Patents by Inventor Xiaoming Lu

Xiaoming Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11938653
    Abstract: The present invention relates to a powder dry-pressing molding device and method.
    Type: Grant
    Filed: May 8, 2020
    Date of Patent: March 26, 2024
    Assignees: QINGDAO UNIVERSITY OF TECHNOLOGY, SHENYANG HONGYANG PRECISION CERAMICS CO., LTD.
    Inventors: Changhe Li, Mingcun Shi, Xiangyang Ma, Baoda Xing, Xiaohong Ma, Yanbin Zhang, Min Yang, Xin Cui, Teng Gao, Xiaoming Wang, Yali Hou, Han Zhai, Zhen Wang, Bingheng Lu, Huajun Cao, Naiqing Zhang, Qidong Wu
  • Patent number: 11869813
    Abstract: A method of real time leveling control between a superstrate and a substrate is provided. A contact force model indicating a relationship between a total contact force for planarization of a formable material between the superstrate and the substrate and a force component of the total contact force along each of a plurality peripheral axes is identified. A set point force required for performing the planarization is determined. Each force component is calculated based on the contact force model. The planarization is performed by applying each force component along a corresponding axis of the plurality of axes. The contact force model is identified based on a parallel condition between two contacting surfaces of a superstrate chuck for retaining the superstrate and a stack of the superstrate, the substrate, and formable material between the superstrate and the substrate.
    Type: Grant
    Filed: December 15, 2020
    Date of Patent: January 9, 2024
    Assignee: Canon Kabushiki Kaisha
    Inventor: Xiaoming Lu
  • Patent number: 11823963
    Abstract: A method of real time leveling control between a superstrate and a substrate is provided. A contact force model indicating a relationship between a total contact force for planarization of a formable material between the superstrate and the substrate and a force component of the total contact force along each of a plurality peripheral axes is identified. A set point force required for performing the planarization is determined. Each force component is calculated based on the contact force model. The planarization is performed by applying each force component along a corresponding axis of the plurality of axes. The contact force model is identified based on a parallel condition between two contacting surfaces of a superstrate chuck for retaining the superstrate and a stack of the superstrate, the substrate, and formable material between the superstrate and the substrate.
    Type: Grant
    Filed: December 15, 2020
    Date of Patent: November 21, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventor: Xiaoming Lu
  • Publication number: 20230320367
    Abstract: Disclosed is a method for reducing the usage amount of edible fat and oil in a bakery product, the method comprising mixing at least one maltose alpha-amylase and edible fat and oil into dough, and baking same to prepare a bakery product. The usage amount of the edible fat and oil in the dough can be reduced by at least 10 wt % compared with not using the enzyme treatment; and the enzyme may also include cellulase and/or phospholipase. The method does not reduce or substantially reduce the quality of the bakery product, and allows same to have a shelf life of at least 4 days. Also involved is baked fat and oil prepared from the above-mentioned enzyme and edible fat and oil.
    Type: Application
    Filed: April 28, 2021
    Publication date: October 12, 2023
    Applicant: Novozymes A/S
    Inventors: Qing Xu, Yazhen Wang, Shouhong Li, Xiaoming Lu
  • Publication number: 20230095200
    Abstract: A method of shaping a surface comprises dispensing formable material onto a substrate held by a substrate chuck, contacting a plate held by a plate chuck assembly with the formable material to form a film, curing the film to form a cured layer, initiating a separation front between the cured layer and the plate, tilting the plate chuck assembly and/or the substrate chuck in a direction away from the initial separation point, thereby propagating the separation front, applying a force to the plate chuck assembly and/or the substrate chuck away from the other while maintaining or increasing the tilt, until the separation front completely propagates around the cured layer, and continuing to apply the force, until the plate does not contact the cured layer. The plate chuck assembly includes a flexible portion with a central opening, and a cavity formed by the flexible portion. The plate is held by the flexible portion.
    Type: Application
    Filed: September 24, 2021
    Publication date: March 30, 2023
    Inventors: Seth J. Bamesberger, Byung-Jin Choi, Xiaoming Lu
  • Patent number: 11614693
    Abstract: A system and method for shaping a film on a partial field including determining an initial contact point. Receiving information about: a partial field of a substrate; and an edge of a patternable area of the substrate. Determining a chord that connects intersection vertices of the partial field and the edge. Determining coordinates of a bisecting line, wherein the bisecting line bisects the chord, and the bisecting line is orthogonal to the chord. Determining an initial contact point range on the bisecting line in which a template and formable material on the substrate contact each other. Contacting the formable material in the partial field on the substrate with the template at an initial contact point within the initial contact point range.
    Type: Grant
    Filed: June 30, 2021
    Date of Patent: March 28, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventors: Xiaoming Lu, Logan L. Simpson, Mario Johannes Meissl
  • Patent number: 11587795
    Abstract: A planarization apparatus, including a chuck having a first surface and a second surface at two opposing sides thereof. The chuck includes a first zone extending along a periphery of the chuck, a second zone at an inner portion of the chuck, the second zone being surrounded by the first zone; and a flexure connecting the first zone with the second zone. The first zone includes a first member extending along the first surface from the flexure and a first ring land protruding from the first member adjacent to the flexure.
