Abstract: Disclosed herein are low viscosity and low stress dental compositions comprising at least one low stress polymerizable resin and at least one filler. The dental compositions described herein have high depth of cure and self-leveling characteristics and are capable of bulk application.

Abstract: A composition of macrocyclic oligomer with at least one (meth)acrylate polymerizable group. A method includes preparing an activated precursor of an oligomer at pseudo high-dilution conditions. A method also includes preparing an activated precursor of an oligomer by reacting the precursor with an activated coupling agent, wherein the precursor is condensable and polymerizable.

Abstract: Dental compositions and dental products having a resin derived from a cyclic diol such as 2,2,4,4-tetramethyl-1,3-cyclobutandiol.

Abstract: A photopolymerizable and photocleavable (P&P) resin monomer is derived from a reactive photoresponsible moiety via various linkages to form photopolymerizable monomers and/or oligomers.

Abstract: A composition of macrocyclic oligomer with at least one polymerizable group, (meth)acrylate, for example.

Abstract: A composition of macrocyclic oligomer with at least one (meth)acrylate polymerizable group. A method includes preparing an activated precursor of an oligomer at pseudo high-dilution conditions. A method also includes preparing an activated precursor of an oligomer by reacting the precursor with an activated coupling agent, wherein the precursor is condensable and polymerizable.

Abstract: A photopolymerizable and photocleavable (P&P) resin monomer is derived from a reactive photoresponsible moiety via various linkages to form photopolymerizable monomers and/or oligomers.

Abstract: A composition of macrocyclic oligomer with at least one polymerizable group, (meth)acrylate, for example.

Abstract: A composition of macrocyclic oligomer with at least one (meth)acrylate polymerizable group. A method includes preparing an activated precursor of an oligomer at pseudo high-dilution conditions. A method also includes preparing an activated precursor of an oligomer by reacting the precursor with an activated coupling agent, wherein the precursor is condensable and polymerizable.

Abstract: A photopolymerization accelerator composition improving color stability and controlling polymerization shrinkage stress of cured resin and/or the resulting composite paste thereby feature by tertiary twisted biphenyldiamine with the general formula I: R2 and R3 are each independently alkyl having from 1 to 5 carbon atoms; R and R1 are each independently hydrogen or halogen; alkyl alkoxy, or alkylthio having from 1 to 18 carbon atoms; or phenyl and/or substituted phenyl alkoxy, or alkylthio having from 1 to 18 carbon atoms. It can be used in part with conventional photosensitizers and radically polymerizable monomers.

Abstract: A composition of macrocyclic oligomer with at least one (meth)acrylate polymerizable group. A method includes preparing an activated precursor of an oligomer at pseudo high-dilution conditions. A method also includes preparing an activated precursor of an oligomer by reacting the precursor with an activated coupling agent, wherein the precursor is condensable and polymerizable.

Abstract: A composition of macrocyclic oligomer with at least one polymerizable group, (meth)acrylate, for example.

Abstract: A photopolymerizable and photocleavable (P&P) resin monomer is derived from a reactive photoresponsible moiety via various linkages to form photopolymerizable monomers and/or oligomers.

Abstract: A photopolymerizable and photocleavable (P&P) resin monomer is derived from a reactive photoresponsible moiety via various linkages to form photopolymerizable monomers and/or oligomers.

Abstract: A composition of macrocyclic oligomer with at least one polymerizable group, (meth)acrylate, for example.

Abstract: A composition of macrocyclic oligomer with at least one polymerizable group, (meth)acrylate, for example.

Abstract: A photopolymerizable material is exposed to light to effect curing. A portion of the material is exposed to light in a conventional manner, while at least one other portion of the material is masked from direct exposure to the light by use of a mask (10) having at least one mask segment (11) which either completely or at least partially blocks the light. In this manner, the polymerization stress associated with the cured materials is limited or minimized due to extended molecular relaxation promoted by this controlled or hybrid curing technique. Also according to the invention, different segments (30, 31) of a material to be cured (22) are exposed to different wavelengths of light energy (21) or one such segment (30, 31) is exposed to light energy while another such segment is not.

Abstract: A photopolymerizable material is exposed to light to effect curing. A portion of the material is exposed to light in a conventional manner, while at least one other portion of the material is masked from direct exposure to the light by use of a mask (10) having at least one mask segment (11) which either completely or at least partially blocks the light. In this manner, the polymerization stress associated with the cured materials is limited or minimized due to extended molecular relaxation promoted by this controlled or hybrid curing technique. Also according to the invention, different segments (30, 31) of a material to be cured (22) are exposed to different wavelengths of light energy (21) or one such segment (30, 31) is exposed to light energy while another such segment is not.