Patents by Inventor Xiuchao Yi

Xiuchao Yi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • VAPOR DEPOSITION STRUCTURE, VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION SYSTEM, AND METHOD OF USING VAPOR DEPOSITION STRUCTURE
    Publication number: 20210214840
    Abstract: A vapor deposition structure includes: a vapor deposition crucible, a nozzle and a floating plate. The vapor deposition crucible is configured to receive a vapor deposition source material, and the vapor deposition source material transitions from a liquid state to a gaseous state after being heated. The nozzle is disposed at an outlet of the vapor deposition crucible. The nozzle is configured to spray the vapor deposition source material in the gaseous state onto a surface of a substrate under vapor deposition. The floating plate is configured to float on a surface of the vapor deposition source material in the liquid state. The floating plate is provided with a plurality of hollowed-out structures. The plurality of hollowed-out structures are configured to allow the vapor deposition source material in the gaseous state to pass through.
    Type: Application
    Filed: January 8, 2020
    Publication date: July 15, 2021
    Inventors: Yong Rao, Youliang Li, Jinbiao Liu, Rui Tan, Xiaofei Yue, Nan Luo, Bin Hu, Xiuchao Yi, Meng Shen, Xinxing Jia, Peng Xiao, Jing Li, Yajie Jin