Abstract: The present invention relates to a powder dry-pressing molding device and method.

Abstract: A system and method of shaping a film with a template on a substrate. Generating a first series of parameters from tests performed on a first series of films formed with: a set of shaping conditions; a calibration measurement parameter determined for each substrate prior to shaping; and a first scaling parameter. Generating a second series of parameters from the tests performed on a second series of films produced formed with the set of shaping conditions. The second series of films produced with the calibration measurement parameter determined for each substrate; and a second scaling parameter; or without the calibration measurement parameter. Generating a scaling parameter from: the first series of the parameters; and the second series of parameters. Generating the calibration measurement parameter prior to forming the film. Forming the film using the set of shaping conditions, the calibration measurement parameter, and the scaling parameter.

Abstract: A planarization apparatus, including a chuck having a first surface and a second surface at two opposing sides thereof. The chuck includes a first zone extending along a periphery of the chuck, a second zone at an inner portion of the chuck, the second zone being surrounded by the first zone; and a flexure connecting the first zone with the second zone. The first zone includes a first member extending along the first surface from the flexure and a first ring land protruding from the first member adjacent to the flexure.

Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.

Abstract: An imprint lithography system that pressurizes and depressurizes an air cavity behind a retained imprint template or substrate so as to deflect the template or substrate to aid in filling the template pattern with fluid resist and/or separating the template from the cured resist on the substrate. The system includes a controller, pressure sensors, and an impedance valve for modulating the air cavity pressure so as to reduce pressure wave oscillations within the cavity that otherwise negatively impact overlay accuracy control, fluid spread control and separation control.

Abstract: A hot-melt anchor head which belongs to technical field of fixed-foundation buildings. Hot-melt anchor head includes anchor ring provided with through hole, guide wire, electrical hot-melt member arranged on anchor ring, clamp piece arranged in through hole to clamp anchor cable reinforcement, and strain gauge connected to guide wire arranged on surface of anchor ring, wherein bottom of anchor ring is provided with bearing plate; which is provided with opening opposite to through hole, and anchor ring is made of metal material; and surface of anchor ring is formed with coating layer by injection moulding with hot-melt material, strain gauge is coated by coating layer and is in close contact with surface of anchor ring to be integrally formed, an end, close to bearing plate, of anchor ring extends inwards and is provided with flange, and flange is used for holding part, located inside through hole, of coating layer.

Abstract: A thermal frame of an imprinting apparatus has an motor and a cooling element. A metrology frame of the imprinting apparatus is coupled to an output end of the motor and receives an imprinting mold. Thermal isolation is provided between the motor and the metrology frame. Thermal sensors are disposed at locations of the frames. A digital controller applies a control signal for controlling a driving signal of the cooling element to maintain a thermal balance, such as thermal equilibrium, of heat flow between the frames. The digital controller uses output of the thermal sensors to identify transfer functions of heat flow used to calculate the control signal. The feedforward design avoids the very low control bandwidth that limits the performance of typical feedback designs.

Abstract: A hot-melt anchor head which belongs to technical field of fixed-foundation buildings. Hot-melt anchor head includes anchor ring provided with through hole, guide wire, electrical hot-melt member arranged on anchor ring, clamp piece arranged in through hole to clamp anchor cable reinforcement, and strain gauge connected to guide wire arranged on surface of anchor ring, wherein bottom of anchor ring is provided with bearing plate; which is provided with opening opposite to through hole, and anchor ring is made of metal material; and surface of anchor ring is formed with coating layer by injection moulding with hot-melt material, strain gauge is coated by coating layer and is in close contact with surface of anchor ring to be integrally formed, an end, close to bearing plate, of anchor ring extends inwards and is provided with flange, and flange is used for holding part, located inside through hole, of coating layer.

Abstract: An imprint lithography alignment method includes assessing a first alignment error between the template and the substrate, generating a first input signal corresponding to a first relative motion between the template and the substrate, initiating the first relative motion between the template and the substrate via the first input signal, assessing an output signal corresponding to the first relative motion, comparing the first input signal and the output signal to yield a motion control action corresponding to a second relative motion between the template and the substrate, generating a second input signal corresponding to the second relative motion between the template and the substrate, initiating the second relative motion between the template and the substrate via the second input signal, and assessing a second alignment error between the template and the substrate, wherein a magnitude of the first alignment error exceeds a magnitude of the second alignment error.

Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.

