Patents by Inventor Xiaoming Lu

Xiaoming Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220143867
    Abstract: The present invention relates to a powder dry-pressing molding device and method.
    Type: Application
    Filed: May 8, 2020
    Publication date: May 12, 2022
    Applicants: QINGDAO UNIVERSITY OF TECHNOLOGY, SHENYANG HONGYANG PRECISION CERAMICS CO., LTD.
    Inventors: Changhe LI, Mingcun SHI, Xiangyang MA, Baoda XING, Xiaohong MA, Yanbin ZHANG, Min YANG, Xin CUI, Teng GAO, Xiaoming WANG, Yali HOU, Han ZHAI, Zhen WANG, Bingheng LU, Huajun CAO, Naiqing ZHANG, Qidong WU
  • Publication number: 20220128901
    Abstract: A system and method of shaping a film with a template on a substrate. Generating a first series of parameters from tests performed on a first series of films formed with: a set of shaping conditions; a calibration measurement parameter determined for each substrate prior to shaping; and a first scaling parameter. Generating a second series of parameters from the tests performed on a second series of films produced formed with the set of shaping conditions. The second series of films produced with the calibration measurement parameter determined for each substrate; and a second scaling parameter; or without the calibration measurement parameter. Generating a scaling parameter from: the first series of the parameters; and the second series of parameters. Generating the calibration measurement parameter prior to forming the film. Forming the film using the set of shaping conditions, the calibration measurement parameter, and the scaling parameter.
    Type: Application
    Filed: October 28, 2020
    Publication date: April 28, 2022
    Inventors: Nilabh K. Roy, Mario Johannes Meissl, Xiaoming Lu
  • Publication number: 20220102156
    Abstract: A planarization apparatus, including a chuck having a first surface and a second surface at two opposing sides thereof. The chuck includes a first zone extending along a periphery of the chuck, a second zone at an inner portion of the chuck, the second zone being surrounded by the first zone; and a flexure connecting the first zone with the second zone. The first zone includes a first member extending along the first surface from the flexure and a first ring land protruding from the first member adjacent to the flexure.
    Type: Application
    Filed: September 28, 2020
    Publication date: March 31, 2022
    Inventor: Xiaoming Lu
  • Patent number: 11161280
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: November 2, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Patent number: 10654216
    Abstract: An imprint lithography system that pressurizes and depressurizes an air cavity behind a retained imprint template or substrate so as to deflect the template or substrate to aid in filling the template pattern with fluid resist and/or separating the template from the cured resist on the substrate. The system includes a controller, pressure sensors, and an impedance valve for modulating the air cavity pressure so as to reduce pressure wave oscillations within the cavity that otherwise negatively impact overlay accuracy control, fluid spread control and separation control.
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: May 19, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Xiaoming Lu, Philip D. Schumaker, Byung-Jin Choi
  • Patent number: 10597840
    Abstract: A hot-melt anchor head which belongs to technical field of fixed-foundation buildings. Hot-melt anchor head includes anchor ring provided with through hole, guide wire, electrical hot-melt member arranged on anchor ring, clamp piece arranged in through hole to clamp anchor cable reinforcement, and strain gauge connected to guide wire arranged on surface of anchor ring, wherein bottom of anchor ring is provided with bearing plate; which is provided with opening opposite to through hole, and anchor ring is made of metal material; and surface of anchor ring is formed with coating layer by injection moulding with hot-melt material, strain gauge is coated by coating layer and is in close contact with surface of anchor ring to be integrally formed, an end, close to bearing plate, of anchor ring extends inwards and is provided with flange, and flange is used for holding part, located inside through hole, of coating layer.
    Type: Grant
    Filed: May 31, 2017
    Date of Patent: March 24, 2020
    Assignee: SUZHOU NG. FOUNDATION ENGINEERING CO., LTD.
