Patents by Inventor Xiaolin Han

Xiaolin Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210225624
    Abstract: The present disclosure provides a magnetron sputtering equipment, including: a mesh shielding plate disposed in a vacuum chamber of the magnetron sputtering equipment; the vacuum chamber includes one or more coating chambers, and the mesh shielding plate is disposed on a sidewall within the coating chamber, which facilitates the smooth operation of the magnetron sputtering target, and avoids the gas pollution of the vacuum chamber, and the installation and disassembly are simple and fast. The present disclosure provides an important solution and approach for a production line of the magnetic sputtering equipment.
    Type: Application
    Filed: September 13, 2018
    Publication date: July 22, 2021
    Applicant: Miasolé Equipment Integration (Fujian) Co., Ltd.
    Inventors: Yang Liu, Zhennan Wang, Shaowen Lei, Yonglei Yang, Dongwei Jian, Wei Zhang, Ying Wu, Fushan Liu, Xiaolin Han
  • Patent number: 10773962
    Abstract: Disclosed herein is a method for preparing coal-based, briquetted activated carbon. The method includes subjecting raw coal to a briquetting process, pulverizing the briquettes into particles, and performing carbonization and activation to obtain activated carbon. The briquetting process includes pulverizing raw coal to produce a feed, feeding the feed into a feed bin for degassing, adjusting the temperature and the water content of the feed in the feed bin, and feeding the feed in the feed bin into a briquetting apparatus for briquetting to form coal briquettes. The raw coal briquetting process of the preparation method is suited to a wide variety of coal, including non-caking coal. The preparation method yields a coal briquette product with a strength greater than 89% without any binder, which is beneficial to improve the strength and the like of activated carbon.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: September 15, 2020
    Assignees: CHINA ENERGY INVESTMENT CORPORATION LIMITED, SHENHUA XINJIANG ENERGY CO, LTD.
    Inventors: Jianqiang Chen, Xintian Xu, Long Zhao, Hongqiang Wang, Xiaolin Han, Xiaodong Lu, Tao Qi, Wei Zhuang, Jin Li, Liangliang Wu, Jianrui Li, Cheng Wang
  • Publication number: 20190119119
    Abstract: Disclosed herein is a method for preparing coal-based, briquetted activated carbon. The method includes subjecting raw coal to a briquetting process, pulverizing the briquettes into particles, and performing carbonization and activation to obtain activated carbon. The briquetting process includes pulverizing raw coal to produce a feed, feeding the feed into a feed bin for degassing, adjusting the temperature and the water content of the feed in the feed bin, and feeding the feed in the feed bin into a briquetting apparatus for briquetting to form coal briquettes. The raw coal briquetting process of the preparation method is suited to a wide variety of coal, including non-caking coal. The preparation method yields a coal briquette product with a strength greater than 89% without any binder, which is beneficial to improve the strength and the like of activated carbon.
    Type: Application
    Filed: January 26, 2017
    Publication date: April 25, 2019
    Inventors: Jianqiang CHEN, Xintian XU, Long ZHAO, Hongqiang WANG, Xiaolin HAN, Xiaodong LU, Tao QI, Wei ZHUANG, Jin LI, Liangliang WU, Jianrui LI, Cheng WANG
  • Patent number: 8425718
    Abstract: The present invention provides a method of wet etching a silicon slice including a silicon substrate and a metal film layer thereon comprising steps of: performing lithographic process to the silicon slice forming a masked silicon slice comprising the silicon substrate and a partially masked metal film thereon; immersing the masked silicon slice into an etchant; rotating the masked silicon slice in the etchant; injecting high-purity nitrogen gas into the etchant for agitating the etchant; removing the masked silicon slice out of the etchant, upon completion of etching; and rinsing the masked silicon slice with deionized water.
    Type: Grant
    Filed: March 15, 2010
    Date of Patent: April 23, 2013
    Assignee: University of Electronic Science and Technology of China
    Inventors: Yadong Jiang, Zhiming Wu, Tao Wang, Weizhi Li, Xiaolin Han
  • Publication number: 20110223771
    Abstract: The present invention provides a method of wet etching a silicon slice including a silicon substrate and a metal film layer thereon comprising steps of: performing lithographic process to the silicon slice forming a masked silicon slice comprising the silicon substrate and a partially masked metal film thereon; immersing the masked silicon slice into an etchant; rotating the masked silicon slice in the etchant; injecting high-purity nitrogen gas into the etchant for agitating the etchant; removing the masked silicon slice out of the etchant, upon completion of etching; and rinsing the masked silicon slice with deionized water.
    Type: Application
    Filed: March 15, 2010
    Publication date: September 15, 2011
    Inventors: Yadong Jiang, Zhiming Wu, Tao Wang, Weizhi Li, Xiaolin Han