Patents by Inventor Xiaotian Ma

Xiaotian Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10745186
    Abstract: A container is provided in the present disclosure. The container includes at least one outer wall that is made of a low temperature tolerant material where the at least one outer wall is arranged to substantially form the container with an opening end; a tube that is situated inside the at least one outer wall, where the tube and the at least one outer wall are substantially thermally insulated, and the tube is open at one end that is on a same side of the opening end of the container; and a container cover being shaped substantially to match the at least one outer wall, where the container over is capable of covering the opening end of the container.
    Type: Grant
    Filed: May 3, 2018
    Date of Patent: August 18, 2020
    Assignee: Fibulas, Inc.
    Inventors: Xiaotian Ma, Ying Pan
  • Publication number: 20190092555
    Abstract: A container is provided in the present disclosure. The container includes at least one outer wall that is made of a low temperature tolerant material where the at least one outer wall is arranged to substantially form the container with an opening end; a tube that is situated inside the at least one outer wall, where the tube and the at least one outer wall are substantially thermally insulated, and the tube is open at one end that is on a same side of the opening end of the container; and a container cover being shaped substantially to match the at least one outer wall, where the container over is capable of covering the opening end of the container.
    Type: Application
    Filed: May 3, 2018
    Publication date: March 28, 2019
    Applicant: FIBULAS, INC.
    Inventors: Xiaotian MA, Ying PAN
  • Patent number: 9984926
    Abstract: A semiconductor device manufacturing method includes providing a wafer, which includes a semiconductor substrate, a semiconductor device located on the semiconductor substrate, an interlayer dielectric layer covering the semiconductor device, and a through hole penetrating through the interlayer dielectric layer and a portion of the semiconductor substrate. A metal layer is formed inside the through hole and on a surface of the interlayer dielectric layer. A first planarization process is conducted to remove a portion of the metal layer on the surface of the interlayer dielectric layer. The method also includes conducting an annealing alloy treatment and conducting a second planarization process to completely remove the metal layer on the surface of the interlayer dielectric layer. The manufacturing methods can slowly release stress of the wafer and effectively prevent cracks in silicon vias, thereby reducing TSV leakage problems, thus improving the reliability and yield of the devices.
    Type: Grant
    Filed: October 1, 2015
    Date of Patent: May 29, 2018
    Assignee: Semiconductor Manufacturing International (Shanghai) Corporation
    Inventors: Xiaotian Ma, Yan Gao, Liang Wang
  • Patent number: 9837311
    Abstract: The present disclosure provides conductive plug structures and fabrication methods thereof. An exemplary fabrication process of the conductive plug structure includes providing a substrate; forming a mask layer having an opening on a surface of the substrate; etching the substrate to form a contact hole using the mask layer as an etching mask; etching the mask layer to increase a feature size of the opening; forming an insulation layer on an inner surface of the opening, an inner surface of the enlarged opening and a surface of the mask layer to have more edge corners, a thickness of the insulation layer being greater than a thickness of the remaining mask layer; forming a conductive layer filling the contact hole on the insulation layer; and planarizing the conductive layer and the insulation layer until a surface of the mask layer is exposed.
    Type: Grant
    Filed: September 27, 2016
    Date of Patent: December 5, 2017
    Assignees: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATION, SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) CORPORATION
    Inventors: Liang Wang, Xiaotian Ma
  • Publication number: 20170092537
    Abstract: The present disclosure provides conductive plug structures and fabrication methods thereof. An exemplary fabrication process of the conductive plug structure includes providing a substrate; forming a mask layer having an opening on a surface of the substrate; etching the substrate to form a contact hole using the mask layer as an etching mask; etching the mask layer to increase a feature size of the opening; forming an insulation layer on an inner surface of the opening, an inner surface of the enlarged opening and a surface of the mask layer to have more edge corners, a thickness of the insulation layer being greater than a thickness of the remaining mask layer; forming a conductive layer filling the contact hole on the insulation layer; and planarizing the conductive layer and the insulation layer until a surface of the mask layer is exposed.
    Type: Application
    Filed: September 27, 2016
    Publication date: March 30, 2017
    Inventors: LIANG WANG, XIAOTIAN MA
  • Publication number: 20160111351
    Abstract: A semiconductor device manufacturing method includes providing a wafer, which includes a semiconductor substrate, a semiconductor device located on the semiconductor substrate, an interlayer dielectric layer covering the semiconductor device, and a through hole penetrating through the interlayer dielectric layer and a portion of the semiconductor substrate. A metal layer is formed inside the through hole and on a surface of the interlayer dielectric layer. A first planarization process is conducted to remove a portion of the metal layer on the surface of the interlayer dielectric layer. The method also includes conducting an annealing alloy treatment and conducting a second planarization process to completely remove the metal layer on the surface of the interlayer dielectric layer. The manufacturing methods can slowly release stress of the wafer and effectively prevent cracks in silicon vias, thereby reducing TSV leakage problems, thus improving the reliability and yield of the devices.
