Patents by Inventor Xiaoyang Cheng

Xiaoyang Cheng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230139430
    Abstract: The present application provides an occluder, for use in occluding a defect in a vascular system. The occluder comprises a first occlusion disc, a second occlusion disc, and a tightening wire; the first occlusion disc and the second occlusion disc are used for covering different openings of a defect, respectively; a connector is provided on the first occlusion disc; the connector is provided with a wire passing hole; the tightening wire passes through the wire passing hole of the connector; two ends of the tightening wire pass through the second occlusion disc, and form an adjustment wire knot on the side of the second occlusion disc facing away from the first occlusion disc; the distance between the first occlusion disc and the second occlusion disc can be adjusted by the ends of the tightening wire. The present application also provides an occlusion system having the occluder.
    Type: Application
    Filed: December 28, 2022
    Publication date: May 4, 2023
    Applicant: HANGZHOU DINOVA EP TECHNOLOGY CO., LTD
    Inventors: Jianglang Zhao, Xiaoyang Cheng, Jie Chen, Yongsheng Wang
  • Patent number: 11189465
    Abstract: The present disclosure provides an adjustable capacitor comprising a ferroelectric dielectric layer, a first electrode and a second electrode disposed on opposite sides of the ferroelectric dielectric layer. The adjustable capacitor further comprises a first control electrode and a second control electrode insulated from the first electrode and the second electrode. The first control electrode and the second control electrode are configured to provide an electric field to the ferroelectric dielectric layer, to adjust a dielectric constant of the ferroelectric dielectric layer by controlling an electric field strength, thereby adjusting the capacitance between the first and the second electrodes. The present disclosure also provides an impedance matching device and a semiconductor processing apparatus.
    Type: Grant
    Filed: October 18, 2017
    Date of Patent: November 30, 2021
    Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
    Inventors: Gang Wei, Xiaoyang Cheng
  • Patent number: 11056316
    Abstract: A radio frequency (RF) pulse matching method includes presetting a matching threshold and initializing a pulse count value to a pulse reference value and loading pulse power to an upper electrode and a lower electrode. The upper electrode includes an upper RF power supply and a corresponding upper matching device. The lower electrode includes a lower RF power supply and a corresponding lower matching device. The method further includes collecting a pulse signal of the pulse power and calculating a matching parameter according to the pulse signal, determining a magnitude of the matching parameter relative to the matching threshold and resetting the pulse count value, causing the upper matching device to perform matching on the upper RF power supply or the lower matching device to perform matching on the lower RF power supply, and repeating processes until the upper RF power supply and the lower RF power supply are matched.
    Type: Grant
    Filed: December 24, 2020
    Date of Patent: July 6, 2021
    Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
    Inventors: Xiaoyang Cheng, Gang Wei, Jing Wei, Jinzhi Bai, Jing Yang
  • Publication number: 20210118651
    Abstract: A radio frequency (RF) pulse matching method includes presetting a matching threshold and initializing a pulse count value to a pulse reference value and loading pulse power to an upper electrode and a lower electrode. The upper electrode includes an upper RF power supply and a corresponding upper matching device. The lower electrode includes a lower RF power supply and a corresponding lower matching device. The method further includes collecting a pulse signal of the pulse power and calculating a matching parameter according to the pulse signal, determining a magnitude of the matching parameter relative to the matching threshold and resetting the pulse count value, causing the upper matching device to perform matching on the upper RF power supply or the lower matching device to perform matching on the lower RF power supply, and repeating processes until the upper RF power supply and the lower RF power supply are matched.
    Type: Application
    Filed: December 24, 2020
    Publication date: April 22, 2021
    Inventors: Xiaoyang CHENG, Gang WEI, Jing WEI, Jinzhi BAI, Jing YANG
  • Patent number: 10879866
    Abstract: A filter circuit is connected between a heating source and a load for filtering the load, and includes an inductor branch and a capacitor branch connected in parallel. The inductor branch includes a one-piece structured integrated component, and the integrated component is configured with a transformer function member and an inductor function member. The inductor function member is connected in series between the heating source and the transformer function member for filtering the load. The transformer function member is connected in parallel with the load for transmitting a heating electric signal output by the heating source to the load.
    Type: Grant
    Filed: April 17, 2019
    Date of Patent: December 29, 2020
    Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
    Inventors: Xiaoyang Cheng, Gang Wei, Haitao Yu
  • Publication number: 20200321194
    Abstract: The present disclosure provides an adjustable capacitor comprising a ferroelectric dielectric layer, a first electrode and a second electrode disposed on opposite sides of the ferroelectric dielectric layer. The adjustable capacitor further comprises a first control electrode and a second control electrode insulated from the first electrode and the second electrode. The first control electrode and the second control electrode are configured to provide an electric field to the ferroelectric dielectric layer, to adjust a dielectric constant of the ferroelectric dielectric layer by controlling an electric field strength, thereby adjusting the capacitance between the first and the second electrodes. The present disclosure also provides an impedance matching device and a semiconductor processing apparatus.
