Patents by Inventor Xieqing Zhu

Xieqing Zhu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electron beam lithography apparatus focused through spherical aberration introduction
    Patent number: 6620565
    Abstract: An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: September 16, 2003
    Assignee: Agere Systems, Inc.
    Inventors: Victor Katsap, Eric Munro, John Andrew Rouse, Warren K. Waskiewicz, Xieqing Zhu
  • Electron beam lithography
    Publication number: 20030022077
    Abstract: An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.
    Type: Application
    Filed: July 3, 2002
    Publication date: January 30, 2003
    Inventors: Victor Katsap, Eric Munro, John Andrew Rouse, Warren K. Waskiewicz, Xieqing Zhu
  • Electron beam lithography focusing through spherical aberration introduction
    Patent number: 6440620
    Abstract: An apparatus and method of focusing including a source for producing an electron beam, a mask and a projection column, through which the electron beam passes, and a wafer on which the electron beam is to be focused. The wafer is located in a plane where spherical aberrations of the projection column reduce the negative defocusing effect caused by chromatic aberrations in the projection column. The apparatus and method are applicable to general electron patterning tools, electron patterning tools where a thickness of the mask is smaller than an electron mean free path of the electron patterning tool, and the SCALPEL™ electron patterning tool.
    Type: Grant
    Filed: October 4, 2000
    Date of Patent: August 27, 2002
    Assignee: Agere Systems, Inc.
    Inventors: Victor Katsap, Eric Munro, John Andrew Rouse, Warren K. Waskiewicz, Xieqing Zhu
  • Electron beam imaging apparatus
    Patent number: 6420714
    Abstract: An apparatus for projection lithography is disclosed. The apparatus has at least one magnetic doublet lens. An aperture scatter filter is interposed between the two lenses of the magnetic doublet lens. The aperture scatter filter is in the back focal plane of the magnetic doublet lens system, or in an equivalent conjugate plane thereof. The apparatus also has two magnetic clamps interposed between the two lenses in the magnetic doublet lens. The clamps are positioned and configured to prevent substantial overlap of the magnetic lens fields. The magnetic clamps are positioned so that the magnetic fields from the lenses in the magnetic doublet lens do not extend to the aperture scatter filter.
    Type: Grant
    Filed: June 9, 2000
    Date of Patent: July 16, 2002
    Assignee: Agere Systems Guardian Corp.
    Inventors: Victor Katsap, Eric Munro, John Andrew Rouse, Warren K Waskiewicz, Xieqing Zhu