    Type: Application
    Filed: October 1, 2015
    Publication date: April 21, 2016
    Inventors: XIAOTIAN MA, YAN GAO, LIANG WANG
  • Patent number: 8511803
    Abstract: The invention relates to a cartridge for ink-jet printer, comprising a cartridge body, a protective cover moving relatively to the cartridge body under pressure, a detection mechanism for cartridge and a detection mechanism for remaining ink volume, wherein the detection mechanism for cartridge includes the first and second detecting units respectively matching to the first and second sensors on the printer. The said second detecting unit includes a shelter unit, a fixed shaft set on the cartridge body, a sliding shaft on the protective cover and a reset unit of the shelter unit, wherein the shelter unit connects with the rotating shaft of the fixed shaft, rotates around the fixed shaft under the pressure of the sliding shaft and resets together with the protective cover under the effect of the reset unit of the shelter unit.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: August 20, 2013
    Assignee: Ninestar Image Co., Ltd.
    Inventors: Guilian Wang, Xiaotian Ma
  • Patent number: 8419174
    Abstract: The invention relates to a cartridge for ink-jet printer, comprising a cartridge body, a protective cover moving relatively to the cartridge body under pressure and a detection mechanism for cartridge and remaining ink volume, wherein the detection mechanism for cartridge and remaining ink volume includes the first and second detecting members respectively matching to the first and second sensors on the printer as well as a soft support cap set on the cartridge body and communicating to the ink storage chamber, of which the said second detecting member includes a movable lever, a fixed shaft set on the cartridge body, and a position adjustment member for the movable lever set on the protective cover. The said movable lever is connected with the rotating shaft of the cartridge body through the fixed shaft.
    Type: Grant
    Filed: November 28, 2009
    Date of Patent: April 16, 2013
    Assignee: Ninestar Image Co., Ltd.
    Inventor: Xiaotian Ma
  • Patent number: 8333461
    Abstract: An ink cartridge for an inkjet printer is provided. The ink cartridge includes a light detection portion, a first triangular prism and a second triangular prism, made of transparent material and disposed on the light detection portion, for receiving, deflecting, or refracting light emitted by a light emitting element on the printer. Two surfaces of the second triangular prism contact ink in the ink cartridge. When the ink cartridge has ink contained therein and is installed into a printer, the light emitted by the light emitting element is totally reflected by the first triangular prism and refracted by the second triangular prism into the ink, and will not be received by a light receiving element on the printer. When the ink in the ink cartridge is exhausted, the light is totally reflected by the second triangular prism onto the first triangular prism, and then is reflected onto the light receiving element, and thus the printer detects that the ink is exhausted.
    Type: Grant
    Filed: June 9, 2010
    Date of Patent: December 18, 2012
    Assignee: Zhuhai Ninestar Management Co., Ltd.
    Inventors: Lei Qin, Xiuyuan Xu, Xiaotian Ma
  • Publication number: 20110292138
    Abstract: The invention relates to a cartridge for ink-jet printer, comprising a cartridge body, a protective cover moving relatively to the cartridge body under pressure and a detection mechanism for cartridge and remaining ink volume, wherein the detection mechanism for cartridge and remaining ink volume includes the first and second detecting members respectively matching to the first and second sensors on the printer as well as a soft support cap set on the cartridge body and communicating to the ink storage chamber, of which the said second detecting member includes a movable lever, a fixed shaft set on the cartridge body, and a position adjustment member for the movable lever set on the protective cover. The said movable lever is connected with the rotating shaft of the cartridge body through the fixed shaft.
    Type: Application
    Filed: November 28, 2009
    Publication date: December 1, 2011
    Applicant: NINESTAR IMAGE CO., LTD.
    Inventor: Xiaotian Ma
  • Publication number: 20110249064
    Abstract: The invention relates to a cartridge for ink-jet printer, comprising a cartridge body, a protective cover moving relatively to the cartridge body under pressure, a detection mechanism for cartridge and a detection mechanism for remaining ink volume, wherein the detection mechanism for cartridge includes the first and second detecting units respectively matching to the first and second sensors on the printer. The said second detecting unit includes a shelter unit, a fixed shaft set on the cartridge body, a sliding shaft on the protective cover and a reset unit of the shelter unit, wherein the shelter unit connects with the rotating shaft of the fixed shaft, rotates around the fixed shaft under the pressure of the sliding shaft and resets together with the protective cover under the effect of the reset unit of the shelter unit.
    Type: Application
    Filed: November 30, 2009
    Publication date: October 13, 2011
    Inventors: Guilian Wang, Xiaotian Ma
  • Publication number: 20100265305
    Abstract: An ink cartridge for an inkjet printer is provided. The ink cartridge includes a light detection portion, a first triangular prism and a second triangular prism, made of transparent material and disposed on the light detection portion, for receiving, deflecting, or refracting light emitted by a light emitting element on the printer. Two surfaces of the second triangular prism contact ink in the ink cartridge. When the ink cartridge has ink contained therein and is installed into a printer, the light emitted by the light emitting element is totally reflected by the first triangular prism and refracted by the second triangular prism into the ink, and will not be received by a light receiving element on the printer. When the ink in the ink cartridge is exhausted, the light is totally reflected by the second triangular prism onto the first triangular prism, and then is reflected onto the light receiving element, and thus the printer detects that the ink is exhausted.
    Type: Application
    Filed: June 9, 2010
    Publication date: October 21, 2010
    Applicant: ZHUHAI NINESTAR TECHNOLOGY CO., LTD.
    Inventors: LEI QIN, XIUYUAN XU, XIAOTIAN MA