two modes of heat-unblocking and cold-unblocking are performed on the furnace discharging pipe; and the discharging pipe may be unblocked by a remote operation.
    Type: Application
    Filed: October 23, 2023
    Publication date: May 2, 2024
    Applicants: China Nuclear Sichuan Environmental Protection Engineering Co., Ltd., China Building Materials Academy, China Nuclear Power Engineering Co., Ltd.
    Inventors: Weidong XU, Yu CHANG, Yongchang ZHU, Hong DUAN, Chunyu TIAN, Wei WU, Debo YANG, Qingbin ZHAO, Shuaizhen WU, Lin WANG, Zhu CUI, Heyi GUO, Maosong FAN, Yuancheng SUN, Jie MEI, Xiaoli AN, Yongxiang ZHAO, Qinda LIU
  • Publication number: 20240092114
    Abstract: Provided are an optical anti-counterfeiting element and a product thereof, the optical anti-counterfeiting element includes: a substrate; a reflective curved mirror array, located on a surface of the substrate; and a micro graphic-text array, formed on the reflective curved mirror array, the micro graphic-text array and the reflective curved mirror array are located in a same plane and are overlapped without an interval, and after the reflective curved mirror array samples to synthesize the micro graphic-text array with a coupling effect with the same, a dynamic effect is formed.
    Type: Application
    Filed: July 30, 2021
    Publication date: March 21, 2024
    Inventors: Haibo Cui, Baoli Zhang, Jun Zhu, Xiaoli Wang
  • Publication number: 20230334819
    Abstract: An illuminant estimation method, including acquiring two image frames, wherein a distance between the two image frames is greater than a predetermined distance; detecting shadows included in the two image frames, extracting pixel feature points corresponding to the shadows, determining point cloud information about the shadows, and distinguishing a point cloud of each shadow based on the point cloud information about the shadows; acquiring point cloud information about multiple objects, and distinguishing a point cloud of each object based on the point cloud information corresponding to the multiple objects; matching the point cloud of the each shadow and the point cloud of the each object in order to determine corresponding shadows associated with the multiple objects; and determining a position of an illuminant according to a positional relation between the multiple objects and the corresponding shadows.
    Type: Application
    Filed: June 22, 2023
    Publication date: October 19, 2023
    Applicant: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dongning HAO, Guotao SHEN, Xiaoli ZHU, Qiang HUANG, Longhai WU, Jie CHEN
  • Patent number: 11548846
    Abstract: The present invention discloses a novel method of preparing 8-methyldecanal, a flavor and fragrance material. Specifically, starting from cheap and readily available material 6-chloro-1-hexanol, first, the hydroxyl group was protected with dihydropyran catalyzed by para-toluene sulfonic acid to produce 6-chloro-hexyl tetrahydropyran ether. Then 6-chloro-hexyl tetrahydropyran ether reacted with magnesium turnings to form a Grignard reagent and reacted with 1-bromo-2-methyl-butane under the catalysis of cuprous bromide to give the intermediate 8-methyl-sunny tetrahydropyran ether. Without purification, crude 8-methyl-sunny tetrahydropyran ether was treated under acidic conditions to remove the protecting group to generate 8-methyl-1-decyl alcohol. Finally, 8-methyl decanal was obtained after oxidation with 2, 2, 6, 6-tetramethylpiperidinyloxy.
