Patents by Inventor Xiaoxi Guo

Xiaoxi Guo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PRE-CLEAN CHAMBER WITH REDUCED ION CURRENT
    Publication number: 20110315319
    Abstract: Apparatus for processing substrates are disclosed herein. In some embodiments, a substrate processing system may include a process chamber having a first volume to receive a plasma and a second volume for processing a substrate; a substrate support disposed in the second volume; and a plasma filter disposed in the process chamber between the first volume and the second volume such that a plasma formed in the first volume can only flow from the first volume to the second volume through the plasma filter. In some embodiments, the substrate processing system includes a process kit coupled to the process chamber, wherein the plasma filter is disposed in the process kit.
    Type: Application
    Filed: June 22, 2011
    Publication date: December 29, 2011
    Applicant: APPLIED MATERIALS, INC.
    Inventors: JOHN C. FORSTER, TAE HONG HA, MURALI K. NARASIMHAN, XINYU FU, ARVIND SUNDARRAJAN, XIAOXI GUO
  • Oxygen plasma clean to remove carbon species deposited on a glass dome surface
    Patent number: 7550090
    Abstract: A method for in-situ cleaning of a dielectric dome surface having been used in pre-clean processes is provided. Carbon containing deposits are removed by providing a plasma of one or more oxidizing gases which react with the carbon containing films to form volatile carbon containing compounds.
    Type: Grant
    Filed: January 23, 2007
    Date of Patent: June 23, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Quancheng Gu, Cheng-Hsiung Tsai, John C. Forster, Xiaoxi Guo, Larry Frazier
  • OXYGEN PLASMA CLEAN TO REMOVE CARBON SPECIES DEPOSITED ON A GLASS DOME SURFACE
    Publication number: 20080173326
    Abstract: A method for in-situ cleaning of a dielectric dome surface having been used in pre-clean processes is provided. Carbon containing deposits are removed by providing a plasma of one or more oxidizing gases which react with the carbon containing films to form volatile carbon containing compounds.
    Type: Application
    Filed: January 23, 2007
    Publication date: July 24, 2008
    Inventors: QUANCHENG GU, Cheng-Hsiung Tsai, John C. Forster, Xiaoxi Guo, Larry Frazier