Abstract: A pavement structure and method of steel bridge deck. The pavement method for steel bridge deck comprises: laying consecutively a 0.6 mm-0.8 mm epoxy waterproofing bond material layer, a 30 mm-40 mm injectable self-flowing asphalt concrete material layer, a 0.4 mm-0.6 mm epoxy asphalt bond material layer, and a 25 mm-40 mm latex cement mortar poured asphalt concrete material layer onto the top of the steel bridge deck to form the steel bridge deck pavement structure. The present invention has improved the overall deformation coordination ability and anti-fatigue performance of the pavement layer, and has obtained a comprehensive balance among the crack resistance at low temperatures, the stability performance at high temperatures, and the durability of the structure, and it is a scheme with high performance pavement structure.

Abstract: Ionic liquids of the structure Q+A?, in which Q+ is a 1,3-dialkylimidazolium ion, in which the alkyl groups, independently of one another, are linear C1-C4-alkyl groups and A? is the anion of an acid HA with a pKa of less than 3, can be purified by desorption of volatile compounds at a temperature of 100 to 200° C. and a pressure of at most 100 mbar over a period of at least 0.1 h and be used for dehumidifying air.

Abstract: The invention relates to the use of methanesulphonic acid as sorption medium in an absorption heat pump; a sorption medium for an absorption heat pump which comprises methanesulphonic acid and an ionic liquid; and an absorption heat pump having an absorber, a desorber, a condenser, an evaporator and a working medium comprising a volatile refrigerant and a sorption medium, wherein the sorption medium comprises methanesulphonic acid.

Abstract: A substrate processing method includes jetting at least one fluid from a fluid nozzle toward a rotating substrate surface while moving the fluid nozzle from a center toward a periphery of the rotating substrate. The fluid nozzle is moved from the center of the substrate to a predetermined point at a constant initial movement speed. The fluid nozzle is subsequently moved from the predetermined point at a movement speed V(r) which satisfies the following relational expression: V(r)×r?=C (constant), where V(r) represents the movement speed of the fluid nozzle when it passes a position corresponding to a position on the substrate surface at a distance “r” from the center of the substrate, and ? represents a power index.

Abstract: A substrate is cleaned by performing a scrubbing process on a surface to be cleaned of the rotating substrate with a roll-shaped cleaning member while holding an outer circumferential surface of the roll-shaped cleaning member in contact with the surface to be cleaned of the substrate across a predetermined contact width. During at least a part of the scrubbing process, the roll-shaped cleaning member is placed at an offset cleaning position where the central axis of the roll-shaped cleaning member is spaced from the central axis of the substrate by a distance which is 0.14 to 0.5 times the contact width. The surface to be cleaned of the substrate is scrubbed with more uniform cleaning intensity while taking into account the cleaning intensity at each position (area) along the radial direction of the surface to be cleaned of the substrate.

Abstract: A substrate is cleaned by performing a scrubbing process on a surface to be cleaned of the rotating substrate with a roll-shaped cleaning member while holding an outer circumferential surface of the roll-shaped cleaning member in contact with the surface to be cleaned of the substrate across a predetermined contact width. During at least a part of the scrubbing process, the roll-shaped cleaning member is placed at an offset cleaning position where the central axis of the roll-shaped cleaning member is spaced from the central axis of the substrate by a distance which is 0.14 to 0.5 times the contact width. The surface to be cleaned of the substrate is scrubbed with more uniform cleaning intensity while taking into account the cleaning intensity at each position (area) along the radial direction of the surface to be cleaned of the substrate.

Abstract: A substrate cleaning method is provided, which can clean a surface of a substrate with a roll cleaning member more uniformly over the entire surface even when a point (area) exists in the cleaning area of the surface of the substrate at which the relative speed between the rotational speed of the substrate and the rotational speed of the roll cleaning member is zero. The substrate cleaning method for scrubbing a surface of a substrate with a roll cleaning member, extending along the diametrical direction of the substrate, by rotating the substrate and the roll cleaning member while keeping the roll cleaning member in contact with the surface of the substrate, includes changing a rotational speed of at least one of the substrate and the roll cleaning member or a direction of rotation of the substrate during the scrub cleaning of the surface of the substrate.

