Abstract: Disclosed are a display substrate. The display substrate includes a drive backplane; a first electrode layer disposed on a side of the drive backplane; a pixel definition layer disposed on a side, distal to the drive backplane, of the first electrode layer; an organic light-emitting layer disposed on a side, distal to the drive backplane, of the pixel definition layer, wherein the organic light-emitting layer comprises: a plurality of organic material layers stacked in a direction perpendicular to and away from the drive backplane, and a portion of the organic material layer disposed inside the partition groove is separated from a portion of the organic material layer disposed outside the partition groove; and a second electrode layer disposed on a side, distal to the drive backplane, of the organic light-emitting layer.

Abstract: Processing automation scripts used for testing pages includes running the automation scripts using a processor, searching for an element on the page according to locating information in an instruction of the automation scripts, collecting element-related information of the element in response to finding of the element on the page according to the locating information, and associating the collected element-related information of the element with the instruction of the automation scripts. The element-related information associated with the instruction is saved.

Abstract: Processing automation scripts used for testing pages includes running the automation scripts using a processor, searching for an element on the page according to locating information in an instruction of the automation scripts, collecting element-related information of the element in response to finding of the element on the page according to the locating information, and associating the collected element-related information of the element with the instruction of the automation scripts. The element-related information associated with the instruction is saved.

Abstract: Processing automation scripts used for testing pages includes running the automation scripts using a processor, searching for an element on the page according to locating information in an instruction of the automation scripts, collecting element-related information of the element in response to finding of the element on the page according to the locating information, and associating the collected element-related information of the element with the instruction of the automation scripts. The element-related information associated with the instruction is saved.

Abstract: A chemical mechanical polishing (abbreviated as CMP) conditioner comprises a bottom substrate, an intermediate substrate and a diamond film The intermediate substrate is provided on the bottom substrate. The intermediate substrate comprises a hollow portion, an annular portion surrounding the hollow portion, and at least one projecting ring projecting out of the annular portion away from the bottom substrate. The projecting ring comprises a plurality of bumps arranged to be spaced apart from each other along an annulus region. The bumps are extended in a radial direction of the intermediate substrate. The diamond film is provided on the intermediate substrate. The diamond film is allowed for conforming to the bumps, so as to form a plurality of the abrasive projections.

Abstract: A grinding tool includes a substrate having a working surface, and a plurality of abrasive particles distributed over the working surface and protruding outward from the working surface, wherein at least some of the abrasive particles are machined to form abrasive particles respectively having an obliquely truncated pyramid shape. Some embodiments described herein also include a method of manufacturing the grinding tool.

Abstract: A chemical mechanical polishing (abbreviated as CMP) conditioner comprises a bottom substrate, an intermediate substrate and a diamond film The intermediate substrate is provided on the bottom substrate. The intermediate substrate comprises a hollow portion, an annular portion surrounding the hollow portion, and at least one projecting ring projecting out of the annular portion away from the bottom substrate. The projecting ring comprises a plurality of bumps arranged to be spaced apart from each other along an annulus region. The bumps are extended in a radial direction of the intermediate substrate. The diamond film is provided on the intermediate substrate. The diamond film is allowed for conforming to the bumps, so as to form a plurality of the abrasive projections.

Abstract: Provided is a CMP conditioner comprising: a substrate, multiple abrasive bars, and multiple slide blocks. The substrate is divided into a central surface and an outer surface. The central surface is a recessed part. The outer surface encompasses the central surface. Multiple mounting holes are recessed from the outer surface. The abrasive bars are each respectively mounted in the mounting holes. Each of the multiple abrasive bars comprises a bar body and an abrasive particle. The abrasive particle is mounted on a top surface of the abrasive bar. The multiple slide blocks are distributed among the mounting holes of the outer surface. Each of the multiple slide blocks comprises a slide dressing surface. The present invention utilizes the slide blocks to reduce the contact between the substrate and a polishing mat efficiently. The slide blocks may decrease dissolving out of metal components within the substrate and the pollution induced.

Abstract: A chemical mechanical polishing conditioner comprises a substrate and at least one abrasive unit. The abrasive unit is provided on the substrate, and the abrasive unit comprises a supporting layer, an abrasive layer and a stress-relief layer. The supporting layer is provided with a working face far away from the substrate and a non-working face opposite to the working face. The abrasive layer is provided on the working face of the supporting layer, and the abrasive layer is a first diamond-plated film formed by chemical vapor deposition method. The first diamond-plated film is provided with a plurality of abrasive tips. The stress-relief layer is provided on the non-working face of the supporting layer, and the stress-relief layer is a second diamond-plated film formed by chemical vapor deposition method. A thermal stress-relieving effect may be exerted by the stress-relief layer, so as to reduce warpage or deformation of the supporting layer.

