Patents by Inventor Xing Zhong

Xing Zhong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11928513
    Abstract: Mechanisms are provided for scheduling a workload in a cloud computing system. A cloud affinity factor (CAF) computer model is trained, via a machine learning process based on a training dataset comprising static characteristics of a workload binary for a workload, and dynamic characteristics corresponding to historical performance data for the workload, such that the trained CAF computer model predicts a performance classification for a given workload binary. The trained CAF computer model processes a new workload to generate a performance classification for the new workload. Cloud affinity factor(s) are generated based on the performance classification for the new workload. Node affinity and dispatch rule(s) are applied to the cloud affinity factor(s) to select one or more nodes of the cloud computing system to which to dispatch the workload. The workload is then scheduled on the selected one or more nodes.
    Type: Grant
    Filed: December 28, 2022
    Date of Patent: March 12, 2024
    Assignee: International Business Machines Corporation
    Inventors: Peng Hui Jiang, Dong Hui Liu, Jia Tian Zhong, Xing Xing Shen, Jia Yu, Yong Yin
  • Patent number: 11719402
    Abstract: An optical assembly, a vehicle lamp and a motor vehicle are disclosed. The optical assembly includes a light guide, the light guide at least having a first light guide section, a second light guide section and a bridging light guide section. The first light guide section and the second light guide section are connected together at one end to form an end region and bifurcating from the end region, the end region having an end face for the in-coupling of light. The bridging light guide section is arranged between the first light guide section and the second light guide section. The bridging light guide section is spaced apart from a bifurcation position of the first light guide section and the second light guide section, and the bridging light guide section has a light in-coupling face facing the bifurcation position, and a light out-coupling face.
    Type: Grant
    Filed: April 1, 2020
    Date of Patent: August 8, 2023
    Assignee: VALEO VISION
    Inventors: Xing Zhong, Anna Gu, Hongchao Dong, Qiang Hu, Yagui Gao
  • Patent number: 11578096
    Abstract: The present invention relates to a method for preparing 7?-methyl-19-aldehyde-4-androstene-3,17-dione by electrocatalytic oxidation. The method specifically includes: adopting an H-shaped electrolytic cell for reaction, in an anode chamber, using a metal oxide catalyst as a working electrode, using 7?-methyl-17,19-dihydroxy-4-androstene-3-one as a reaction substrate, and dissolving it in a mixed solvent to be used as an anolyte, and adding nitroxide radicals to be used as a medium; and in a cathode chamber, using a platinum sheet as a counter electrode, using a weakly alkaline solution as a catholyte, carrying out an electrocatalytic oxidation reaction in a constant temperature water bath, adding an organic solvent at the end of the reaction for extraction to obtain an organic extract liquor, and taking an organic layer and carrying out distilling under a reduced pressure to obtain 7?-methyl-19-aldehyde-4-androstene-3,17-dione.
    Type: Grant
    Filed: December 1, 2021
    Date of Patent: February 14, 2023
    Assignee: ZHEJIANG UNIVERSITY OF TECHNOLOGY
    Inventors: Jianguo Wang, Suiqin Li, Xing Zhong, Jiahui He
  • Publication number: 20220204546
    Abstract: The present invention relates to a method for preparing 7?-methyl-19-aldehyde-4-androstene-3,17-dione by electrocatalytic oxidation. The method specifically includes: adopting an H-shaped electrolytic cell for reaction, in an anode chamber, using a metal oxide catalyst as a working electrode, using 7?-methyl-17,19-dihydroxy-4-androstene-3-one as a reaction substrate, and dissolving it in a mixed solvent to be used as an anolyte, and adding nitroxide radicals to be used as a medium; and in a cathode chamber, using a platinum sheet as a counter electrode, using a weakly alkaline solution as a catholyte, carrying out an electrocatalytic oxidation reaction in a constant temperature water bath, adding an organic solvent at the end of the reaction for extraction to obtain an organic extract liquor, and taking an organic layer and carrying out distilling under a reduced pressure to obtain 7?-methyl-19-aldehyde-4-androstene-3,17-dione.
    Type: Application
    Filed: December 1, 2021
    Publication date: June 30, 2022
    Applicant: ZHEJIANG UNIVERSITY OF TECHNOLOGY
    Inventors: JIANGUO WANG, SUIQIN LI, XING ZHONG, JIAHUI HE
  • Publication number: 20220186901
    Abstract: An optical assembly, a vehicle lamp and a motor vehicle are disclosed. The optical assembly includes a light guide, the light guide at least having a first light guide section, a second light guide section and a bridging light guide section. The first light guide section and the second light guide section are connected together at one end to form an end region and bifurcating from the end region, the end region having an end face for the in-coupling of light. The bridging light guide section is arranged between the first light guide section and the second light guide section. The bridging light guide section is spaced apart from a bifurcation position of the first light guide section and the second light guide section, and the bridging light guide section has a light in-coupling face facing the bifurcation position, and a light out-coupling face.