Abstract: A substrate processing method includes jetting at least one fluid from a fluid nozzle toward a rotating substrate surface while moving the fluid nozzle from a center toward a periphery of the rotating substrate. The fluid nozzle is moved from the center of the substrate to a predetermined point at a constant initial movement speed. The fluid nozzle is subsequently moved from the predetermined point at a movement speed V(r) which satisfies the following relational expression: V(r)×r?=C (constant), where V(r) represents the movement speed of the fluid nozzle when it passes a position corresponding to a position on the substrate surface at a distance “r” from the center of the substrate, and ? represents a power index.

Abstract: A cleaning method according to embodiments of the present invention is a cleaning method of cleaning residues from a semiconductor substrate by rotating a roll brush, the method having cleaning residues from the semiconductor substrate while pressing the roll brush against the semiconductor substrate with a first pressure of 7.35 kPa or lower, and cleaning residues from the semiconductor substrate while pressing the roll brush against the semiconductor substrate with a second pressure higher than 7.35 kPa.

Abstract: A substrate is cleaned by performing a scrubbing process on a surface to be cleaned of the rotating substrate with a roll-shaped cleaning member while holding an outer circumferential surface of the roll-shaped cleaning member in contact with the surface to be cleaned of the substrate across a predetermined contact width. During at least a part of the scrubbing process, the roll-shaped cleaning member is placed at an offset cleaning position where the central axis of the roll-shaped cleaning member is spaced from the central axis of the substrate by a distance which is 0.14 to 0.5 times the contact width. The surface to be cleaned of the substrate is scrubbed with more uniform cleaning intensity while taking into account the cleaning intensity at each position (area) along the radial direction of the surface to be cleaned of the substrate.

Abstract: The invention is directed to a menstruum prepositioned type sterile drug-mixing syringe and a menstruum separately positioned type sterile drug-mixing syringe including a shell, a needle, a piston and a push-pull rod assembly. The syringe further includes a menstruum bottle, a solute bottle, a sliding sleeve and a needle loading assembly. The menstruum bottle may be fixed to the inner wall of a sliding sheath, and the solute bottle may be fixed to the inner of the shell. Piston may be disposed within the solute bottle. The sliding sleeve may be socketed to the front end of the shell in advance or disposed by other ways. The mouth of the menstruum bottle may be opposite to the mouth of the solute bottle and may be connected by a needle, which has two piercing tips, wherein the needle punctures and is securely connected to the needle loading assembly.

Abstract: The present invention discloses a gravity center adjustment device for a wind turbine installation vessel, with the gravity center adjustment device (2) fixedly mounted to the outside of the vessel body (4) of the wind turbine installation vessel. The existence of the gravity center adjustment device (2) according to the present invention is independent from the vessel body and no longer limited by the size of the installation vessel and the size of the ballast bank provided in the vessel body of the wind turbine installation vessel. The size of the gravity center adjustment device (2) may be set as desired so that the adjustment ability of the gravity center adjustment device can be changed, whereby its ability for adjusting gravity center of the wind turbine installation vessel can be improved and the stability of the wind turbine installation vessel can be improved.

Abstract: The present invention which relates to the field of offshore wind turbine installation technology, discloses a wind turbine holding and lifting system for a movable operating platform above water. The wind turbine holding and lifting system comprises a first standing column, a second standing column, a beam lifting device, no less than one beam and enclasping means for holding the wind turbine tower; the first standing column and the second standing column are juxtaposed, and the opposed faces of the first and second standing columns are provided with guiding grooves for sliding the beams; the enclasping means is arranged on the beam, and the two ends of the beam are interfitted within the guiding grooves of the first and second standing columns; the beam lifting device is fixed to the first or second standing column, and the lifting end of the beam lifting device is connected to the beam.

Abstract: The present invention which relates to the field of offshore wind turbine installation technology, discloses a wind turbine holding and lifting system for a movable operating platform above water. The wind turbine holding and lifting system comprises a door-type installation frame, a wind turbine lifting device and enclasping means for clamping the wind turbine tower, the door-type installation frame including a first leg, a second leg and no less than one beam fixed between the first and second legs, the wind turbine lifting device being attached to the door-type installation frame with its lifting end connected to the wind turbine tower. The wind turbine holding and lifting system with such a structure is available for a movable operating platform above water, the enclasping means and the wind turbine lifting device of the wind turbine holding and lifting system being capable of completely constraining the wind turbine such that the assembled wind turbine can be fixed in a wind turbine installation state.

