Abstract: An iodine gas detection system is configured to detect iodine atoms, and the system includes a housing having an aperture, an iodine sensitive sensor located within the housing and configured to directly interact with the iodine atoms that enter through the aperture within the housing, a processor located within the housing and configured to process data collected from the iodine sensitive sensor, and a memory located within the housing and configured to store a result generated by the processor. The iodine sensitive sensor includes plural layers of reduced graphene oxide, rGO, disposed substantially parallel to each other, Ag nanoparticles distributed among the plural layers of rGO, and a surfactant polymer selected to be a surfactant and distributed among the plural layers of rGO.

Abstract: The present invention provides a wafer transfer device.

Abstract: Apparatus and methods for gas distribution assemblies are provided. In one aspect, a gas distribution assembly is provided comprising an annular body comprising an annular ring having an inner annular wall, an outer wall, an upper surface, and a bottom surface, an upper recess formed into the upper surface, and a seat formed into the inner annular wall, an upper plate positioned in the upper recess, comprising a disk-shaped body having a plurality of first apertures formed therethrough, and a bottom plate positioned on the seat, comprising a disk-shaped body having a plurality of second apertures formed therethrough which align with the first apertures, and a plurality of third apertures formed between the second apertures and through the bottom plate, the bottom plate sealingly coupled to the upper plate to fluidly isolate the plurality of first and second apertures from the plurality of third apertures.

Abstract: The wafer transfer device includes a first supporting mechanism, a second supporting mechanism, a first picking-conveying mechanism and a second picking-conveying mechanism, wherein the first picking-conveying mechanism and the second picking-conveying mechanism include tail end execution parts facing opposite directions. The wafer transfer device further includes a rotating mechanism and a rotating driving part, wherein the first supporting mechanism and the second supporting mechanism are fixedly arranged at the rotating mechanism, and the rotating driving part drives the rotating mechanism to rotate and then drives the first supporting mechanism and the second supporting mechanism to rotate synchronously. The wafer transfer device can extend the picking and conveying range of a wafer, thus facilitating the improvement of the productivity.

Abstract: A cylinder porous cylinder, a gas flow control valve, and a mounting method for the gas flow control valve. The porous cylinder (1) includes a plurality of pipe bundles filled inside the pipe. A single flow passage is formed in each of the pipe bundles, such that a seepage passage is formed inside the pipe. The inner diameter, length and permeability of the pipe bundle are determined in advance based on a Reynolds number smaller than 2300. The porous cylinder (1) is capable of implementing a stable gas flow in a gas injection channel. The valve body (21) of the gas flow control valve (2) is provided therein with a plurality of tubular passages arranged in sequence along the horizontal direction of the valve body. The tubular passages include a pipe flow passage (24) and a plurality of seepage passages (25). The porous cylinder (1) is mounted in each of the seepage passages (25). A plurality of connection channels (221) are provided in the valve cap.

Abstract: A phase power device, comprising: a circulation pipe (1) and a preset number of phase power control components (2), wherein the circulation pipe (1) is used to provide a channel for fluid circulation flow, and the preset number of phase power control components (2) are disposed on the circulation pipe (1) and used to drive fluid in the circulation pipe (1) to circulate and flow. Further provided is a fluid experiment system, comprising the phase power device. The phase power device and the fluid experiment system may enable the fluid to meet a set flow requirement during the experiment, thus reducing the use of auxiliary equipment, and reducing experiment costs.

Abstract: The disclosure provides a temperature compensation system, including a cavity, a temperature feedback module, a heating plate, a main heating module, a multi-zone temperature control module, a distributed temperature control module and at least one auxiliary temperature adjustment module, wherein at least one temperature control compensation area is arranged at a bottom surface of the heating plate, and the auxiliary temperature adjustment module and the temperature control compensation area are arranged in a correspondence manner; the temperature feedback module performs temperature detection on the heating plate to obtain a first temperature value and a second temperature value; the multi-zone temperature control module controls the main heating module to perform temperature adjustment on the heating plate according to the first temperature value, and the distributed temperature control module controls the auxiliary temperature adjustment module to perform temperature compensation adjustment on the temperat

Abstract: The disclosure provides a semiconductor substrate heating device, comprising a heating cavity, a main heating part, a compensation control part and at least one temperature compensation unit. The compensation control part and several temperature compensation units are arranged in the heating cavity of the semiconductor substrate heating device, a top surface of the compensation control part and a bottom surface of a heating plate are arranged in a correspondence manner, and the several temperature compensation units arranged between the heating plate and the compensation control part and being in communication connection with the compensation control part are arranged in one-to-one correspondence with several temperature control compensation areas at the bottom surface of the heating plate.

Abstract: A calcium metaborate birefringent crystal and a preparation method and use thereof, the crystal having a chemical formula of CaB2O4 and a molecular weight of 125.70, and belonging to the orthorhombic crystal system and space group Pbcn with unit-cell parameters a=11.60(4)?, b=4.28(8)?, c=6.21(6)?, and Z=4, wherein the calcium metaborate birefringent crystal is a negative biaxial crystal with a transmission range of 165-3400 nm and a birefringence between 0.09-0.36; the crystal is applicable to infrared-visible-ultraviolet-deep ultraviolet bands, and is grown by a melt method, a flux method, a Bridgman method or a heat exchange method; the crystal obtained by the method of the present invention is easy to grow and easy to process; and can be used for making polarizing beam-splitting prisms.

Abstract: The present invention provides a wafer transfer device.

Abstract: The present invention provides a wafer transfer device.