    Type: Application
    Filed: April 1, 2020
    Publication date: June 16, 2022
    Applicant: VALEO VISION
    Inventors: Xing ZHONG, Anna GU, Hongchao DONG, Qiang HU, Yagui GAO
  • Patent number: 10504746
    Abstract: A method for processing a semiconductor substrate is described herein. The method described herein includes generating fluorine radicals and ions, delivering the fluorine radicals through an ion blocker to a processing region, and removing one or more portions of a gate structure to expose one or more portions of a gate dielectric material disposed thereunder. The gate structure includes at least two ceramic or metal layers, and the gate dielectric material is made of a high-k dielectric material. A substrate having the gate structure and gate dielectric material formed thereon is disposed in the processing region, and the temperature of the substrate is maintained at about 60 degrees Celsius or higher. By etching the gate structure using fluorine radicals at a temperature greater or equal to 60 degrees Celsius, the at least two ceramic or metal layers have a flat cross sectional profile.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: December 10, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Zhenjiang Cui, Xing Zhong, Jie Liu, Linlin Wang
  • Patent number: 10249507
    Abstract: The present disclosure provides methods for etching features in a silicon material includes performing a remote plasma process formed from an etching gas mixture including chlorine containing gas to remove a silicon material disposed on a substrate.
    Type: Grant
    Filed: April 25, 2017
    Date of Patent: April 2, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Zihui Li, Xing Zhong, Anchuan Wang, Nitin K. Ingle
  • Publication number: 20170294320
    Abstract: A method for processing a semiconductor substrate is described herein. The method described herein includes generating fluorine radicals and ions, delivering the fluorine radicals through an ion blocker to a processing region, and removing one or more portions of a gate structure to expose one or more portions of a gate dielectric material disposed thereunder. The gate structure includes at least two ceramic or metal layers, and the gate dielectric material is made of a high-k dielectric material. A substrate having the gate structure and gate dielectric material formed thereon is disposed in the processing region, and the temperature of the substrate is maintained at about 60 degrees Celsius or higher. By etching the gate structure using fluorine radicals at a temperature greater or equal to 60 degrees Celsius, the at least two ceramic or metal layers have a flat cross sectional profile.
    Type: Application
    Filed: April 11, 2017
    Publication date: October 12, 2017
    Inventors: Zhenjiang CUI, Xing ZHONG, Jie LIU, Linlin WANG
  • Publication number: 20170291199
    Abstract: A method for removing halogen from a surface of a substrate is described herein. The method described herein includes flowing oxygen gas and an inert gas such as nitrogen gas into a RPS. The gases in the RPS are energized to form oxygen radicals and nitrogen radicals. The oxygen and nitrogen radicals are used to remove halogen content on the surface of the substrate. The chamber pressure of the halogen content removal process is very low, ranging from about 50 mTorr to about 100 mTorr. By using oxygen gas and an inert gas and with a low chamber pressure, the halogen content on the surface of the substrate is reduced while keeping the oxidation level of the surface of the substrate to at most 10 Angstroms.
    Type: Application
    Filed: April 11, 2017
    Publication date: October 12, 2017
    Inventors: Xing ZHONG, Zhijun CHEN, Zhenjiang CUI, Nitin K. INGLE
  • Publication number: 20170229313
    Abstract: The present disclosure provides methods for etching features in a silicon material includes performing a remote plasma process formed from an etching gas mixture including chlorine containing gas to remove a silicon material disposed on a substrate.
    Type: Application
    Filed: April 25, 2017
    Publication date: August 10, 2017
    Inventors: Zihui LI, Xing ZHONG, Anchuan WANG, Nitin K. INGLE
  • Patent number: 9653310
    Abstract: The present disclosure provides methods for etching features in a silicon material includes performing a remote plasma process formed from an etching gas mixture including chlorine containing gas to remove a silicon material disposed on a substrate.
    Type: Grant
    Filed: December 7, 2015
    Date of Patent: May 16, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Zihui Li, Xing Zhong, Anchuan Wang, Nitin K. Ingle
  • Publication number: 20170133232
    Abstract: The present disclosure provides methods for etching features in a silicon material includes performing a remote plasma process formed from an etching gas mixture including chlorine containing gas to remove a silicon material disposed on a substrate.
    Type: Application
    Filed: December 7, 2015
    Publication date: May 11, 2017
    Inventors: Zihui LI, Xing ZHONG, Anchuan WANG, Nitin K. INGLE
  • Publication number: 20170033370
    Abstract: A metal-air battery includes: (1) a metal anode; (2) a cathode including a graphene membrane; and (3) an electrolyte disposed between the metal anode and the cathode, where the graphene membrane includes graphene in an amount of at least 80% by weight of the graphene membrane.
