Patents by Inventor Xinjian Zhou

Xinjian Zhou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10859926
    Abstract: A method of defect validation for a device manufacturing process, the method including: obtaining a first image of a pattern processed into an area on a substrate using the device manufacturing process under a first condition; obtaining a metrology image from the area; aligning the metrology image and the first image; and determining from the first image and the metrology image whether the area contains a defect, based on one or more classification criteria.
    Type: Grant
    Filed: May 25, 2016
    Date of Patent: December 8, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Stefan Hunsche, Rafael Aldana Laso, Vivek Kumar Jain, Marinus Jochemsen, Xinjian Zhou
  • Patent number: 10401732
    Abstract: Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The current embodiments include several flows including optimizing a source, a mask, and the projection optics and various sequential and iterative optimization steps combining any of the projection optics, mask and source. The projection optics is sometimes broadly referred to as “lens”, and therefore the optimization process may be termed source mask lens optimization (SMLO). SMLO may be desirable over existing source mask optimization process (SMO) or other optimization processes that do not include projection optics optimization, partially because including the projection optics in the optimization may lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics.
    Type: Grant
    Filed: March 6, 2017
    Date of Patent: September 3, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Duan-Fu Hsu, Luoqi Chen, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen
  • Publication number: 20180173104
    Abstract: A method of defect validation for a device manufacturing process, the method including: obtaining a first image of a pattern processed into an area on a substrate using the device manufacturing process under a first condition; obtaining a metrology image from the area; aligning the metrology image and the first image; and determining from the first image and the metrology image whether the area contains a defect, based on one or more classification criteria.
    Type: Application
    Filed: May 25, 2016
    Publication date: June 21, 2018
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Stefan HUNSCHE, Rafael ALDANA LASO, Vivek Kumar JAIN, Marinus JOCHEMSEN, Xinjian ZHOU
  • Publication number: 20170176864
    Abstract: Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The current embodiments include several flows including optimizing a source, a mask, and the projection optics and various sequential and iterative optimization steps combining any of the projection optics, mask and source. The projection optics is sometimes broadly referred to as “lens”, and therefore the optimization process may be termed source mask lens optimization (SMLO). SMLO may be desirable over existing source mask optimization process (SMO) or other optimization processes that do not include projection optics optimization, partially because including the projection optics in the optimization may lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics.
    Type: Application
    Filed: March 6, 2017
    Publication date: June 22, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu HSU, Luoqi Chen, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen
  • Patent number: 9588438
    Abstract: Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The current embodiments include several flows including optimizing a source, a mask, and the projection optics and various sequential and iterative optimization steps combining any of the projection optics, mask and source. The projection optics is sometimes broadly referred to as “lens”, and therefore the optimization process may be termed source mask lens optimization (SMLO). SMLO may be desirable over existing source mask optimization process (SMO) or other optimization processes that do not include projection optics optimization, partially because including the projection optics in the optimization may lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics.
    Type: Grant
    Filed: November 9, 2011
    Date of Patent: March 7, 2017
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Duan-Fu Hsu, Luoqi Chen, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen
  • Publication number: 20120113404
    Abstract: Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein. The current embodiments include several flows including optimizing a source, a mask, and the projection optics and various sequential and iterative optimization steps combining any of the projection optics, mask and source. The projection optics is sometimes broadly referred to as “lens”, and therefore the optimization process may be termed source mask lens optimization (SMLO). SMLO may be desirable over existing source mask optimization process (SMO) or other optimization processes that do not include projection optics optimization, partially because including the projection optics in the optimization may lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics.
    Type: Application
    Filed: November 9, 2011
    Publication date: May 10, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Duan-Fu Hsu, Luoqi Chen, Hanying Feng, Rafael C. Howell, Xinjian Zhou, Yi-Fan Chen