Abstract: The present disclosure relates to a method and a device of a 425 nm wavelength reference construction based on fluorescence-induced effect. The method comprises: a continuously tunable laser, an atomic furnace, a chromium atomic beam, an optical frequency comb, a frequency doubling optical path, a bias-preserving fiber beam splitter, a bias-preserving fiber beam combiner, a beat-frequency detection optical path, an optoelectronic receiver, and a frequency counter atomic furnace.

Abstract: The present disclosure relates to a method and a device of a 425 nm wavelength reference construction based on fluorescence-induced effect. The method comprises: a continuously tunable laser, an atomic furnace, a chromium atomic beam, an optical frequency comb, a frequency doubling optical path, a bias-preserving fiber beam splitter, a bias-preserving fiber beam combiner, a beat-frequency detection optical path, an optoelectronic receiver, and a frequency counter atomic furnace.

Abstract: The provided is a 193 nm film with low loss and high reflectivity and its preparation method, including a substrate and a film deposited on the substrate; the film structure is Sub/(HL){circumflex over (?)}n/Air, wherein Sub is the substrate of the film element, Air is the outgoing medium air, H and L are the high refractive index material film layer and the low refractive index material film layer with ¼ central wavelength optical thickness respectively, and n is the number of film stacks of high and low refractive index materials. The provided adopts the above-mentioned 193 nm film with low loss and high reflectivity and its preparation method, which can effectively inhibit the crystallization of LaF3 film in 193 nm high reflective film, thereby reducing the roughness of the reflective film, inhibiting the scattering loss, and improving the reflectivity of the film.

Abstract: The present application discloses a method for calibrating a parameter error of an electron probe microanalysis instrument. A one-dimensional grating standard template is prepared based on atom lithography technology. A theoretical grating period D of the one-dimensional grating standard template is calculated. The one-dimensional grating standard template is statically placed on a stage of the electron probe microanalysis instrument. The electron probe microanalysis instrument scans the one-dimensional grating standard template on the stage, performs image acquisition and measurement on a grid distance of the one-dimensional grating standard template to obtain a grating scanning distance measurement value L, and records a magnification ratio at this time. A calibration factor K under the magnification ratio is calculated according to D and L.

Abstract: The present application discloses a method for calibrating a parameter error of an electron probe microanalysis instrument. A one-dimensional grating standard template is prepared based on atom lithography technology. A theoretical grating period D of the one-dimensional grating standard template is calculated. The one-dimensional grating standard template is statically placed on a stage of the electron probe microanalysis instrument. The electron probe microanalysis instrument scans the one-dimensional grating standard template on the stage, performs image acquisition and measurement on a grid distance of the one-dimensional grating standard template to obtain a grating scanning distance measurement value L, and records a magnification ratio at this time. A calibration factor K under the magnification ratio is calculated according to D and L.

Abstract: A system for precision displacement measurement based on a self-traceable grating interference includes a coherent light source, a photoelectric detection module, a self-traceable grating and a signal processing module. The self-traceable grating is arranged on a to-be-measured displacement motion platform. The coherent light source, the photoelectric detection module and the signal processing module are sequentially connected. Laser generated by the coherent light source propagates through the photoelectric detection module and is incident on the self-traceable grating, diffracts with the self-traceable grating, returns to the photoelectric detection module to continue propagating and enters the signal processing module. The signal processing module collects an interference signal to obtain a motion displacement and a motion direction.

Abstract: A system for precision displacement measurement based on a self-traceable grating interference includes a coherent light source, a photoelectric detection module, a self-traceable grating and a signal processing module. The self-traceable grating is arranged on a to-be-measured displacement motion platform. The coherent light source, the photoelectric detection module and the signal processing module are sequentially connected. Laser generated by the coherent light source propagates through the photoelectric detection module and is incident on the self-traceable grating, diffracts with the self-traceable grating, returns to the photoelectric detection module to continue propagating and enters the signal processing module. The signal processing module collects an interference signal to obtain a motion displacement and a motion direction.

Abstract: A method for manufacturing grating reference materials having a self-traceability includes: acquiring a mask substrate including a window region and a non-window region; fabricating, a self-traceability mask on the mask substrate by using a laser-focused atomic deposition technique; acquiring a photoresist sample including an extreme ultraviolet photoresist and a second substrate; exposing the extreme ultraviolet photoresist by combining the self-traceability mask with the soft x-ray interference lithography, and then performing a development process after exposing to obtain a photoresist grating structure; and transferring the photoresist grating structure to the second substrate to obtain the grating reference materials.