Patents by Inventor Xiaokang Shi
Xiaokang Shi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8495523Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: GrantFiled: June 25, 2012Date of Patent: July 23, 2013Assignee: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Patent number: 8495524Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: GrantFiled: June 25, 2012Date of Patent: July 23, 2013Assignee: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Patent number: 8473872Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: GrantFiled: June 25, 2012Date of Patent: June 25, 2013Assignee: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Patent number: 8458620Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: GrantFiled: June 25, 2012Date of Patent: June 4, 2013Assignee: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Patent number: 8453074Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: GrantFiled: June 25, 2012Date of Patent: May 28, 2013Assignee: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Publication number: 20120278769Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: ApplicationFiled: June 25, 2012Publication date: November 1, 2012Applicant: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Publication number: 20120266113Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: ApplicationFiled: June 25, 2012Publication date: October 18, 2012Applicant: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Publication number: 20120266112Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: ApplicationFiled: June 25, 2012Publication date: October 18, 2012Applicant: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Publication number: 20120266114Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: ApplicationFiled: June 25, 2012Publication date: October 18, 2012Applicant: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Publication number: 20120266111Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: ApplicationFiled: June 25, 2012Publication date: October 18, 2012Applicant: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Publication number: 20120260221Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: ApplicationFiled: June 25, 2012Publication date: October 11, 2012Applicant: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Patent number: 8245159Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: GrantFiled: August 5, 2009Date of Patent: August 14, 2012Assignee: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi
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Publication number: 20110035709Abstract: A mechanism is provided for optimizing a photolithograph mask. A given target pattern is received. An initial fictitious mask is generated from the given target pattern and an initial value of ?2 is selected where the initial value of ?2 is used to determine a light intensity and a wafer image. The light intensity for each pixel in the initial fictitious mask and the wafer image for each pixel in the initial fictitious mask are then determined. A determination is then made as to whether a convergence has been achieved by comparing the wafer image generated from the fictitious mask to the given target pattern. Responsive to a convergence of the wafer image generated from the fictitious mask to the given target pattern, a final mask is generated to use to transfer an image to a wafer.Type: ApplicationFiled: August 5, 2009Publication date: February 10, 2011Applicant: International Business Machines CorporationInventors: Ying Liu, Sani R. Nassif, Xiaokang Shi