Abstract: A silicon-containing molecular glass photoresist compound with high etching resistance, a preparation method therefor, and use thereof are provided. The compound has simple molecular structure, controllable molecular weight, simple synthesis steps, and relatively high thermal stability, resulting in no risk of precipitation in baking and less proneness to deformation in lithography; the negative molecular glass photoresist provided has relatively good film-forming property, relatively high thermal stability, resulting in less proneness to deformation during storage, and low viscosity without the use of additional solvents for dilution. The photoresist prepared by the compound can give a uniform film on a substrate by spin-coating, and the formula can be used in modern lithography technologies such as 365 nm lithography, 248 nm lithography, 193 nm lithography, extreme ultraviolet lithography, electron beam lithography, and the like.

Abstract: A positive chemically amplified photoresist of a fused ring aromatic hydrocarbon derivative, a preparation method therefor, and use thereof are provided. A matrix component in the photoresist is a fused ring aromatic hydrocarbon derivative represented by general formula (I) that can be dissolved in organic solvents commonly used in photoresists. The photoresist composition can be prepared to give a uniform film, and a molecular glass serving as the matrix component does not precipitate particles in the film preparation process.

Abstract: A negative chemically amplified photoresist of a fused ring aromatic hydrocarbon derivative, a preparation method therefor, and use thereof are provided. A matrix component in the photoresist is a fused ring aromatic hydrocarbon derivative represented by general formula (I) that can be dissolved in organic solvents commonly used in photoresists. The photoresist composition of the present disclosure can be prepared to give a uniform film, and a molecular glass serving as the matrix component is not precipitated in the film preparation process.

Abstract: An engineering facility scheduling method provided by the present application includes: obtaining facility information and working condition information of an engineering facility; obtaining, based on the facility information, a scheduling group where the engineering facility is located, and obtaining a scheduling policy corresponding to the scheduling group; generating, based on the scheduling policy and the working condition information of the engineering facility, a scheduling instruction for instructing the engineering facility to perform work; and sending the scheduling instruction to the engineering facility. According to the engineering facility scheduling method of the present application, the scheduling instruction can be generated according to the specific scheduling policy and working condition information, thereby increasing the degree of automation of engineering facility scheduling and improving engineering facility scheduling efficiency.

Abstract: A method for detecting a surface gradient of an unstructured road based on Lidar includes: obtaining an environmental point cloud of a target region by using a Lidar, and filtering out a point cloud of a non-surface region to obtain a point cloud of a surface region; calculating a normal vector of the point cloud of the surface region, and obtaining an included angle of the surface of each region relative to a coordinate system of the Lidar; and obtaining pitching angle information of a vehicle at this time from a vehicle-mounted inertial measurement unit (IMU), and correcting the included angle with the pitching angle information to obtain the gradient of the surface of each region.

Abstract: A bisphenol A derivative, a preparation method therefor and use thereof in photolithography are provided. The compounds feature simple molecular structure, controllable molecular weight, simple synthesis steps, and relatively high thermal stability. They do not precipitate during baking and are not easily denatured during photolithography. The negative molecular glass photoresists have good film-forming property, high thermal stability, less proneness to properties varying during storage, and low viscosity, no need for additional solvents for dilution during use. After exposure at UV wavelength of 365 nm, the exposed pattern shows high contrast, excellent resolution and good sensitivity, and can present the lithographic line width of 3.5 ?m.

Abstract: A smart luggage system includes a piece of luggage configured to store items for transport and a handle coupled to the luggage. The handle includes a pull rod coupled to a connecting rod. One or more cameras are disposed in a top portion of the pull rod and configured to take a photograph and/or video. One or more cameras are coupled to the luggage and/or the handle and configured to take a photograph and/or video.

Abstract: A smart luggage system includes a piece of luggage configured to store items for transport and a handle coupled to the luggage. The handle includes a pull rod coupled to a connecting rod. One or more cameras are disposed in a top portion of the pull rod and configured to take a photograph and/or video. One or more cameras are coupled to the luggage and/or the handle and configured to take a photograph and/or video.

Abstract: A smart luggage system includes a piece of luggage configured to store items for transport and a handle coupled to the luggage. The handle includes a pull rod coupled to a connecting rod. One or more cameras are disposed in a top portion of the pull rod and configured to take a photograph and/or video. One or more cameras are coupled to the luggage and/or the handle and configured to take a photograph and/or video.

Abstract: A smart luggage system includes a piece of luggage configured to store items for transport and a handle coupled to the luggage. The handle includes a pull rod coupled to a connecting rod. One or more cameras are disposed in a top portion of the pull rod and configured to take a photograph and/or video. One or more cameras are coupled to the luggage and/or the handle and configured to take a photograph and/or video.