Patents by Inventor Xima Zhang

Xima Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Simultaneous retargeting of layout features based on process window simulation
    Patent number: 9811615
    Abstract: Various aspects of the disclosed technology relate to techniques of retargeting layout features. A process window simulation on a layout design is performed to generate process window information that comprises predicted print positions of layout features computed under various process conditions. Retargeted print positions for a plurality of edge fragments in the layout design are then determined based on minimizing a combined change of targeted print positions for the plurality of edge fragments under constraints represented based on the process window information and specification limits for printed layout features. Based on the retargeted print positions, positions of the plurality of edge fragments are adjusted for optical proximity correction.
    Type: Grant
    Filed: October 20, 2015
    Date of Patent: November 7, 2017
    Assignee: Mentor Graphics Corporation
    Inventors: George P. Lippincott, Zhitang Yu, Xima Zhang
  • Simultaneous Retargeting Of Layout Features Based On Process Window Simulation
    Publication number: 20170109459
    Abstract: Various aspects of the disclosed technology relate to techniques of retargeting layout features. A process window simulation on a layout design is performed to generate process window information that comprises predicted print positions of layout features computed under various process conditions. Retargeted print positions for a plurality of edge fragments in the layout design are then determined based on minimizing a combined change of targeted print positions for the plurality of edge fragments under constraints represented based on the process window information and specification limits for printed layout features. Based on the retargeted print positions, positions of the plurality of edge fragments are adjusted for optical proximity correction.
    Type: Application
    Filed: October 20, 2015
    Publication date: April 20, 2017
    Inventors: George P. Lippincott, Zhitang Yu, Xima Zhang