Patents by Inventor Xiaoxue CHEN

Xiaoxue CHEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250107043
    Abstract: Disclosed are a vapor chamber, a radiator and an electronic device. The vapor chamber includes: a bottom plate, a top plate, a side plate and a backflow piece. The bottom plate includes a first heat dissipation area and a second heat dissipation area provided at a peripheral side of the first heat dissipation area. The first heat dissipation area is provided with at least a first capillary structure layer on the side near the top plate, and the second heat dissipation area is provided with at least a second capillary structure layer on the side near the top plate. The capillary force of the first capillary structure layer is greater than that of the second capillary structure layer, and the flow resistance of the fluid medium in the second capillary structure layer is smaller than that in the first capillary structure layer.
    Type: Application
    Filed: February 13, 2023
    Publication date: March 27, 2025
    Inventors: Zhen SUN, Xiaoxue CHEN, Zhiwei DUAN, Qingsong XU
  • Publication number: 20250062098
    Abstract: A method for dynamic aberration correction includes generating a primary electron beam with an electron beam source. The method includes directing the primary electron beams to a sample with an electron-optical column and deflecting the primary electron beam to an objective lens of the electron-optical column using a first Wien filter to correct for coma blur in the primary electron beam. The method includes generating off-axis chromatic aberration in the primary electron beam using the objective lens. The method includes adjusting one of a strength or orientation of the Wien filter to correct the off-axis chromatic aberration in the primary electron beam generated by the objective lens. The method includes detecting one or more secondary electrons emanating from the sample.
    Type: Application
    Filed: January 26, 2024
    Publication date: February 20, 2025
    Inventors: Xiaoxue Chen, Youfei Jiang, Balaji Srinivasan, Arjun Hegde
  • Publication number: 20250037967
    Abstract: Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.
    Type: Application
    Filed: October 10, 2024
    Publication date: January 30, 2025
    Inventors: Xuedong LIU, Weimin ZHOU, Xiaoxue CHEN, Xiaoyu JI, Heng LI, Shahedul HOQUE, Zongyao LI, Shuhao LIU, Weiming REN
  • Patent number: 12196692
    Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.
    Type: Grant
    Filed: September 30, 2020
    Date of Patent: January 14, 2025
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Zhong-wei Chen, Xiaoyu Ji, Xiaoxue Chen, Weimin Zhou, Frank Nan Zhang
  • Patent number: 12142455
    Abstract: Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.
    Type: Grant
    Filed: April 8, 2021
    Date of Patent: November 12, 2024
    Assignee: ASML Netherlands B.V.
    Inventors: Xuedong Liu, Weimin Zhou, Xiaoxue Chen, Xiaoyu Ji, Heng Li, Shahedul Hoque, Zongyao Li, Shuhao Liu, Weiming Ren
  • Patent number: 11513087
    Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.
    Type: Grant
    Filed: October 16, 2020
    Date of Patent: November 29, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Weiming Ren, Xuedong Liu, Zhong-wei Chen, Xiaoyu Ji, Xiaoxue Chen, Weimin Zhou, Frank Nan Zhang
  • Publication number: 20220375712
    Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.
    Type: Application
    Filed: September 30, 2020
    Publication date: November 24, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Weiming REN, Xuedong LIU, Zhong-wei CHEN, Xiaoyu JI, Xiaoxue CHEN, Weimin ZHOU, Frank Nan ZHANG
  • Publication number: 20210319977
    Abstract: Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.
    Type: Application
    Filed: April 8, 2021
    Publication date: October 14, 2021
    Inventors: Xuedong LIU, Weimin ZHOU, Xiaoxue CHEN, Xiaoyu JI, Heng LI, Shahedul HOQUE, Zongyao LI, Shuhao LIU, Weiming REN
  • Publication number: 20210116398
    Abstract: Systems and methods of providing a probe spot in multiple modes of operation of a charged-particle beam apparatus are disclosed. The method may comprise activating a charged-particle source to generate a primary charged-particle beam and selecting between a first mode and a second mode of operation of the charged-particle beam apparatus. In the flooding mode, the condenser lens may focus at least a first portion of the primary charged-particle beam passing through an aperture of the aperture plate to form a second portion of the primary charged-particle beam, and substantially all of the second portion is used to flood a surface of a sample. In the inspection mode, the condenser lens may focus a first portion of the primary charged-particle beam such that the aperture of the aperture plate blocks off peripheral charged-particles to form the second portion of the primary charged-particle beam used to inspect the sample surface.
    Type: Application
    Filed: October 16, 2020
    Publication date: April 22, 2021
    Inventors: Weiming REN, Xuedong LIU, Zhong-wei CHEN, Xiaoyu JI, Xiaoxue CHEN, Weimin ZHOU, Frank Nan ZHANG
  • Patent number: 10718597
    Abstract: The present disclosure is directed to significantly improving the adiabatic shear banding susceptibility of pure refractory metals as well as overcoming the physical dimension limitations when making kinetic energy penetrators. These improvements may be achieved by arranging interlayers between plasticly deformed refractory metal material layers. Disclosed herein are methods of making material for kinetic energy penetrator applications, the methods comprising: severely plasticly deforming a refractory metal material until the grain size of the refractory metal material is within one of ultrafine grain and nanocrystalline regimes; arranging an interlayer material adjacent the refractory metal material; and diffusion bonding the interlayer material to the refractory metal material.
    Type: Grant
    Filed: July 23, 2018
    Date of Patent: July 21, 2020
    Assignee: The University of North Carolina at Charlotte
    Inventors: Qiuming Wei, Xiaoxue Chen
  • Publication number: 20190063889
    Abstract: The present disclosure is directed to significantly improving the adiabatic shear banding susceptibility of pure refractory metals as well as overcoming the physical dimension limitations when making kinetic energy penetrators. These improvements may be achieved by arranging interlayers between plasticly deformed refractory metal material layers. Disclosed herein are methods of making material for kinetic energy penetrator applications, the methods comprising: severely plasticly deforming a refractory metal material until the grain size of the refractory metal material is within one of ultrafine grain and nanocrystalline regimes; arranging an interlayer material adjacent the refractory metal material; and diffusion bonding the interlayer material to the refractory metal material.
    Type: Application
    Filed: July 23, 2018
    Publication date: February 28, 2019
    Inventors: Qiuming WEI, Xiaoxue CHEN