Patents by Inventor Xiaowei QUAN

Xiaowei QUAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11891344
    Abstract: The present disclosure discloses a method for graded utilization of fluorine and silicon resources in a phosphate ore. While the phosphate ore reacts with sulfuric acid, a fluorine-containing and silicon-containing tail gas is produced. SiO2 and H2SiF6 solution with a high concentration are obtained by concentrating and filtering a solution containing HF and H2SiF6 formed after tail gas is absorbed by water. Crude SiF4 and a solution containing HF and H2SO4 are obtained by extracting, adsorbing, and dehydrating the H2SiF6 solution. SiF4 with a 5N purity is obtained after the crude SiF4 is adsorbed and distilled, at the same time, an impurity-enriched SiF4 is returned to operations of concentration and filtration to react with the solution containing HF and H2SiF6 to generate the H2SiF6 and SiO2. High-purity HF and waste sulfuric acid are obtained after the H2SO4 solution containing HF is separated by steam stripping and distillation.
    Type: Grant
    Filed: April 5, 2023
    Date of Patent: February 6, 2024
    Assignee: CHTEM LIMITED
    Inventor: Xiaowei Quan
  • Publication number: 20230339822
    Abstract: The present disclosure discloses a method for graded utilization of fluorine and silicon resources in a phosphate ore. While the phosphate ore reacts with sulfuric acid, a fluorine-containing and silicon-containing tail gas is produced. SiO2 and H2SiF6 solution with a high concentration are obtained by concentrating and filtering a solution containing HF and H2SiF6 formed after tail gas is absorbed by water. Crude SiF4 and a solution containing HF and H2SO4 are obtained by extracting, adsorbing, and dehydrating the H2SiF6 solution. SiF4 with a 5N purity is obtained after the crude SiF4 is adsorbed and distilled, at the same time, an impurity-enriched SiF4 is returned to operations of concentration and filtration to react with the solution containing HF and H2SiF6 to generate the H2SiF6 and SiO2. High-purity HF and waste sulfuric acid are obtained after the H2SO4 solution containing HF is separated by steam stripping and distillation.
    Type: Application
    Filed: April 5, 2023
    Publication date: October 26, 2023
    Applicant: CHTEM LIMITED
    Inventor: Xiaowei QUAN