Patents by Inventor Xiaoxiao JI

Xiaoxiao JI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aqueous polyurethane functional mask substrate and application thereof
    Patent number: 11964032
    Abstract: Disclosed by the present invention are an aqueous polyurethane functional mask substrate and an application thereof. Two kinds of water-based polyurethane dispersions are used as the main components of the mask substrate. The transdermal penetration and absorption of functional ingredients such as whitening, moisturizing and anti-aging ingredients in facial mask products are promoted by means of the special cross-linked structures of polyurethane films. During use, a mask is evenly applied to the face; and after the mask dries, the entire mask may be removed directly or removed after being moistened using water. The mask substrate according to the present invention is also applicable to body masks such as a hand mask, a neck mask and a back mask.
    Type: Grant
    Filed: November 9, 2018
    Date of Patent: April 23, 2024
    Assignees: WANHUA CHEMICAL GROUP CO., LTD., WANHUA CHEMICAL (NINGBO) CO., LTD.
    Inventors: Xiaoxiao Ji, Haidong Jia, Nuo Xu, Shan Liu, Yunling Liu, Jie Zhang, Xueshun Ji, Jiakuan Sun
  • AQUEOUS POLYURETHANE FUNCTIONAL MASK SUBSTRATE AND APPLICATION THEREOF
    Publication number: 20210353510
    Abstract: Disclosed by the present invention are an aqueous polyurethane functional mask substrate and an application thereof. Two kinds of water-based polyurethane dispersions are used as the main components of the mask substrate. The transdermal penetration and absorption of functional ingredients such as whitening, moisturizing and anti-aging ingredients in facial mask products are promoted by means of the special cross-linked structures of polyurethane films. During use, a mask is evenly applied to the face; and after the mask dries, the entire mask may be removed directly or removed after being moistened using water. The mask substrate according to the present invention is also applicable to body masks such as a hand mask, a neck mask and a back mask.
    Type: Application
    Filed: November 9, 2018
    Publication date: November 18, 2021
    Inventors: Xiaoxiao JI, Haidong JIA, Nuo XU, Shan LIU, Yunling LIU, Jie ZHANG, Xueshun JI, Jiakuan SUN