Patents by Inventor Xiaoru Wang

Xiaoru Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9490128
    Abstract: Methods of annealing a thin semiconductor wafer are disclosed. The methods allow for high-temperature annealing of one side of a thin semiconductor wafer without damaging or overheating heat-sensitive electronic device features that are either on the other side of the wafer or embedded within the wafer. The annealing is performed at a temperature below the melting point of the wafer so that no significant dopant redistribution occurs during the annealing process. The methods can be applied to activating dopants or to forming ohmic contacts.
    Type: Grant
    Filed: August 27, 2012
    Date of Patent: November 8, 2016
    Assignee: Ultratech, Inc.
    Inventors: Yun Wang, Andrew M. Hawryluk, Xiaoru Wang, Xiaohua Shen
  • Patent number: 8906742
    Abstract: Systems and methods are disclosed for performing laser annealing in a manner that reduces or minimizes wafer surface temperature variations during the laser annealing process. The systems and methods include annealing the wafer surface with first and second laser beams that represent preheat and anneal laser beams having respective first and second intensities. The preheat laser beam brings the wafer surface temperate close to the annealing temperature and the anneal laser beam brings the wafer surface temperature up to the annealing temperature. The anneal laser beam can have a different wavelength, or the same wavelength but different orientation relative to the wafer surface. Reflectivity maps of the wafer surface at the preheat and anneal wavelengths are measured and used to select the first and second intensities that ensure good anneal temperature uniformity as a function of wafer position. The first and second intensities can also be selected to minimize edge damage or slip generation.
    Type: Grant
    Filed: August 29, 2013
    Date of Patent: December 9, 2014
    Assignee: Ultratech, Inc.
    Inventors: Xiaohua Shen, Yun Wang, Xiaoru Wang
  • Publication number: 20140057457
    Abstract: Methods of annealing a thin semiconductor wafer are disclosed. The methods allow for high-temperature annealing of one side of a thin semiconductor wafer without damaging or overheating heat-sensitive electronic device features that are either on the other side of the wafer or embedded within the wafer. The annealing is performed at a temperature below the melting point of the wafer so that no significant dopant redistribution occurs during the annealing process. The methods can be applied to activating dopants or to forming ohmic contacts.
    Type: Application
    Filed: August 27, 2012
    Publication date: February 27, 2014
    Inventors: Yun Wang, Andrew M. Hawryluk, Xiaoru Wang, Xiaohua Shen
  • Publication number: 20140004627
    Abstract: Systems and methods are disclosed for performing laser annealing in a manner that reduces or minimizes wafer surface temperature variations during the laser annealing process. The systems and methods include annealing the wafer surface with first and second laser beams that represent preheat and anneal laser beams having respective first and second intensities. The preheat laser beam brings the wafer surface temperate close to the annealing temperature and the anneal laser beam brings the wafer surface temperature up to the annealing temperature. The anneal laser beam can have a different wavelength, or the same wavelength but different orientation relative to the wafer surface. Reflectivity maps of the wafer surface at the preheat and anneal wavelengths are measured and used to select the first and second intensities that ensure good anneal temperature uniformity as a function of wafer position. The first and second intensities can also be selected to minimize edge damage or slip generation.
    Type: Application
    Filed: August 29, 2013
    Publication date: January 2, 2014
    Applicant: Ultratech
    Inventors: Xiaohua Shen, Yun Wang, Xiaoru Wang
  • Patent number: 8546805
    Abstract: Systems and methods are disclosed for performing laser annealing in a manner that reduces or minimizes wafer surface temperature variations during the laser annealing process. The systems and methods include annealing the wafer surface with first and second laser beams that represent preheat and anneal laser beams having respective first and second intensities. The preheat laser beam brings the wafer surface temperate close to the annealing temperature and the anneal laser beam brings the wafer surface temperature up to the annealing temperature. The anneal laser beam can have a different wavelength, or the same wavelength but different orientation relative to the wafer surface. Reflectivity maps of the wafer surface at the preheat and anneal wavelengths are measured and used to select first and second intensities that ensure good anneal temperature uniformity as a function of wafer position.
    Type: Grant
    Filed: January 27, 2012
    Date of Patent: October 1, 2013
    Assignee: Ultratech, Inc.
    Inventors: Xiaohua Shen, Yun Wang, Xiaoru Wang
  • Publication number: 20130196455
    Abstract: Systems and methods are disclosed for performing laser annealing in a manner that reduces or minimizes wafer surface temperature variations during the laser annealing process. The systems and methods include annealing the wafer surface with first and second laser beams that represent preheat and anneal laser beams having respective first and second intensities. The preheat laser beam brings the wafer surface temperate close to the annealing temperature and the anneal laser beam brings the wafer surface temperature up to the annealing temperature. The anneal laser beam can have a different wavelength, or the same wavelength but different orientation relative to the wafer surface. Reflectivity maps of the wafer surface at the preheat and anneal wavelengths are measured and used to select first and second intensities that ensure good anneal temperature uniformity as a function of wafer position.