    Type: Grant
    Filed: January 5, 2022
    Date of Patent: January 10, 2023
    Inventors: Yafei Tan, Xinhao Dong, Hua Zheng, Guotai Lei, Xiaoli Zhu
  • Publication number: 20220127214
    Abstract: The present invention discloses a novel method of preparing 8-methyldecanal, a flavor and fragrance material. Specifically, starting from cheap and readily available material 6-chloro-1-hexanol, first, the hydroxyl group was protected with dihydropyran catalyzed by para-toluene sulfonic acid to produce 6-chloro-hexyl tetrahydropyran ether. Then 6-chloro-hexyl tetrahydropyran ether reacted with magnesium turnings to form a Grignard reagent and reacted with 1-bromo-2-methyl-butane under the catalysis of cuprous bromide to give the intermediate 8-methyl-sunny tetrahydropyran ether. Without purification, crude 8-methyl-sunny tetrahydropyran ether was treated under acidic conditions to remove the protecting group to generate 8-methyl-1-decyl alcohol. Finally, 8-methyl decanal was obtained after oxidation with 2, 2, 6, 6-tetramethylpiperidinyloxy.
    Type: Application
    Filed: January 5, 2022
    Publication date: April 28, 2022
    Inventors: Yafei TAN, Xinhao DONG, Hua ZHENG, Guotai LEI, Xiaoli ZHU
  • Patent number: 9546964
    Abstract: A defect detection system for an extreme ultraviolet lithography mask comprises an extreme ultraviolet light source (1), extreme ultraviolet light transmission parts (2, 3), an extreme ultraviolet lithography mask (4), a photon sieve (6) and a collection (7) and analysis (8) system. Point light source beams emitted by the extreme ultraviolet light source (1) are focused on the extreme ultraviolet lithography mask (4) through the extreme ultraviolet light transmission parts (2, 3); the extreme ultraviolet lithography mask (4) emits scattered light and illuminates the photon sieve (6); and the photon sieve (6) forms a dark field image and transmits the same to the collection (7) and analysis (8) system. The defect detection system for the extreme ultraviolet photolithographic mask uses the photon sieve to replace a Schwarzchild objective, thereby realizing lower cost, relatively small size and high resolution.
    Type: Grant
    Filed: April 16, 2012
    Date of Patent: January 17, 2017
    Assignee: THE INSTITUTE OF MICROELECTRONICS OF CHINESE ACADEMY OF SCIENCES
    Inventors: Hailiang Li, Changqing Xie, Ming Liu, Dongmei Li, Jiebin Niu, Lina Shi, Xiaoli Zhu
  • Patent number: 9442230
    Abstract: A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition.
    Type: Grant
    Filed: December 30, 2013
    Date of Patent: September 13, 2016
    Assignee: Institute of Microelectronics, Chinese Academy of Sciences
    Inventors: Hailiang Li, Changqing Xie, Ming Liu, Dongmei Li, Lina Shi, Xiaoli Zhu
  • Publication number: 20150104094
    Abstract: A defect detection system for an extreme ultraviolet lithography mask comprises an extreme ultraviolet light source (1), extreme ultraviolet light transmission parts (2, 3), an extreme ultraviolet lithography mask (4), a photon sieve (6) and a collection (7) and analysis (8) system. Point light source beams emitted by the extreme ultraviolet light source (1) are focused on the extreme ultraviolet lithography mask (4) through the extreme ultraviolet light transmission parts (2, 3); the extreme ultraviolet lithography mask (4) emits scattered light and illuminates the photon sieve (6); and the photon sieve (6) forms a dark field image and transmits the same to the collection (7) and analysis (8) system. The defect detection system for the extreme ultraviolet photolithographic mask uses the photon sieve to replace a Schwarzchild objective, thereby realizing lower cost, relatively small size and high resolution.
    Type: Application
    Filed: April 16, 2012
    Publication date: April 16, 2015
    Applicant: THE INSTITUTE OF MICROELECTRONICS OF CHINESE ACADEMY OF SCIENCES
    Inventors: Hailiang Li, Changqing Xie, Ming Liu, Dongmei Li, Jiebin Niu, Lina Shi, Xiaoli Zhu
  • Publication number: 20140177039
    Abstract: A method of manufacturing a sub-wavelength extreme ultraviolet metal transmission grating is disclosed. In one aspect, the method comprises forming a silicon nitride self-supporting film window on a back surface of a silicon-based substrate having both surfaces polished, then spin-coating a silicon nitride film on a front surface of the substrate with an electron beam resist HSQ. Then, performing electron beam direct writing exposure on the HSQ, developing and fixing to form a plurality of grating line patterns and a ring pattern surrounding the grating line patterns. Then depositing a chrome material on the front surface of the substrate through magnetron sputtering. Then, removing the chrome material inside the ring pattern. Then, growing a gold material on the front surface of the substrate through atomic layer deposition.
