Patents by Inventor Xing Zhong
Xing Zhong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11928513Abstract: Mechanisms are provided for scheduling a workload in a cloud computing system. A cloud affinity factor (CAF) computer model is trained, via a machine learning process based on a training dataset comprising static characteristics of a workload binary for a workload, and dynamic characteristics corresponding to historical performance data for the workload, such that the trained CAF computer model predicts a performance classification for a given workload binary. The trained CAF computer model processes a new workload to generate a performance classification for the new workload. Cloud affinity factor(s) are generated based on the performance classification for the new workload. Node affinity and dispatch rule(s) are applied to the cloud affinity factor(s) to select one or more nodes of the cloud computing system to which to dispatch the workload. The workload is then scheduled on the selected one or more nodes.Type: GrantFiled: December 28, 2022Date of Patent: March 12, 2024Assignee: International Business Machines CorporationInventors: Peng Hui Jiang, Dong Hui Liu, Jia Tian Zhong, Xing Xing Shen, Jia Yu, Yong Yin
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Patent number: 11719402Abstract: An optical assembly, a vehicle lamp and a motor vehicle are disclosed. The optical assembly includes a light guide, the light guide at least having a first light guide section, a second light guide section and a bridging light guide section. The first light guide section and the second light guide section are connected together at one end to form an end region and bifurcating from the end region, the end region having an end face for the in-coupling of light. The bridging light guide section is arranged between the first light guide section and the second light guide section. The bridging light guide section is spaced apart from a bifurcation position of the first light guide section and the second light guide section, and the bridging light guide section has a light in-coupling face facing the bifurcation position, and a light out-coupling face.Type: GrantFiled: April 1, 2020Date of Patent: August 8, 2023Assignee: VALEO VISIONInventors: Xing Zhong, Anna Gu, Hongchao Dong, Qiang Hu, Yagui Gao
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Method for preparing 7alpha-methyl-19-aldehyde-4-androstene-3,17-dione by electrocatalytic oxidation
Patent number: 11578096Abstract: The present invention relates to a method for preparing 7?-methyl-19-aldehyde-4-androstene-3,17-dione by electrocatalytic oxidation. The method specifically includes: adopting an H-shaped electrolytic cell for reaction, in an anode chamber, using a metal oxide catalyst as a working electrode, using 7?-methyl-17,19-dihydroxy-4-androstene-3-one as a reaction substrate, and dissolving it in a mixed solvent to be used as an anolyte, and adding nitroxide radicals to be used as a medium; and in a cathode chamber, using a platinum sheet as a counter electrode, using a weakly alkaline solution as a catholyte, carrying out an electrocatalytic oxidation reaction in a constant temperature water bath, adding an organic solvent at the end of the reaction for extraction to obtain an organic extract liquor, and taking an organic layer and carrying out distilling under a reduced pressure to obtain 7?-methyl-19-aldehyde-4-androstene-3,17-dione.Type: GrantFiled: December 1, 2021Date of Patent: February 14, 2023Assignee: ZHEJIANG UNIVERSITY OF TECHNOLOGYInventors: Jianguo Wang, Suiqin Li, Xing Zhong, Jiahui He -
METHOD FOR PREPARING 7ALPHA-METHYL-19-ALDEHYDE-4-ANDROSTENE-3,17-DIONE BY ELECTROCATALYTIC OXIDATION
Publication number: 20220204546Abstract: The present invention relates to a method for preparing 7?-methyl-19-aldehyde-4-androstene-3,17-dione by electrocatalytic oxidation. The method specifically includes: adopting an H-shaped electrolytic cell for reaction, in an anode chamber, using a metal oxide catalyst as a working electrode, using 7?-methyl-17,19-dihydroxy-4-androstene-3-one as a reaction substrate, and dissolving it in a mixed solvent to be used as an anolyte, and adding nitroxide radicals to be used as a medium; and in a cathode chamber, using a platinum sheet as a counter electrode, using a weakly alkaline solution as a catholyte, carrying out an electrocatalytic oxidation reaction in a constant temperature water bath, adding an organic solvent at the end of the reaction for extraction to obtain an organic extract liquor, and taking an organic layer and carrying out distilling under a reduced pressure to obtain 7?-methyl-19-aldehyde-4-androstene-3,17-dione.Type: ApplicationFiled: December 1, 2021Publication date: June 30, 2022Applicant: ZHEJIANG UNIVERSITY OF TECHNOLOGYInventors: JIANGUO WANG, SUIQIN LI, XING ZHONG, JIAHUI HE -
Publication number: 20220186901Abstract: An optical assembly, a vehicle lamp and a motor vehicle are disclosed. The optical assembly includes a light guide, the light guide at least having a first light guide section, a second light guide section and a bridging light guide section. The first light guide section and the second light guide section are connected together at one end to form an end region and bifurcating from the end region, the end region having an end face for the in-coupling of light. The bridging light guide section is arranged between the first light guide section and the second light guide section. The bridging light guide section is spaced apart from a bifurcation position of the first light guide section and the second light guide section, and the bridging light guide section has a light in-coupling face facing the bifurcation position, and a light out-coupling face.Type: ApplicationFiled: April 1, 2020Publication date: June 16, 2022Applicant: VALEO VISIONInventors: Xing ZHONG, Anna GU, Hongchao DONG, Qiang HU, Yagui GAO