    Inventors: Jianming Zhou, Huiju Fan, Mingxiang Du, Xiaoming Lu
  • Patent number: 10444624
    Abstract: A thermal frame of an imprinting apparatus has an motor and a cooling element. A metrology frame of the imprinting apparatus is coupled to an output end of the motor and receives an imprinting mold. Thermal isolation is provided between the motor and the metrology frame. Thermal sensors are disposed at locations of the frames. A digital controller applies a control signal for controlling a driving signal of the cooling element to maintain a thermal balance, such as thermal equilibrium, of heat flow between the frames. The digital controller uses output of the thermal sensors to identify transfer functions of heat flow used to calculate the control signal. The feedforward design avoids the very low control bandwidth that limits the performance of typical feedback designs.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: October 15, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Xiaoming Lu, Byung-Jin Choi, Steven Hartmann
  • Publication number: 20190301125
    Abstract: A hot-melt anchor head which belongs to technical field of fixed-foundation buildings. Hot-melt anchor head includes anchor ring provided with through hole, guide wire, electrical hot-melt member arranged on anchor ring, clamp piece arranged in through hole to clamp anchor cable reinforcement, and strain gauge connected to guide wire arranged on surface of anchor ring, wherein bottom of anchor ring is provided with bearing plate; which is provided with opening opposite to through hole, and anchor ring is made of metal material; and surface of anchor ring is formed with coating layer by injection moulding with hot-melt material, strain gauge is coated by coating layer and is in close contact with surface of anchor ring to be integrally formed, an end, close to bearing plate, of anchor ring extends inwards and is provided with flange, and flange is used for holding part, located inside through hole, of coating layer.
    Type: Application
    Filed: May 31, 2017
    Publication date: October 3, 2019
    Applicant: SUZHOU NG. FOUNDATION ENGINEERING CO., LTD.
    Inventors: Jianming ZHOU, Huiju FAN, Mingxiang DU, Xiaoming LU
  • Patent number: 10409178
    Abstract: An imprint lithography alignment method includes assessing a first alignment error between the template and the substrate, generating a first input signal corresponding to a first relative motion between the template and the substrate, initiating the first relative motion between the template and the substrate via the first input signal, assessing an output signal corresponding to the first relative motion, comparing the first input signal and the output signal to yield a motion control action corresponding to a second relative motion between the template and the substrate, generating a second input signal corresponding to the second relative motion between the template and the substrate, initiating the second relative motion between the template and the substrate via the second input signal, and assessing a second alignment error between the template and the substrate, wherein a magnitude of the first alignment error exceeds a magnitude of the second alignment error.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: September 10, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Xiaoming Lu, Byung-Jin Choi
  • Publication number: 20190232533
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: January 31, 2019
    Publication date: August 1, 2019
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Patent number: 10335984
    Abstract: Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.
    Type: Grant
    Filed: April 7, 2015
    Date of Patent: July 2, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Byung-jin Choi, Anshuman Cherala, Zhengmao Ye, Xiaoming Lu, Kang Luo, Nobuto Kawahara, Yoshikazu Miyajima
  • Publication number: 20190187575
    Abstract: An imprint lithography alignment method includes assessing a first alignment error between the template and the substrate, generating a first input signal corresponding to a first relative motion between the template and the substrate, initiating the first relative motion between the template and the substrate via the first input signal, assessing an output signal corresponding to the first relative motion, comparing the first input signal and the output signal to yield a motion control action corresponding to a second relative motion between the template and the substrate, generating a second input signal corresponding to the second relative motion between the template and the substrate, initiating the second relative motion between the template and the substrate via the second input signal, and assessing a second alignment error between the template and the substrate, wherein a magnitude of the first alignment error exceeds a magnitude of the second alignment error.
    Type: Application
    Filed: December 18, 2017
    Publication date: June 20, 2019
    Inventors: Xiaoming Lu, Byung-Jin Choi
  • Patent number: 10248018
    Abstract: The present invention provides an imprint apparatus which molds an imprint material on a shot region formed on a substrate by using a mold including a pattern surface on which a pattern is formed, comprising a holding unit configured to change a position and orientation of the mold, and a control unit configured to cause the holding unit to incline the mold, and bring the mold and the imprint material into contact with each other while the mold is inclined, wherein after the control unit obtains a shift amount by which a mark on the mold shifts by inclining the mold, and changes relative positions of the mold and the substrate according to the shift amount, the control unit brings the mold and the imprint material into contact with each other.
    Type: Grant
    Filed: March 30, 2015
    Date of Patent: April 2, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Philip D. Schumaker, Xiaoming Lu, Wei Zhang, Atsushi Kimura, Jun Ota
  • Patent number: 10199244
    Abstract: An imprint apparatus includes a substrate holder including a plurality of chucking regions for chucking a substrate, and a controller that controls chucking forces of the chucking regions. The chucking regions include a first chucking region for chucking a periphery of a first substrate having a first diameter, a second chucking region for chucking a periphery of a second substrate having a second diameter larger than the first diameter, a third chucking region group divided into a plurality of regions inside the first chucking region, and a fourth chucking region group divided into a plurality of regions between the first chucking region and the second chucking region. The controller controls the chucking forces of each of the chucking regions.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: February 5, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Nobuto Kawahara, Yoshikazu Miyajima, Zhengmao Ye, Anshuman Cherala, Byung-Jin Choi, Xiaoming Lu, Kang Luo
  • Patent number: 9996147
    Abstract: The invention discloses a high temperature and high humidity testing device and a high temperature and high humidity testing system. The high temperature and high humidity testing device comprises: a test platform composed of a work area and a non-work area, the work area is used for carrying a under-test portion of a display panel, and the non-work area is used for carrying a non-test portion of the display panel; and a sealing cover arranged above the work area, wherein the sealing cover and the test platform jointly form a sealed chamber in the work area, the test platform is provided with a gas guide through groove in the work area, and the gas guide through groove is used for delivering high temperature and high humidity gas to the sealed chamber.