    Type: Grant
    Filed: September 28, 2020
    Date of Patent: February 21, 2023
    Assignee: Canon Kabushiki Kaisha
    Inventor: Xiaoming Lu
  • Publication number: 20230014261
    Abstract: A system and method for shaping a film on a partial field including determining an initial contact point. Receiving information about: a partial field of a substrate; and an edge of a patternable area of the substrate. Determining a chord that connects intersection vertices of the partial field and the edge. Determining coordinates of a bisecting line, wherein the bisecting line bisects the chord, and the bisecting line is orthogonal to the chord. Determining an initial contact point range on the bisecting line in which a template and formable material on the substrate contact each other. Contacting the formable material in the partial field on the substrate with the template at an initial contact point within the initial contact point range.
    Type: Application
    Filed: June 30, 2021
    Publication date: January 19, 2023
    Inventors: Xiaoming Lu, Logan L. Simpson, Mario Johannes Meissl
  • Publication number: 20220384205
    Abstract: A method of planarizing a substrate comprises dispensing formable material onto a substrate, contacting a superstrate held by a superstrate chuck with the formable material on the substrate, thereby forming a multilayer structure including the superstrate, a film of the formable material, and the substrate, releasing the multilayer structure from the superstrate chuck, providing a space between the superstrate chuck and the multilayer structure after the releasing, positioning a light source into the provided space between the superstrate chuck and the multilayer structure, and curing the film of the multilayer structure by exposing the film to light emitted from the light source.
    Type: Application
    Filed: May 28, 2021
    Publication date: December 1, 2022
    Inventors: Steven C. Shackleton, Seth J. Bamesberger, Xiaoming Lu, Byung-Jin Choi
  • Publication number: 20220189832
    Abstract: A method of real time leveling control between a superstrate and a substrate is provided. A contact force model indicating a relationship between a total contact force for planarization of a formable material between the superstrate and the substrate and a force component of the total contact force along each of a plurality peripheral axes is identified. A set point force required for performing the planarization is determined. Each force component is calculated based on the contact force model. The planarization is performed by applying each force component along a corresponding axis of the plurality of axes. The contact force model is identified based on a parallel condition between two contacting surfaces of a superstrate chuck for retaining the superstrate and a stack of the superstrate, the substrate, and formable material between the superstrate and the substrate.
    Type: Application
    Filed: December 15, 2020
    Publication date: June 16, 2022
    Inventor: Xiaoming Lu
  • Publication number: 20220128901
    Abstract: A system and method of shaping a film with a template on a substrate. Generating a first series of parameters from tests performed on a first series of films formed with: a set of shaping conditions; a calibration measurement parameter determined for each substrate prior to shaping; and a first scaling parameter. Generating a second series of parameters from the tests performed on a second series of films produced formed with the set of shaping conditions. The second series of films produced with the calibration measurement parameter determined for each substrate; and a second scaling parameter; or without the calibration measurement parameter. Generating a scaling parameter from: the first series of the parameters; and the second series of parameters. Generating the calibration measurement parameter prior to forming the film. Forming the film using the set of shaping conditions, the calibration measurement parameter, and the scaling parameter.
    Type: Application
    Filed: October 28, 2020
    Publication date: April 28, 2022
    Inventors: Nilabh K. Roy, Mario Johannes Meissl, Xiaoming Lu
  • Publication number: 20220102156
    Abstract: A planarization apparatus, including a chuck having a first surface and a second surface at two opposing sides thereof. The chuck includes a first zone extending along a periphery of the chuck, a second zone at an inner portion of the chuck, the second zone being surrounded by the first zone; and a flexure connecting the first zone with the second zone. The first zone includes a first member extending along the first surface from the flexure and a first ring land protruding from the first member adjacent to the flexure.
    Type: Application
    Filed: September 28, 2020
    Publication date: March 31, 2022
    Inventor: Xiaoming Lu
  • Patent number: 11161280
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: November 2, 2021
    Assignee: Molecular Imprints, Inc.
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Patent number: 10654216
    Abstract: An imprint lithography system that pressurizes and depressurizes an air cavity behind a retained imprint template or substrate so as to deflect the template or substrate to aid in filling the template pattern with fluid resist and/or separating the template from the cured resist on the substrate. The system includes a controller, pressure sensors, and an impedance valve for modulating the air cavity pressure so as to reduce pressure wave oscillations within the cavity that otherwise negatively impact overlay accuracy control, fluid spread control and separation control.