Abstract: The invention relates to a foundation construction platform adapted for foundation construction in a beach or offshore areas. The platform comprises a platform body (1), outriggers (5) mounted on the bottom of the platform body (1), a first hoisting frame (11) and first slide rails (21) longitudinally disposed along the platform body (1), the first hoisting frame (11) having a first lifting member (31) attached to the first transverse beam (111) thereof and the first hoisting frame (11) being capable of sliding along the first slide rails (21). Without other auxiliary equipments, such as, a crane, the operations like removing or rotating a pile can be carried out to decrease the number of the auxiliary equipments on a foundation construction platform so as to reduce the operation cost of the foundation construction platform. The present invention also provides a foundation construction platform including above mentioned hoisting equipments.

Abstract: The present invention discloses a support leg and a mobile offshore work platform having that leg. The disclosed support leg for a mobile offshore work platform comprises a support arm extending in a vertical direction, further comprising a support platform that has a cross section larger than that of the support arm, and that the lower end of said support arm is fixed to the upper surface of the support platform. When wind turbine installations or other offshore works are carried in sea areas of soft foundation ground, the support platform is supported on a soft foundation ground by a larger cross-sectional area, providing a greater support force and improving the stability of the mobile offshore work platform, and the mobile offshore work platform can be used to complete wind turbine installations and other predetermined works in sea areas of soft foundation ground.

Abstract: The present invention discloses a gravity center adjustment device (2) for a wind turbine installation vessel. The gravity center adjustment device (2) is movably mounted to an outside of a vessel body (4) of the wind turbine installation vessel, so that the gravity center adjustment device (2) can selectively move in a plane substantially parallel with the vessel body (4). Since the gravity center adjustment device (2) according to the invention is movably installed to the vessel body and can move in a plane substantially parallel with the vessel body (4) so as to adjust the horizontal position of the gravity center of the installation vessel, its ability of adjusting the gravity center of the wind turbine installation vessel can be improved and the stability of the wind turbine installation vessel can be improved. Therefore, the operation efficiency can be improved and the cost of constructing a wind power plant on the offshore can be reduced.

Abstract: A piling barge is disclosed by the present invention. In the piling barge disclosed, a supporting leg includes a supporting arm extended in vertical direction. Differing from the prior art, the supporting leg further includes a supporting base. The supporting base has a transverse section larger than that of the supporting arm, an end of the supporting arm is fixed with the upper surface of the supporting base. The supporting base of the supporting leg having a larger transverse section may receive support from a larger area of mollisol ground and thus provide a larger supporting force for the hull, which enables the piling barge to perform the piling operation on sea areas with mollisol ground. A piling device of the piling barge has pile frame adjusting mechanisms, such as a luffing oil cylinder, a luffing winch mechanism and a turntable, etc., which may adjust the incline angle and the position of the pile frame, therefore the working efficiency of piling operation of the piling barge can be improved.

Abstract: A substrate processing method dose not use or only use the least possible amount of an organic solvent, and can quickly and completely remove a liquid from a wet substrate surface without allowing the liquid to remain on the substrate surface. The substrate processing method for drying a substrate surface which is wet with a liquid, includes: removing the liquid from the substrate surface and sucking the liquid together with its surrounding gas into a gas/liquid suction nozzle, disposed opposite the substrate surface, while relatively moving the gas/liquid suction nozzle and the substrate parallel to each other; and blowing a dry gas from a dry gas supply nozzle, disposed opposite the substrate surface, toward that area of the substrate surface from which the liquid has been removed while relatively moving the dry gas supply nozzle and the substrate parallel to each other.

Abstract: A substrate processing method can securely form a metal film by electroless plating on an exposed surface of a base metal, such as interconnects, with increased throughput and without the formation of voids in the base metal. The substrate processing method includes: cleaning a surface of a substrate having a base metal formed in the surface with a cleaning solution comprising an aqueous solution of a carboxyl group-containing organic acid or its salt and a surfactant as an additive; bringing the surface of the substrate after the cleaning into contact with a processing solution comprising a mixture of the cleaning solution and a solution containing a catalyst metal ion, thereby applying the catalyst to the surface of the substrate; and forming a metal film by electroless plating on the catalyst-applied surface of the substrate.