Abstract: Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.

Abstract: An imprint lithography alignment method includes assessing a first alignment error between the template and the substrate, generating a first input signal corresponding to a first relative motion between the template and the substrate, initiating the first relative motion between the template and the substrate via the first input signal, assessing an output signal corresponding to the first relative motion, comparing the first input signal and the output signal to yield a motion control action corresponding to a second relative motion between the template and the substrate, generating a second input signal corresponding to the second relative motion between the template and the substrate, initiating the second relative motion between the template and the substrate via the second input signal, and assessing a second alignment error between the template and the substrate, wherein a magnitude of the first alignment error exceeds a magnitude of the second alignment error.

Abstract: The present invention provides an imprint apparatus which molds an imprint material on a shot region formed on a substrate by using a mold including a pattern surface on which a pattern is formed, comprising a holding unit configured to change a position and orientation of the mold, and a control unit configured to cause the holding unit to incline the mold, and bring the mold and the imprint material into contact with each other while the mold is inclined, wherein after the control unit obtains a shift amount by which a mark on the mold shifts by inclining the mold, and changes relative positions of the mold and the substrate according to the shift amount, the control unit brings the mold and the imprint material into contact with each other.

Abstract: An imprint apparatus includes a substrate holder including a plurality of chucking regions for chucking a substrate, and a controller that controls chucking forces of the chucking regions. The chucking regions include a first chucking region for chucking a periphery of a first substrate having a first diameter, a second chucking region for chucking a periphery of a second substrate having a second diameter larger than the first diameter, a third chucking region group divided into a plurality of regions inside the first chucking region, and a fourth chucking region group divided into a plurality of regions between the first chucking region and the second chucking region. The controller controls the chucking forces of each of the chucking regions.

Abstract: The invention discloses a high temperature and high humidity testing device and a high temperature and high humidity testing system. The high temperature and high humidity testing device comprises: a test platform composed of a work area and a non-work area, the work area is used for carrying a under-test portion of a display panel, and the non-work area is used for carrying a non-test portion of the display panel; and a sealing cover arranged above the work area, wherein the sealing cover and the test platform jointly form a sealed chamber in the work area, the test platform is provided with a gas guide through groove in the work area, and the gas guide through groove is used for delivering high temperature and high humidity gas to the sealed chamber.

Abstract: An imprint lithography system that pressurizes and depressurizes an air cavity behind a retained imprint template or substrate so as to deflect the template or substrate to aid in filling the template pattern with fluid resist and/or separating the template from the cured resist on the substrate. The system includes a controller, pressure sensors, and an impedance valve for modulating the air cavity pressure so as to reduce pressure wave oscillations within the cavity that otherwise negatively impact overlay accuracy control, fluid spread control and separation control.

Abstract: An imprint apparatus includes a substrate holder including a plurality of chucking regions for chucking a substrate, and a controller that controls chucking forces of the chucking regions. The chucking regions include a first chucking region for chucking a periphery of a first substrate having a first diameter, a second chucking region for chucking a periphery of a second substrate having a second diameter larger than the first diameter, a third chucking region group divided into a plurality of regions inside the first chucking region, and a fourth chucking region group divided into a plurality of regions between the first chucking region and the second chucking region. The controller controls the chucking forces of each of the chucking regions.

Abstract: Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.

Abstract: The invention discloses a high temperature and high humidity testing device and a high temperature and high humidity testing system. The high temperature and high humidity testing device comprises: a test platform composed of a work area and a non-work area, the work area is used for carrying a under-test portion of a display panel, and the non-work area is used for carrying a non-test portion of the display panel; and a sealing cover arranged above the work area, wherein the sealing cover and the test platform jointly form a sealed chamber in the work area, the test platform is provided with a gas guide through groove in the work area, and the gas guide through groove is used for delivering high temperature and high humidity gas to the sealed chamber.

Abstract: The present invention provides an imprint apparatus which molds an imprint material on a shot region formed on a substrate by using a mold including a pattern surface on which a pattern is formed, comprising a holding unit configured to change a position and orientation of the mold, and a control unit configured to cause the holding unit to incline the mold, and bring the mold and the imprint material into contact with each other while the mold is inclined, wherein after the control unit obtains a shift amount by which a mark on the mold shifts by inclining the mold, and changes relative positions of the mold and the substrate according to the shift amount, the control unit brings the mold and the imprint material into contact with each other.