    Type: Application
    Filed: April 3, 2015
    Publication date: February 2, 2017
    Inventors: Xiangfeng Duan, Xing Zhong, Yuxi Xu
  • Publication number: 20160164084
    Abstract: A silicide-air battery includes an anode, a cathode, and an electrolyte disposed between the anode and the cathode. The anode includes a metal silicide represented as MxSiy, where M is at least one metal selected from alkaline earth metals, transition metals, and post-transition metals.
    Type: Application
    Filed: July 24, 2014
    Publication date: June 9, 2016
    Inventors: Xiangfeng DUAN, Yu HUANG, Hua ZHANG, Xing ZHONG
  • Publication number: 20100060834
    Abstract: The present invention relates to a novel polyimide copolymer, a method of preparing the polyimide copolymer, a liquid crystal aligning layer including the polyimide copolymer, a method of producing the liquid crystal aligning layer, and a liquid crystal display including the liquid crystal aligning layer. The liquid crystal aligning layer that includes the polyimide copolymer according to the present invention is advantageous in that when ultraviolet rays are radiated on movable chains of the polyamic acid copolymer to perform alignment before a polyimide copolymer is imidized and heat treatment is then performed to conduct imidization, thermal stability is excellent, residual images are not formed, and alignment of liquid crystals is excellent.
    Type: Application
    Filed: January 7, 2008
    Publication date: March 11, 2010
    Inventors: Xing-Zhong Fang, Kyung-Jun Kim, Byung-Hyun Lee, Jung-Ho Jo, Dong-Hyun Oh, Wan-Hee Goh, Sang-Kook Kim, Hye-Ran Seong, Hye-Won Jeong, Yun-Jeong Lee
  • Patent number: 7302840
    Abstract: An aerodynamic or hydrodynamic test apparatus that permits all air to be evacuated from the test enclosure, such that no free liquid surfaces remain. This permits more accurate testing of structures, particularly at low Reynolds numbers. The apparatus includes a seal that allows the elimination of a liquid free surface. The seal is disposed in a slit on an upper surface of the enclosure and can include one or more inflatable sealing members. The upper surface of the enclosure is preferably sloped upwardly towards the seal to prevent the entrapment of air bubbles within the enclosure. A method of testing using such an apparatus is also disclosed.
    Type: Grant
    Filed: November 30, 2006
    Date of Patent: December 4, 2007
    Assignee: National Research Council of Canada
    Inventors: Ernest S. Hanff, Xing Zhong Huang
  • Patent number: 7284224
    Abstract: A printed circuit board (PCB) includes a base board, a conductive pattern arranged on the base board, and a number of metal pads arranged on the base board. The conductive pattern includes a number of vias and traces. The metal pads are evenly arrayed where there is a sparsity of vias and traces to balance a current during a plating process for achieving an even plating thickness. A method of designing the PCB includes: simulating a PCB with electronic components using a software, simulating vias, traces, and metal pads, and testing the electrical characteristics of the whole simulation. If the simulated PCB fails testing then it is redesigned. Once a simulated PCB passes testing then it is ready to be manufactured.
    Type: Grant
    Filed: December 7, 2005
    Date of Patent: October 16, 2007
    Assignees: Hong Fu Jin Precision Industry (Shenzhen) Co., Ltd., Hon Hai Precision Industry Co., Ltd.
    Inventors: Ping Wang, Wei-Xing Zhong
  • Publication number: 20070161775
    Abstract: Disclosed is polyimide of the following Formula 1, a polyamic acid which is a precursor of the polyimide, and a method for preparing thereof. In Formula 1, R is a tetravalent organic group, and n is an integer of 1 to 1000. A liquid crystal alignment layer which contains the polyimide according to the present invention has excellent thermal stability, no residual images, and excellent alignment of liquid crystals.
    Type: Application
    Filed: November 30, 2006
    Publication date: July 12, 2007
    Inventors: Xing-Zhong Fang, Byung-Hyun Lee, Kyung-Jun Kim, Hye-Won Jeong, Yun-Jeong Lee
  • Publication number: 20060118328
    Abstract: A printed circuit board (PCB) includes a base board, a conductive pattern arranged on the base board, and a number of metal pads arranged on the base board. The conductive pattern includes a number of vias and traces. The metal pads are evenly arrayed where there is a sparsity of vias and traces to balance a current during a plating process for achieving an even plating thickness. A method of designing the PCB includes: simulating a PCB with electronic components using a software, simulating vias, traces, and metal pads, and testing the electrical characteristics of the whole simulation. If the simulated PCB fails testing then it is redesigned. Once a simulated PCB passes testing then it is ready to be manufactured.
    Type: Application
    Filed: December 7, 2005
    Publication date: June 8, 2006
    Applicant: HON HAI Precision Industry CO., LTD.
    Inventors: Ping Wang, Wei-Xing Zhong
  • Patent number: D629769
    Type: Grant
    Filed: November 12, 2008
    Date of Patent: December 28, 2010
    Assignee: Shenzhen TCL New Technology Co., Ltd.
    Inventor: Xing Zhong