    Type: Application
    Filed: January 27, 2012
    Publication date: August 1, 2013
    Inventors: Xiaohua Shen, Yun Wang, Xiaoru Wang
  • Patent number: 7661806
    Abstract: An inkjet recording element comprising a support having thereon in order, from top to bottom, an upper fusible, porous layer comprising fusible polymeric particles, which particles comprise a thermoplastic polymer with reactive functional groups, the inkjet recording element further comprising a lower crosslinker-containing layer in which a polyfunctional compound has complementary reactive functional groups capable of crosslinking the reactive functional groups on the thermoplastic polymer under fusing. Optionally, an ink-carrier-liquid receptive layer is present between the fusible, porous layer and the support. Also disclosed is a method of inkjet printing on the element.
    Type: Grant
    Filed: March 11, 2005
    Date of Patent: February 16, 2010
    Assignee: Eastman Kodak Company
    Inventors: Gregory E. Missell, Lawrence P. DeMejo, Xiaoru Wang
  • Patent number: 7655286
    Abstract: An inkjet recording element comprising a support having thereon in order, from top to bottom, a fusible, porous ink-transporting layer comprising fusible polymeric particles, which particles comprise a thermoplastic polymer with reactive functional groups, the ink-transporting layer further comprising a multifunctional compound having complementary reactive functional groups capable of crosslinking the reactive functional groups on the thermoplastic polymer. The ink-transporting layer is over a fusible dye-trapping layer that preferably comprises a mordant. Optionally, an ink-carrier-liquid receptive layer is present between the dye-trapping layer and the support.
    Type: Grant
    Filed: June 30, 2004
    Date of Patent: February 2, 2010
    Assignee: Eastman Kodak Company
    Inventors: Lawrence P. DeMejo, Xiaoru Wang, Gregory E. Missell, Allan Wexler
  • Patent number: 7655083
    Abstract: This invention relates to method of printing an ink jet image using an ink jet ink set comprising a colored aqueous ink and a substantially colorless aqueous ink, wherein the colored ink comprises a cationic coloring agent and the colorless ink comprises an anionic polymer or oligomer.
    Type: Grant
    Filed: February 18, 2009
    Date of Patent: February 2, 2010
    Assignee: Eastman Kodak Company
    Inventors: Richard P. Szajewski, Xiaoru Wang
  • Patent number: 7648745
    Abstract: An inkjet recording element comprises a support having thereon in order, from top to bottom, a fusible, porous top layer comprising fusible polymeric particles that comprise a thermoplastic polymer with reactive functional groups, in combination with a multifunctional compound having complementary reactive functional groups capable of crosslinking the reactive functional groups on the thermoplastic polymer. Optionally, an ink-carrier-liquid receptive layer is present between the top layer and the support.
    Type: Grant
    Filed: June 30, 2004
    Date of Patent: January 19, 2010
    Assignee: Eastman Kodak Company
    Inventors: Lawrence P. DeMejo, Xiaoru Wang, Sandra D. Nesbitt, Gregory E. Missell
  • Publication number: 20090155465
    Abstract: This invention relates to method of printing an ink jet image using an ink jet ink set comprising a colored aqueous ink and a substantially colorless aqueous ink, wherein the colored ink comprises a cationic coloring agent and the colorless ink comprises an anionic polymer or oligomer.
    Type: Application
    Filed: February 18, 2009
    Publication date: June 18, 2009
    Inventors: Richard P. Szajewski, Xiaoru Wang
  • Patent number: 7537650
    Abstract: This invention relates to an ink jet ink set comprising a colored aqueous ink and a substantially colorless aqueous ink, wherein the colored ink comprises a cationic coloring agent and the colorless ink comprises an anionic polymer or oligomer.
    Type: Grant
    Filed: March 30, 2005
    Date of Patent: May 26, 2009
    Assignee: Eastman Kodak Company
    Inventors: Richard P. Szajewski, Xiaoru Wang
  • Patent number: 7507451
    Abstract: An inkjet recording element comprises a support having thereon in order, from top to bottom, a fusible, porous layer comprising fusible multifunctional polymer particles derived from an aqueous dispersion that comprise a thermoplastic polymer with at least two reactive functional groups capable of crosslinking with each other. Optionally, an ink-carrier-liquid receptive layer is present between the fusible, porous layer and the support. Also disclosed is a method of inkjet printing on the element.