    Type: Grant
    Filed: March 24, 2016
    Date of Patent: June 12, 2018
    Assignees: BOE TECHNOLOGY GROUP CO., LTD., HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Yan Jiang, Xianzhen Tang, Xiaoming Lu, Dan Li, Xiaowei Gong, Chiyoung Kim
  • Publication number: 20170282439
    Abstract: An imprint lithography system that pressurizes and depressurizes an air cavity behind a retained imprint template or substrate so as to deflect the template or substrate to aid in filling the template pattern with fluid resist and/or separating the template from the cured resist on the substrate. The system includes a controller, pressure sensors, and an impedance valve for modulating the air cavity pressure so as to reduce pressure wave oscillations within the cavity that otherwise negatively impact overlay accuracy control, fluid spread control and separation control.
    Type: Application
    Filed: March 30, 2016
    Publication date: October 5, 2017
    Inventors: XIAOMING LU, PHILIP D. SCHUMAKER, BYUNG-JIN CHOI
  • Publication number: 20170047234
    Abstract: An imprint apparatus includes a substrate holder including a plurality of chucking regions for chucking a substrate, and a controller that controls chucking forces of the chucking regions. The chucking regions include a first chucking region for chucking a periphery of a first substrate having a first diameter, a second chucking region for chucking a periphery of a second substrate having a second diameter larger than the first diameter, a third chucking region group divided into a plurality of regions inside the first chucking region, and a fourth chucking region group divided into a plurality of regions between the first chucking region and the second chucking region. The controller controls the chucking forces of each of the chucking regions.
    Type: Application
    Filed: August 11, 2015
    Publication date: February 16, 2017
    Inventors: Nobuto Kawahara, Yoshikazu Miyajima, Zhengmao Ye, Anshuman Cherala, Byung-Jin Choi, Xiaoming Lu, Kang Luo
  • Publication number: 20170028598
    Abstract: Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.
    Type: Application
    Filed: April 7, 2015
    Publication date: February 2, 2017
    Inventors: Byung-jin Choi, Anshuman Cherala, Zhengmao Ye, Xiaoming Lu, Kang Luo, Nobuto Kawahara, Yoshikazu Miyajima
  • Publication number: 20160299055
    Abstract: The invention discloses a high temperature and high humidity testing device and a high temperature and high humidity testing system. The high temperature and high humidity testing device comprises: a test platform composed of a work area and a non-work area, the work area is used for carrying a under-test portion of a display panel, and the non-work area is used for carrying a non-test portion of the display panel; and a sealing cover arranged above the work area, wherein the sealing cover and the test platform jointly form a sealed chamber in the work area, the test platform is provided with a gas guide through groove in the work area, and the gas guide through groove is used for delivering high temperature and high humidity gas to the sealed chamber.
    Type: Application
    Filed: March 24, 2016
    Publication date: October 13, 2016
    Inventors: Yan JIANG, Xianzhen TANG, Xiaoming LU, Dan LI, Xiaowei GONG, Chiyoung KIM
  • Publication number: 20160288403
    Abstract: The present invention provides an imprint apparatus which molds an imprint material on a shot region formed on a substrate by using a mold including a pattern surface on which a pattern is formed, comprising a holding unit configured to change a position and orientation of the mold, and a control unit configured to cause the holding unit to incline the mold, and bring the mold and the imprint material into contact with each other while the mold is inclined, wherein after the control unit obtains a shift amount by which a mark on the mold shifts by inclining the mold, and changes relative positions of the mold and the substrate according to the shift amount, the control unit brings the mold and the imprint material into contact with each other.
    Type: Application
    Filed: March 30, 2015
    Publication date: October 6, 2016
    Inventors: Philip D. Schumaker, Xiaoming Lu, Wei Zhang, Atsushi Kimura, Jun Ota