    Type: Application
    Filed: October 18, 2017
    Publication date: October 8, 2020
    Inventors: Gang WEI, Xiaoyang CHENG
  • Patent number: 10699881
    Abstract: An impedance matching system is provided. The impedance matching system includes: an impedance matching device arranged between a radio frequency (RF) power supply and a reaction chamber, adapted to connect the RF power supply to the reaction chamber through a switch, and configured to automatically perform an impedance matching on an output impedance of the RF power supply and an input impedance of the impedance matching device; the switch and a load circuit, the switch being configured to enable the RF power supply to be selectively connected to the reaction chamber or to the load circuit; and a control unit configured to control the switch to connect the RF power supply to the reaction chamber or connect the RF power supply to the load circuit according to a preset timing sequence. The impedance matching device is configured to convert a continuous wave output of the RF power supply into a pulse output according to the preset timing sequence, and provide the pulse output to the reaction chamber.
    Type: Grant
    Filed: May 3, 2016
    Date of Patent: June 30, 2020
    Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
    Inventors: Jing Wei, Xiaoyang Cheng, Xingcun Li, Gang Wei
  • Patent number: 10643822
    Abstract: An impedance matching method and device for a pulsed RF power supply are provided. The impedance matching method includes: a coarse adjustment step: performing adjustment based on a current load impedance to make a current reflection coefficient |?| no greater than an ignition reflection coefficient |?t|, and setting a current position as an ignition position; a fine adjusting step: keeping the ignition position unchanged, performing real-time adjustment based on the current load impedance to realize impedance matching, and setting a current position as a matching position; and a switching step: after impedance matching is realized for the first time, switching between the ignition position and the matching position in different pulse time durations of each subsequent pulse period to realize impedance matching in different pulse periods. The impedance matching method and device may improve matching efficiency, process stability and utilization of the pulsed RF power supply.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: May 5, 2020
    Assignee: BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.
    Inventor: Xiaoyang Cheng
  • Publication number: 20190245505
    Abstract: A filter circuit is connected between a heating source and a load for filtering the load, and includes an inductor branch and a capacitor branch connected in parallel. The inductor branch includes a one-piece structured integrated component, and the integrated component is configured with a transformer function member and an inductor function member. The inductor function member is connected in series between the heating source and the transformer function member for filtering the load. The transformer function member is connected in parallel with the load for transmitting a heating electric signal output by the heating source to the load.
    Type: Application
    Filed: April 17, 2019
    Publication date: August 8, 2019
    Inventors: Xiaoyang CHENG, Gang WEI, Haitao YU
  • Publication number: 20190108977
    Abstract: An impedance matching system is provided. The impedance matching system includes: an impedance matching device arranged between a radio frequency (RF) power supply and a reaction chamber, adapted to connect the RF power supply to the reaction chamber through a switch, and configured to automatically perform an impedance matching on an output impedance of the RF power supply and an input impedance of the impedance matching device; the switch and a load circuit, the switch being configured to enable the RF power supply to be selectively connected to the reaction chamber or to the load circuit; and a control unit configured to control the switch to connect the RF power supply to the reaction chamber or connect the RF power supply to the load circuit according to a preset timing sequence. The impedance matching device is configured to convert a continuous wave output of the RF power supply into a pulse output according to the preset timing sequence, and provide the pulse output to the reaction chamber.
    Type: Application
    Filed: May 3, 2016
    Publication date: April 11, 2019
    Inventors: Jing WEI, Xiaoyang CHENG, Xingcun LI, Gang WEI
  • Publication number: 20170345621
    Abstract: An impedance matching method and device for a pulsed RF power supply are provided. The impedance matching method includes: a coarse adjustment step: performing adjustment based on a current load impedance to make a current reflection coefficient |?| no greater than an ignition reflection coefficient |?t|, and setting a current position as an ignition position; a fine adjusting step: keeping the ignition position unchanged, performing real-time adjustment based on the current load impedance to realize impedance matching, and setting a current position as a matching position; and a switching step: after impedance matching is realized for the first time, switching between the ignition position and the matching position in different pulse time durations of each subsequent pulse period to realize impedance matching in different pulse periods. The impedance matching method and device may improve matching efficiency, process stability and utilization of the pulsed RF power supply.
    Type: Application
    Filed: April 29, 2015
    Publication date: November 30, 2017
    Inventor: Xiaoyang CHENG
  • Patent number: 8454513
    Abstract: A medical device may include a micro-machined substrate, at least one thermo-electric assembly associated with the substrate, and a cooling system configured to configured to remove heat from the a region of the substrate proximal the substrate. According to various aspects, a method of clearing plaque from a blood vessel may include implanting a micro-device in the blood vessel, wherein the micro-device may include at least one ultrasonic transducer, and operably controlling the micro-device to emit high frequency ultrasonic waves for breaking up said plaque.
    Type: Grant
    Filed: December 30, 2005
    Date of Patent: June 4, 2013
    Assignee: STC.UNM
    Inventors: Jingkuang Chen, Xiaoyang Cheng
  • Publication number: 20110191939
    Abstract: An anti-slip elastic sweatband for cap includes a band body, and two anti-slip fabric tapes formed on the band body, wherein each of the anti-slip fabric tapes is wave-like ups and downs, and concavo-convex. The band body is strip-like, and has two first sides and two second sides, wherein a length of each of the first sides is larger than that of each of the second sides. The two anti-slip fabric tapes are spacedly aligned with each other at a direction of each of the first sides, a distance between one of the two anti-slip fabric tapes and an adjacent first side is equal to a distance between the other of the two anti-slip fabric tapes and another adjacent first side, in such a manner that the anti-slip elastic sweatband has a better anti-slip effect. Accordingly, even if the head does strenuous exercises, the cap will not easy to slide.
    Type: Application
    Filed: February 5, 2010
    Publication date: August 11, 2011
    Inventor: Xiaoyang Cheng