    Type: Grant
    Filed: March 11, 2005
    Date of Patent: March 24, 2009
    Assignee: Eastman Kodak Company
    Inventors: Gregory E. Missell, Lawrence P. DeMejo, Xiaoru Wang
  • Patent number: 7479183
    Abstract: An ink jet ink composition comprising water, a humectant, and composite colorant polymer particles, wherein the composite colorant polymer particles having a colorant phase and a polymer phase, the polymer phase of the particles being formed in situ in the presence of the colorant, the composite colorant polymer particles not increasing in mean particle size more than about 50% when said ink is incubated for one week at 60° C.
    Type: Grant
    Filed: May 27, 2003
    Date of Patent: January 20, 2009
    Assignee: Eastman Kodak Company
    Inventors: Xiaoru Wang, David Erdtmann, Karen J. Klingman
  • Patent number: 7449501
    Abstract: This invention relates to an ink jet ink composition comprising an aqueous medium and microgel particles, said particles comprising a crosslinked copolymer prepared from a monomer mixture comprising at least a crosslinking monomer, a polymerizable carboxylic acid monomer, and one or more polymerizable water insoluble vinyl type monomers. The ink composition may be a colorless ink or it may contain a colorant.
    Type: Grant
    Filed: November 9, 2004
    Date of Patent: November 11, 2008
    Assignee: Eastman Kodak Company
    Inventors: David S. Uerz, Hwei-Ling Yau, Wendy S. Krzemien, James A. Reczek, Xiaoru Wang, David E. Decker
  • Patent number: 7381755
    Abstract: An aqueous ink jet ink composition including a pigment, a polymer latex containing at least one halogenated vinyl monomer, at least one surfactant, and a humectant. An ink and receiver combination for a non-absorbing substrate is also disclosed.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: June 3, 2008
    Assignee: Eastman Kodak Company
    Inventors: Xiaoru Wang, Huijuan D. Chen, Ricky G. Frazier, Jin-Shan Wang
  • Patent number: 7335407
    Abstract: The present invention comprises an inkjet recording element comprising a support having thereon at least two ink receiving layers capable of accepting an inkjet image, at least one of said layers comprising porous polyester particles. The present invention also includes a method of forming an inkjet print comprising providing an inkjet recording element comprising at least two ink receiving layers capable of accepting an inkjet image, at least one of said layers comprising porous polyester particles and printing on said inkjet recording element utilizing an inkjet printer.
    Type: Grant
    Filed: December 20, 2001
    Date of Patent: February 26, 2008
    Assignee: Eastman Kodak Company
    Inventors: Christine J. Landry-Coltrain, Jeffrey W. Leon, Linda M. Franklin, Xiaoru Wang
  • Patent number: 7317042
    Abstract: This invention relates to an ink jet ink composition comprising water, a humectant, and polymer-dye particles, wherein said polymer-dye particles comprise a colorant phase containing a water insoluble dye, and a polymer phase, said particles being associated with a water-dispersible polymeric co-stabilizer. This invention further relates to an ink jet printing method utilizing the above ink jet ink composition.
    Type: Grant
    Filed: October 4, 2002
    Date of Patent: January 8, 2008
    Assignee: Eastman Kodak Company
    Inventors: Xiaoru Wang, Huijuan D. Chen, James A. Reczek
  • Patent number: 7273899
    Abstract: The present invention relates to a splayed material comprising a layered material splayed with a particle having a diameter equal to or less than 3 micrometers. Another embodiment of the invention includes an article comprising a matrix and a layered material splayed with a polymeric particles dispersed in a medium. The invention also relates to methods for preparing these materials via mixing, milling and emulsifying a solvent borne polymer with a surfactant. A further method describes a method for preparing a nanocomposite from a splayant particle prepared by combining an emulsion polymerization monomer and a surfactant dispersible in a medium wherein the monomer is not dispersible in the medium.
    Type: Grant
    Filed: September 25, 2002
    Date of Patent: September 25, 2007
    Assignee: Eastman Kodak Company
    Inventors: Jin-Shan Wang, Xiaoru Wang, Samuel Chen, Thomas N. Blanton
  • Publication number: 20070043144
    Abstract: An ink jet ink composition comprising an aqueous media and a pigment dispersion comprising a pigment and a polymeric dispersant wherein said polymeric dispersant is a copolymer comprising at least a hydrophobic methacrylate or acrylate monomer containing an aliphatic chain having greater than or equal to 12 carbons; and a hydrophilic methacrylic or acrylic acid monomer; wherein said copolymer comprises at least 10% by weight of the methacrylate or acrylate monomer and at least 5% by weight of the methacrylic or acrylic acid monomer; and wherein the copolymer comprises, in total, 20 to 95 weight % of hydrophobic monomer.
    Type: Application
    Filed: August 18, 2005
    Publication date: February 22, 2007
    Inventors: Gary House, Xiaoru Wang, Allan Sowinski