Abstract: A cylinder porous cylinder, a gas flow control valve, and a mounting method for the gas flow control valve. The porous cylinder (1) includes a plurality of pipe bundles filled inside the pipe. A single flow passage is formed in each of the pipe bundles, such that a seepage passage is formed inside the pipe. The inner diameter, length and permeability of the pipe bundle are determined in advance based on a Reynolds number smaller than 2300. The porous cylinder (1) is capable of implementing a stable gas flow in a gas injection channel. The valve body (21) of the gas flow control valve (2) is provided therein with a plurality of tubular passages arranged in sequence along the horizontal direction of the valve body. The tubular passages include a pipe flow passage (24) and a plurality of seepage passages (25). The porous cylinder (1) is mounted in each of the seepage passages (25). A plurality of connection channels (221) are provided in the valve cap.

Abstract: A phase power device, comprising: a circulation pipe (1) and a preset number of phase power control components (2), wherein the circulation pipe (1) is used to provide a channel for fluid circulation flow, and the preset number of phase power control components (2) are disposed on the circulation pipe (1) and used to drive fluid in the circulation pipe (1) to circulate and flow. Further provided is a fluid experiment system, comprising the phase power device. The phase power device and the fluid experiment system may enable the fluid to meet a set flow requirement during the experiment, thus reducing the use of auxiliary equipment, and reducing experiment costs.

Abstract: A method and an apparatus for oil production by increasing resistance of borehole wall for improving an energy utilization rate of injection gas includes injecting gas into an oil reservoir so that a gas pressure in the oil reservoir reaches an initial oil reservoir pressure. The initial oil seepage pressure is present at a position where the inside of the production well is in communication with the oil reservoir. The initial oil seepage pressure is less than the initial oil reservoir pressure. The method also includes monitoring gas production and oil production of the production well and increasing the initial oil seepage pressure to an increased oil seepage pressure when a ratio of the gas production to the oil production is higher than a predetermined ratio. The increased oil seepage pressure is smaller than the initial oil reservoir pressure.

Abstract: A gasflow distribution device includes an outer pipe, a gland, a filter screen, and a filling block with a pore structure. The outer pipe is a hollow outer pipe, used for placing the filling block, with an open upper end and a lower end with a bottom of which the center part is provided with a bottom hole, wherein the filling block is sealed to an inner wall of the outer pipe. The gland has a bottom end provided with a circular groove for setting the filter screen, and a top end distributed evenly with a plurality of top holes through the gland. The gland is connected to the outer pipe. The device can distribute gasflow proportionally, and can be used for separate-layer gas injection.

Abstract: The embodiments of the present disclosure disclose an ultrasonic microbubble generation method, apparatus and system. The apparatus comprises a horn-shaped conductor including an upper horn-shaped body and a lower cylindrical body; the horn-shaped body is provided with a cavity having an upper opening, an upper end of the cavity is fixedly connected with a micropore vibration thin sheet, a micropore array of the micropore vibration thin sheet is corresponding to the upper opening of the cavity, and a side wall of the cavity is provided with a through hole for external gas to enter the cavity; the cylindrical body is provided with a transducing ring and an electrode sheet, an outer side of the cylindrical body is insulated and sealed, and a connection wire of the electrode sheet is led out by a steel pipe and connected with an external ultrasonic oscillation controller.

Abstract: Gas distribution assemblies are described including an annular body, an upper plate, and a lower plate. The upper plate may define a first plurality of apertures, and the lower plate may define a second and third plurality of apertures. The upper and lower plates may be coupled with one another and the annular body such that the first and second apertures produce channels through the gas distribution assemblies, and a volume is defined between the upper and lower plates.

Abstract: The present disclosure provides a microbubble generation device and equipment, wherein the microbubble generation device comprises: a microbubble generation mechanism having a housing and a core tube provided to pass therethrough, wherein at least one filter plate is provided on a peripheral sidewall of the housing, and an annular space is formed between the housing and the core tube; a flow rate control mechanism provided in the annular space, and connected to the core tube that is communicated with the annular space through the flow rate control mechanism, wherein a blocking ball is provided in the flow rate control mechanism and capable of blocking the flow rate control mechanism in a state that a pressure of gas injected into the flow rate control mechanism decreases; and a pressure balancing mechanism provided outside the housing and having a pressure balancing tube and a fluid check valve connected thereto.

Abstract: A system and method of performing oil displacement by a water-gas dispersion system includes a micro-bubble generation apparatus, a gas source, an ultrasonic oscillation controller, a protective barrel and a support. A first opening is provided in a top end of the protective barrel, into which an internal apparatus enters and is extracted, the first opening is sealed by an end cover. A second opening communicating with a water flooding pipeline is provided in a side wall of the protective barrel, into which fluid flows and from which the fluid exits. The micro-bubble generation apparatus is fixed within the protective barrel by the support. The gas source is connected with the micro-bubble generation apparatus through a gas pipeline, for transporting gas to the micro-bubble generation apparatus. The ultrasonic oscillation controller is connected to the micro-bubble generation apparatus through a signal line, for controlling the micro-bubble generation apparatus to generate micro-bubbles.

Abstract: An exemplary system may include a chamber configured to contain a semiconductor substrate in a processing region of the chamber. The system may include a first remote plasma unit fluidly coupled with a first access of the chamber and configured to deliver a first precursor into the chamber through the first access. The system may still further include a second remote plasma unit fluidly coupled with a second access of the chamber and configured to deliver a second precursor into the chamber through the second access. The first and second access may be fluidly coupled with a mixing region of the chamber that is separate from and fluidly coupled with the processing region of the chamber. The mixing region may be configured to allow the first and second precursors to interact with each other externally from the processing region of the chamber.