Abstract: A method for determining the diffusion radius of in-situ injection and remediation of contaminated soil and groundwater. According to the triangle method, the hole spacing is perpendicular to the groundwater flow direction, the row spacing is along the groundwater flow direction, and the flow diffusion in the groundwater during the effective time of the remediation agent reaction is considered. Under high pressure rotary injection, the remediation agent and a certain proportion of bromide ions are simultaneously injected into the aquifer as a tracer. The diffusion of the agent is determined by observing the phenomenon of slurry-returning and slurry-channeling of adjacent injection points. After the completion of the injection, the groundwater is quickly sampled in fixed depth, the tracer concentration is quickly detected on site, and the concentration of bromide ions in the groundwater is compared with the background value. Comprehensive determination determines the optimal diffusion radius.

Abstract: An infrared sensitive and chemical treatment free photosensitive composition, includes, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable oligomer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long run length.

Abstract: An infrared sensitive and chemical treatment free photosensitive composition, includes, based on weight percentage, 30-70% of a water soluble thermally cross-linking resin, 1-20% of a water-soluble photocross-linking polymerized resin, 10-50% of a photopolymerizable oligomer, 1-30% of a multifunctional monomer, 1-20% of a cationic photopolymerization initiator, and 1-20% of an infrared irradiation absorption dye. The photosensitive composition of the present invention is useful for preparation of an infrared sensitive and chemical treatment free lithographic plate. The lithographic plate of the present invention has a high sensitivity and a good mesh point reduction, and after exposure to an infrared light source, can be printed directly after being washed with tapped water or without any washing and processing step, and has a long run length.