Patents by Inventor Xiao-Meng Liu

Xiao-Meng Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CVD apparatus
    Patent number: 6663714
    Abstract: The present invention is to provide a CVD apparatus having a high productivity, involving less contamination on the back surface of a substrate and having a high yield. A CVD apparatus for forming a thin film is characterized in that the interior of the vessel is divided into a upper portion and a lower portion (transfer chamber) by a support member for holding the ring chuck and the upper portion is further divide by inner wall into a deposition chamber and an exhaust chamber in axial symmetry around the same central axis. The deposition chamber communicated to the exhaust chamber through a gap between the inner wall and the ring chuck and/or holes provided in the inner wall. The transfer chamber is communicated to the deposition chamber or exhaust chamber through a gap formed between the ring chuck and the support member.
    Type: Grant
    Filed: May 17, 2001
    Date of Patent: December 16, 2003
    Assignee: Anelva Corporation
    Inventors: Shigeru Mizuno, Hiroshi Doi, Seiji Itani, Xiao-Meng Liu
  • CVD apparatus
    Publication number: 20010042514
    Abstract: The present invention is to provide a CVD apparatus having a high productivity, involving less contamination on the back surface of a substrate and having a high yield.
    Type: Application
    Filed: May 17, 2001
    Publication date: November 22, 2001
    Inventors: Shigeru Mizuno, Hiroshi Doi, Seiji Itani, Xiao-Meng Liu