Patents by Inventor Xiaoyang Jason Li

Xiaoyang Jason Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for optimizing a patterning device pattern
    Patent number: 11681849
    Abstract: A method for optimizing a patterning device pattern, the method including obtaining an initial design pattern having a plurality of polygons, causing at least some of the polygons to be effectively connected with each other, placing evaluation features outside the boundaries of the polygons, and creating a patterning device pattern spanning across the connected polygons based on the evaluation features.
    Type: Grant
    Filed: October 23, 2017
    Date of Patent: June 20, 2023
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen Hsu, Xiaoyang Jason Li
  • WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATCHING
    Publication number: 20230161264
    Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.
    Type: Application
    Filed: December 28, 2022
    Publication date: May 25, 2023
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen HSU, Christoph Rene Konrad Cebulla Hennerkes, Rafael C. Howell, Zhan Shi, Xiaoyang Jason Li, Frank Staals
  • Wavefront optimization for tuning scanner based on performance matching
    Patent number: 11586114
    Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.
    Type: Grant
    Filed: June 21, 2019
    Date of Patent: February 21, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen Hsu, Christoph Rene Konrad Cebulla Hennerkes, Rafael C. Howell, Zhan Shi, Xiaoyang Jason Li, Frank Staals
  • WAVEFRONT OPTIMIZATION FOR TUNING SCANNER BASED ON PERFORMANCE MATCHING
    Publication number: 20210364929
    Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.
    Type: Application
    Filed: June 21, 2019
    Publication date: November 25, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Stephen HSU, Christoph Rene Konrad Cebulla HENNERKES, Rafael C. HOWELL, Zhan SHI, Xiaoyang Jason LI, Frank STAALS
  • METHOD FOR OPTIMIZING A PATTERNING DEVICE PATTERN
    Publication number: 20210232748
    Abstract: A method for optimizing a patterning device pattern, the method including obtaining an initial design pattern having a plurality of polygons, causing at least some of the polygons to be effectively connected with each other, placing evaluation features outside the boundaries of the polygons, and creating a patterning device pattern spanning across the connected polygons based on the evaluation features.
    Type: Application
    Filed: October 23, 2017
    Publication date: July 29, 2021
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Stephen HSU, Xiaoyang Jason Li