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Patent number: 10504746Abstract: A method for processing a semiconductor substrate is described herein. The method described herein includes generating fluorine radicals and ions, delivering the fluorine radicals through an ion blocker to a processing region, and removing one or more portions of a gate structure to expose one or more portions of a gate dielectric material disposed thereunder. The gate structure includes at least two ceramic or metal layers, and the gate dielectric material is made of a high-k dielectric material. A substrate having the gate structure and gate dielectric material formed thereon is disposed in the processing region, and the temperature of the substrate is maintained at about 60 degrees Celsius or higher. By etching the gate structure using fluorine radicals at a temperature greater or equal to 60 degrees Celsius, the at least two ceramic or metal layers have a flat cross sectional profile.Type: GrantFiled: April 11, 2017Date of Patent: December 10, 2019Assignee: APPLIED MATERIALS, INC.Inventors: Zhenjiang Cui, Xing Zhong, Jie Liu, Linlin Wang
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Patent number: 10249507Abstract: The present disclosure provides methods for etching features in a silicon material includes performing a remote plasma process formed from an etching gas mixture including chlorine containing gas to remove a silicon material disposed on a substrate.Type: GrantFiled: April 25, 2017Date of Patent: April 2, 2019Assignee: Applied Materials, Inc.Inventors: Zihui Li, Xing Zhong, Anchuan Wang, Nitin K. Ingle
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Publication number: 20170294320Abstract: A method for processing a semiconductor substrate is described herein. The method described herein includes generating fluorine radicals and ions, delivering the fluorine radicals through an ion blocker to a processing region, and removing one or more portions of a gate structure to expose one or more portions of a gate dielectric material disposed thereunder. The gate structure includes at least two ceramic or metal layers, and the gate dielectric material is made of a high-k dielectric material. A substrate having the gate structure and gate dielectric material formed thereon is disposed in the processing region, and the temperature of the substrate is maintained at about 60 degrees Celsius or higher. By etching the gate structure using fluorine radicals at a temperature greater or equal to 60 degrees Celsius, the at least two ceramic or metal layers have a flat cross sectional profile.Type: ApplicationFiled: April 11, 2017Publication date: October 12, 2017Inventors: Zhenjiang CUI, Xing ZHONG, Jie LIU, Linlin WANG
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Publication number: 20170291199Abstract: A method for removing halogen from a surface of a substrate is described herein. The method described herein includes flowing oxygen gas and an inert gas such as nitrogen gas into a RPS. The gases in the RPS are energized to form oxygen radicals and nitrogen radicals. The oxygen and nitrogen radicals are used to remove halogen content on the surface of the substrate. The chamber pressure of the halogen content removal process is very low, ranging from about 50 mTorr to about 100 mTorr. By using oxygen gas and an inert gas and with a low chamber pressure, the halogen content on the surface of the substrate is reduced while keeping the oxidation level of the surface of the substrate to at most 10 Angstroms.Type: ApplicationFiled: April 11, 2017Publication date: October 12, 2017Inventors: Xing ZHONG, Zhijun CHEN, Zhenjiang CUI, Nitin K. INGLE
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Publication number: 20170229313Abstract: The present disclosure provides methods for etching features in a silicon material includes performing a remote plasma process formed from an etching gas mixture including chlorine containing gas to remove a silicon material disposed on a substrate.Type: ApplicationFiled: April 25, 2017Publication date: August 10, 2017Inventors: Zihui LI, Xing ZHONG, Anchuan WANG, Nitin K. INGLE
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Patent number: 9653310Abstract: The present disclosure provides methods for etching features in a silicon material includes performing a remote plasma process formed from an etching gas mixture including chlorine containing gas to remove a silicon material disposed on a substrate.Type: GrantFiled: December 7, 2015Date of Patent: May 16, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Zihui Li, Xing Zhong, Anchuan Wang, Nitin K. Ingle
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Publication number: 20170133232Abstract: The present disclosure provides methods for etching features in a silicon material includes performing a remote plasma process formed from an etching gas mixture including chlorine containing gas to remove a silicon material disposed on a substrate.Type: ApplicationFiled: December 7, 2015Publication date: May 11, 2017Inventors: Zihui LI, Xing ZHONG, Anchuan WANG, Nitin K. INGLE