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: May 19, 2020
    Assignee: Canon Kabushiki Kaisha
    Inventors: Xiaoming Lu, Philip D. Schumaker, Byung-Jin Choi
  • Patent number: 10597840
    Abstract: A hot-melt anchor head which belongs to technical field of fixed-foundation buildings. Hot-melt anchor head includes anchor ring provided with through hole, guide wire, electrical hot-melt member arranged on anchor ring, clamp piece arranged in through hole to clamp anchor cable reinforcement, and strain gauge connected to guide wire arranged on surface of anchor ring, wherein bottom of anchor ring is provided with bearing plate; which is provided with opening opposite to through hole, and anchor ring is made of metal material; and surface of anchor ring is formed with coating layer by injection moulding with hot-melt material, strain gauge is coated by coating layer and is in close contact with surface of anchor ring to be integrally formed, an end, close to bearing plate, of anchor ring extends inwards and is provided with flange, and flange is used for holding part, located inside through hole, of coating layer.
    Type: Grant
    Filed: May 31, 2017
    Date of Patent: March 24, 2020
    Assignee: SUZHOU NG. FOUNDATION ENGINEERING CO., LTD.
    Inventors: Jianming Zhou, Huiju Fan, Mingxiang Du, Xiaoming Lu
  • Patent number: 10444624
    Abstract: A thermal frame of an imprinting apparatus has an motor and a cooling element. A metrology frame of the imprinting apparatus is coupled to an output end of the motor and receives an imprinting mold. Thermal isolation is provided between the motor and the metrology frame. Thermal sensors are disposed at locations of the frames. A digital controller applies a control signal for controlling a driving signal of the cooling element to maintain a thermal balance, such as thermal equilibrium, of heat flow between the frames. The digital controller uses output of the thermal sensors to identify transfer functions of heat flow used to calculate the control signal. The feedforward design avoids the very low control bandwidth that limits the performance of typical feedback designs.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: October 15, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Xiaoming Lu, Byung-Jin Choi, Steven Hartmann
  • Publication number: 20190301125
    Abstract: A hot-melt anchor head which belongs to technical field of fixed-foundation buildings. Hot-melt anchor head includes anchor ring provided with through hole, guide wire, electrical hot-melt member arranged on anchor ring, clamp piece arranged in through hole to clamp anchor cable reinforcement, and strain gauge connected to guide wire arranged on surface of anchor ring, wherein bottom of anchor ring is provided with bearing plate; which is provided with opening opposite to through hole, and anchor ring is made of metal material; and surface of anchor ring is formed with coating layer by injection moulding with hot-melt material, strain gauge is coated by coating layer and is in close contact with surface of anchor ring to be integrally formed, an end, close to bearing plate, of anchor ring extends inwards and is provided with flange, and flange is used for holding part, located inside through hole, of coating layer.
    Type: Application
    Filed: May 31, 2017
    Publication date: October 3, 2019
    Applicant: SUZHOU NG. FOUNDATION ENGINEERING CO., LTD.
    Inventors: Jianming ZHOU, Huiju FAN, Mingxiang DU, Xiaoming LU
  • Patent number: 10409178
    Abstract: An imprint lithography alignment method includes assessing a first alignment error between the template and the substrate, generating a first input signal corresponding to a first relative motion between the template and the substrate, initiating the first relative motion between the template and the substrate via the first input signal, assessing an output signal corresponding to the first relative motion, comparing the first input signal and the output signal to yield a motion control action corresponding to a second relative motion between the template and the substrate, generating a second input signal corresponding to the second relative motion between the template and the substrate, initiating the second relative motion between the template and the substrate via the second input signal, and assessing a second alignment error between the template and the substrate, wherein a magnitude of the first alignment error exceeds a magnitude of the second alignment error.
    Type: Grant
    Filed: December 18, 2017
    Date of Patent: September 10, 2019
    Assignee: Canon Kabushiki Kaisha
    Inventors: Xiaoming Lu, Byung-Jin Choi
  • Publication number: 20190232533
    Abstract: Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
    Type: Application
    Filed: January 31, 2019
    Publication date: August 1, 2019
    Inventors: Niyaz Khusnatdinov, Frank Y. Xu, Mario Johannes Meissl, Michael N. Miller, Ecron D. Thompson, Gerard M. Schmid, Pawan Kumar Nimmakayala, Xiaoming Lu, Byung-Jin Choi
  • Patent number: 10335984
    Abstract: Provided is an imprint apparatus for contacting a resin applied to a substrate with a mold to perform patterning on the substrate. The imprint apparatus includes a substrate holding unit for holding the substrate, wherein the substrate holding unit comprises a plurality of holding areas arranged in a predetermined direction, the plurality of holding areas has different width dimension in the direction respectively based on positions in the direction, a surface ratio between two holding areas of the plurality of holding areas with different width dimension respectively is within a range of 0.8 to 1.2.
    Type: Grant
    Filed: April 7, 2015
    Date of Patent: July 2, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Byung-jin Choi, Anshuman Cherala, Zhengmao Ye, Xiaoming Lu, Kang Luo, Nobuto Kawahara, Yoshikazu Miyajima