Abstract: A system for ultra-high temperature in-situ fretting fatigue experiment, includes a heat preservation cover defining a, a heating device arranged in the mounting space, a first test sample, a second test sample, and a clamping device arranged in the mounting space. The first test sample and the second test sample are arranged at an upper end of the heating device along a horizontal direction. A mortise is formed at an end of the first test sample facing towards the second test sample. A tenon mating with the mortise is formed at an end of the second test sample facing towards the first test sample. The clamping device is configured to be clamped at two ends of the mated first test sample and second test sample and to apply a periodically reciprocating loading along a length direction of the first test sample and the second test sample.

Abstract: A photovoltaic system with an inverter, at least one solar panel for providing electrical power, and electrical wiring for coupling electrical power from the at least one solar panel to the inverter. Also included is a transmitter for transmitting a messaging protocol along the electrical wiring, where the protocol includes a multibit wireline signal. Also included is circuitry for selectively connecting the electrical power from the at least one solar panel along the electrical wiring to the inverter in response to the messaging protocol.

Abstract: The present disclosure provides a magnetron sputtering equipment, including: a mesh shielding plate disposed in a vacuum chamber of the magnetron sputtering equipment; the vacuum chamber includes one or more coating chambers, and the mesh shielding plate is disposed on a sidewall within the coating chamber, which facilitates the smooth operation of the magnetron sputtering target, and avoids the gas pollution of the vacuum chamber, and the installation and disassembly are simple and fast. The present disclosure provides an important solution and approach for a production line of the magnetic sputtering equipment.

Abstract: Disclosed herein is a method for preparing coal-based, briquetted activated carbon. The method includes subjecting raw coal to a briquetting process, pulverizing the briquettes into particles, and performing carbonization and activation to obtain activated carbon. The briquetting process includes pulverizing raw coal to produce a feed, feeding the feed into a feed bin for degassing, adjusting the temperature and the water content of the feed in the feed bin, and feeding the feed in the feed bin into a briquetting apparatus for briquetting to form coal briquettes. The raw coal briquetting process of the preparation method is suited to a wide variety of coal, including non-caking coal. The preparation method yields a coal briquette product with a strength greater than 89% without any binder, which is beneficial to improve the strength and the like of activated carbon.

Abstract: Disclosed herein is a method for preparing coal-based, briquetted activated carbon. The method includes subjecting raw coal to a briquetting process, pulverizing the briquettes into particles, and performing carbonization and activation to obtain activated carbon. The briquetting process includes pulverizing raw coal to produce a feed, feeding the feed into a feed bin for degassing, adjusting the temperature and the water content of the feed in the feed bin, and feeding the feed in the feed bin into a briquetting apparatus for briquetting to form coal briquettes. The raw coal briquetting process of the preparation method is suited to a wide variety of coal, including non-caking coal. The preparation method yields a coal briquette product with a strength greater than 89% without any binder, which is beneficial to improve the strength and the like of activated carbon.

Abstract: The present invention provides a method of wet etching a silicon slice including a silicon substrate and a metal film layer thereon comprising steps of: performing lithographic process to the silicon slice forming a masked silicon slice comprising the silicon substrate and a partially masked metal film thereon; immersing the masked silicon slice into an etchant; rotating the masked silicon slice in the etchant; injecting high-purity nitrogen gas into the etchant for agitating the etchant; removing the masked silicon slice out of the etchant, upon completion of etching; and rinsing the masked silicon slice with deionized water.

Abstract: The present invention provides a method of wet etching a silicon slice including a silicon substrate and a metal film layer thereon comprising steps of: performing lithographic process to the silicon slice forming a masked silicon slice comprising the silicon substrate and a partially masked metal film thereon; immersing the masked silicon slice into an etchant; rotating the masked silicon slice in the etchant; injecting high-purity nitrogen gas into the etchant for agitating the etchant; removing the masked silicon slice out of the etchant, upon completion of etching; and rinsing the masked silicon slice with deionized water.