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Publication number: 20170033370Abstract: A metal-air battery includes: (1) a metal anode; (2) a cathode including a graphene membrane; and (3) an electrolyte disposed between the metal anode and the cathode, where the graphene membrane includes graphene in an amount of at least 80% by weight of the graphene membrane.Type: ApplicationFiled: April 3, 2015Publication date: February 2, 2017Inventors: Xiangfeng Duan, Xing Zhong, Yuxi Xu
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Publication number: 20160164084Abstract: A silicide-air battery includes an anode, a cathode, and an electrolyte disposed between the anode and the cathode. The anode includes a metal silicide represented as MxSiy, where M is at least one metal selected from alkaline earth metals, transition metals, and post-transition metals.Type: ApplicationFiled: July 24, 2014Publication date: June 9, 2016Inventors: Xiangfeng DUAN, Yu HUANG, Hua ZHANG, Xing ZHONG
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Publication number: 20100060834Abstract: The present invention relates to a novel polyimide copolymer, a method of preparing the polyimide copolymer, a liquid crystal aligning layer including the polyimide copolymer, a method of producing the liquid crystal aligning layer, and a liquid crystal display including the liquid crystal aligning layer. The liquid crystal aligning layer that includes the polyimide copolymer according to the present invention is advantageous in that when ultraviolet rays are radiated on movable chains of the polyamic acid copolymer to perform alignment before a polyimide copolymer is imidized and heat treatment is then performed to conduct imidization, thermal stability is excellent, residual images are not formed, and alignment of liquid crystals is excellent.Type: ApplicationFiled: January 7, 2008Publication date: March 11, 2010Inventors: Xing-Zhong Fang, Kyung-Jun Kim, Byung-Hyun Lee, Jung-Ho Jo, Dong-Hyun Oh, Wan-Hee Goh, Sang-Kook Kim, Hye-Ran Seong, Hye-Won Jeong, Yun-Jeong Lee
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Patent number: 7302840Abstract: An aerodynamic or hydrodynamic test apparatus that permits all air to be evacuated from the test enclosure, such that no free liquid surfaces remain. This permits more accurate testing of structures, particularly at low Reynolds numbers. The apparatus includes a seal that allows the elimination of a liquid free surface. The seal is disposed in a slit on an upper surface of the enclosure and can include one or more inflatable sealing members. The upper surface of the enclosure is preferably sloped upwardly towards the seal to prevent the entrapment of air bubbles within the enclosure. A method of testing using such an apparatus is also disclosed.Type: GrantFiled: November 30, 2006Date of Patent: December 4, 2007Assignee: National Research Council of CanadaInventors: Ernest S. Hanff, Xing Zhong Huang
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Patent number: 7284224Abstract: A printed circuit board (PCB) includes a base board, a conductive pattern arranged on the base board, and a number of metal pads arranged on the base board. The conductive pattern includes a number of vias and traces. The metal pads are evenly arrayed where there is a sparsity of vias and traces to balance a current during a plating process for achieving an even plating thickness. A method of designing the PCB includes: simulating a PCB with electronic components using a software, simulating vias, traces, and metal pads, and testing the electrical characteristics of the whole simulation. If the simulated PCB fails testing then it is redesigned. Once a simulated PCB passes testing then it is ready to be manufactured.Type: GrantFiled: December 7, 2005Date of Patent: October 16, 2007Assignees: Hong Fu Jin Precision Industry (Shenzhen) Co., Ltd., Hon Hai Precision Industry Co., Ltd.Inventors: Ping Wang, Wei-Xing Zhong
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Publication number: 20070161775Abstract: Disclosed is polyimide of the following Formula 1, a polyamic acid which is a precursor of the polyimide, and a method for preparing thereof. In Formula 1, R is a tetravalent organic group, and n is an integer of 1 to 1000. A liquid crystal alignment layer which contains the polyimide according to the present invention has excellent thermal stability, no residual images, and excellent alignment of liquid crystals.Type: ApplicationFiled: November 30, 2006Publication date: July 12, 2007Inventors: Xing-Zhong Fang, Byung-Hyun Lee, Kyung-Jun Kim, Hye-Won Jeong, Yun-Jeong Lee
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Publication number: 20060118328Abstract: A printed circuit board (PCB) includes a base board, a conductive pattern arranged on the base board, and a number of metal pads arranged on the base board. The conductive pattern includes a number of vias and traces. The metal pads are evenly arrayed where there is a sparsity of vias and traces to balance a current during a plating process for achieving an even plating thickness. A method of designing the PCB includes: simulating a PCB with electronic components using a software, simulating vias, traces, and metal pads, and testing the electrical characteristics of the whole simulation. If the simulated PCB fails testing then it is redesigned. Once a simulated PCB passes testing then it is ready to be manufactured.Type: ApplicationFiled: December 7, 2005Publication date: June 8, 2006Applicant: HON HAI Precision Industry CO., LTD.Inventors: Ping Wang, Wei-Xing Zhong
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Patent number: D629769Type: GrantFiled: November 12, 2008Date of Patent: December 28, 2010Assignee: Shenzhen TCL New Technology Co., Ltd.Inventor: Xing Zhong