Patents by Inventor XIAOLIANG ZHUANG

XIAOLIANG ZHUANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8992689
    Abstract: Methods for removing halogen-containing residues from a substrate are provided. By combining the heat-up and plasma abatement steps, the manufacturing throughput can be improved. Further, by appropriately controlling the pressure in the abatement chamber, the removal efficiency can be improved as well.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: March 31, 2015
    Assignee: Applied Materials, Inc.
    Inventors: Adauto Diaz, Andrew Nguyen, Benjamin Schwarz, Eu Jin Lim, Jared Ahmad Lee, James P. Cruse, Li Zhang, Scott M. Williams, Xiaoliang Zhuang, Zhuang Li
  • Patent number: 8845816
    Abstract: Methods for reducing the contamination of a gas distribution plate are provided. In one embodiment, a method for processing a substrate includes transferring the substrate into a chamber, performing a treating process on the substrate, and providing a purge gas into the chamber before or after the treating process to pump out a residue gas relative to the treating process from the chamber. The treating process includes distributing a reactant gas into the chamber through a gas distribution plate.
    Type: Grant
    Filed: February 29, 2012
    Date of Patent: September 30, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Adauto Diaz, Andrew Nguyen, Benjamin Schwarz, Eu Jin Lim, Jared Ahmad Lee, James P. Cruse, Li Zhang, Scott M. Williams, Xiaoliang Zhuang, Zhuang Li
  • Publication number: 20120222699
    Abstract: Methods for removing halogen-containing residues from a substrate are provided. By combining the heat-up and plasma abatement steps, the manufacturing throughput can be improved. Further, by appropriately controlling the pressure in the abatement chamber, the removal efficiency can be improved as well.
    Type: Application
    Filed: February 29, 2012
    Publication date: September 6, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Adauto Diaz, Andrew Nguyen, Benjamin Schwarz, Eu Jin Lim, Jared Ahmad Lee, James P. Cruse, Li Zhang, Scott M. Williams, Xiaoliang Zhuang, Zhuang Li
  • Publication number: 20120222752
    Abstract: Methods for reducing the contamination of a gas distribution plate are provided. In one embodiment, a method for processing a substrate includes transferring the substrate into a chamber, performing a treating process on the substrate, and providing a purge gas into the chamber before or after the treating process to pump out a residue gas relative to the treating process from the chamber. The treating process includes distributing a reactant gas into the chamber through a gas distribution plate.
    Type: Application
    Filed: February 29, 2012
    Publication date: September 6, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Adauto Diaz, Andrew Nguyen, Benjamin Schwarz, Eu Jin Lim, Jared Ahmad Lee, James P. Cruse, Li Zhang, Scott M. Williams, Xiaoliang Zhuang, Zhuang Li
  • Publication number: 20110304078
    Abstract: Methods for removing process byproducts from a load lock chamber are provided herein. In some embodiments, a method for removing process byproducts from a load lock chamber may include: performing a process on a substrate disposed within a process chamber; transferring the substrate from the process chamber to a load lock chamber; and providing an inert gas to the load lock chamber via at least one gas line while transferring the substrate from the process chamber to the load lock chamber to remove process byproducts from the load lock chamber.
    Type: Application
    Filed: January 27, 2011
    Publication date: December 15, 2011
    Applicant: APPLIED MATERIALS, INC.
    Inventors: JARED AHMAD LEE, BENJAMIN SCHWARZ, XIAOLIANG ZHUANG, EU JIN LIM, ADUATO DIAZ, JR., SCOTT M. WILLIAMS, ANDREW NGUYEN, JAMES P. CRUSE
  • Publication number: 20100076729
    Abstract: Methods and apparatus for predictive maintenance of semiconductor process equipment are provided herein. In some embodiments, a method of performing predictive maintenance on semiconductor processing equipment may include performing at least one self-diagnostic test on the semiconductor processing equipment with no substrate present in the equipment. The self-diagnostic test may include measuring one or more predictor parameters and one or more response parameters from the semiconductor process equipment. One or more expected response parameters may be calculated based upon the measured predictor parameters utilizing a predictive model. The one or more measured response parameters may be compared with the one or more expected response parameters. A determination may be made whether equipment maintenance is required based upon the comparison.
    Type: Application
    Filed: September 19, 2008
    Publication date: March 25, 2010
    Applicant: APPLIED MATERIALS, INC.
    Inventors: MATTHEW F. DAVIS, LEI LIAN, XIAOLIANG ZHUANG, QUENTIN E. WALKER