    Type: Application
    Filed: December 30, 2013
    Publication date: June 26, 2014
    Applicant: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
    Inventors: Hailiang Li, Changqing Xie, Ming Liu, Dongmei Li, Lina Shi, Xiaoli Zhu
  • Patent number: 8736812
    Abstract: The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve.
    Type: Grant
    Filed: August 16, 2011
    Date of Patent: May 27, 2014
    Assignee: Institute of Microelectronics, Chinese Academy of Sciences
    Inventors: Changqing Xie, Nan Gao, Yilei Hua, Xiaoli Zhu, Hailiang Li, Lina Shi, Dongmei Li, Ming Liu
  • Publication number: 20130044299
    Abstract: The present disclosure relates to the field of micro-nano fabrication, and provides a projection-type photolithography system using a composite photon sieve. The system comprises: a lighting system, a mask plate, a composite photon sieve and a substrate, which are arranged in order. The lighting system is adapted to generate incident light and irradiate the mask plate with the incident light. The mask plate is adapted to provide an object to be imaged by the composite photon sieve, and the incident light reaches the composite photon sieve after passing through the mask plate. The composite photon sieve is adapted to perform imaging, by which a pattern on the mask plate is imaged on the substrate. The substrate is adapted to receive an image of the pattern on the mask plate imaged by the composite photon sieve.
    Type: Application
    Filed: August 16, 2011
    Publication date: February 21, 2013
    Applicant: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
    Inventors: Changqing Xie, Nan Gao, Yilei Hua, Xiaoli Zhu, Hailiang Li, Lina Shi, Dongmei Li, Ming Liu
  • Patent number: 7619423
    Abstract: A method for testing anticorrosion performance of an aqueous protective fluid by immersing a testing electrode comprising a plurality of individual electrodes insulated from and spaced with respect to one another into an aqueous protective fluid; immersing a reference electrode into the aqueous protective fluid at a predetermined distance from the testing electrode; connecting an Ohmmeter sequentially between each of the individual electrodes and the reference electrode to measure a plurality of electrical resistances between each of the individual electrodes and the reference electrode whereby obtaining a distribution of resistances. The distribution of resistances defines the anticorrosion performance of the aqueous protective fluid.
    Type: Grant
    Filed: April 25, 2005
    Date of Patent: November 17, 2009
    Inventors: Diping Chen, Hao Jin, Jiucheng Jin, Zhendao Wang, Guifang Huang, Xiaoli Zhu
  • Publication number: 20070209429
    Abstract: This relates to a direct testing method and apparatus for testing anticorrosion performance of aqueous protective fluids with a wire beam electrode sensor, wherein N electrodes pieces insulated from each other are assembled to form a working electrode whose working face functions as a detecting sensor, and is submerged for a predetermined time interval in aqueous protective fluids along with a reference electrode; a power source, a working electrode, aqueous protective fluids, and a reference electrode comprise a closed electric circuit for performing the resistance test; the anticorrosion performance of different aqueous protective fluids is compared by the measured distribution of resistances, wherein the larger the resistance of aqueous protective fluids, the better its anticorrosion ability.
    Type: Application
    Filed: April 25, 2005
    Publication date: September 13, 2007
    Applicant: HUNAN UNIVERSITY
    Inventors: Diping Chen, Hao Jin, Jiucheng Jin, Zhendao Wang, Guifang Huang, Xiaoli Zhu