Abstract: A hybridized CMP conditioner includes a base, a first abrasive unit and a plurality of second abrasive units. The first abrasive unit includes a first bonding layer, a substrate for abrasive unit provided on the first bonding layer and an abrasive layer provided on the substrate for abrasive unit. The abrasive layer is a diamond coating. The diamond coating is provided on the surface thereof with a plurality of abrasive tips. Each second abrasive unit includes a second bonding layer, a carrying post provided on the second bonding layer, an abrasive particle provided on the carrying post and an abrasive material-bonding layer provided between the carrying post and the abrasive particle. The CMP conditioner is provided with both excellent cutting force and flattening capability through the first abrasive unit provided with the abrasive layer and the second abrasive units provided with the abrasive particles.

Abstract: Processing automation scripts used for testing pages includes running the automation scripts using a processor, searching for an element on the page according to locating information in an instruction of the automation scripts, collecting element-related information of the element in response to finding of the element on the page according to the locating information, and associating the collected element-related information of the element with the instruction of the automation scripts. The element-related information associated with the instruction is saved.

Abstract: Provided is a chemical mechanical polishing (CMP) conditioner comprising: a substrate comprising a horizontal top surface and multiple abrasive units mounted on the horizontal top surface. Each abrasive unit comprises a base of the abrasive unit, an abrasive layer, and a binding layer. The base of the abrasive unit comprises an upper surface and a lower surface. The abrasive layer is formed on the upper surface and comprises multiple abrasive tips. The binding layer is formed between the lower surface and the substrate, and an inclined plane is formed towards the lower surface. The present invention further provides a method for manufacturing the CMP conditioner. The polishing capabilities of different regions of CMP conditioner can be regulated by the abrasive units. Then the CMP conditioner of the present invention satisfies the requirements in the current industry about different polishing capabilities.

Abstract: Processing automation scripts used for testing pages includes running the automation scripts using a processor, searching for an element on the page according to locating information in an instruction of the automation scripts, collecting element-related information of the element in response to finding of the element on the page according to the locating information, and associating the collected element-related information of the element with the instruction of the automation scripts. The element-related information associated with the instruction is saved.

Abstract: A grinding tool includes a substrate having a working surface, and a plurality of abrasive particles distributed over the working surface and protruding outward from the working surface, wherein at least some of the abrasive particles are machined to form abrasive particles respectively having an obliquely truncated pyramid shape. Some embodiments described herein also include a method of manufacturing the grinding tool.

Abstract: A grinding tool includes a substrate having a working surface, and a plurality of abrasive particles distributed across the working surface and protruding outward from the working surface, wherein at least some of the abrasive particles are machined to form abrasive particles respectively having a pyramid shape, the pyramid shape being a right square pyramid or a right hexagonal pyramid.

Abstract: Provided is a CMP conditioner comprising: a substrate, multiple abrasive bars, and multiple slide blocks. The substrate is divided into a central surface and an outer surface. The central surface is a recessed part. The outer surface encompasses the central surface. Multiple mounting holes are recessed from the outer surface. The abrasive bars are each respectively mounted in the mounting holes. Each of the multiple abrasive bars comprises a bar body and an abrasive particle. The abrasive particle is mounted on a top surface of the abrasive bar. The multiple slide blocks are distributed among the mounting holes of the outer surface. Each of the multiple slide blocks comprises a slide dressing surface. The present invention utilizes the slide blocks to reduce the contact between the substrate and a polishing mat efficiently. The slide blocks may decrease dissolving out of metal components within the substrate and the pollution induced.

Abstract: A method for making carbon nanotubes is disclosed. The method includes steps of: (a) providing a growing device, wherein the growing device comprises a reacting room having a gas inlet and a gas outlet; (b) forming a catalyst layer on a first planar surface of a growing substrate; (c) placing the growing substrate and a receiving substrate having a second planar surface in the reacting room, wherein the first planar surface and the second planar surface are parallel with each other; (d) introducing a carbonaceous gas in the reaction room to form a gas flow and growing a first plurality of carbon nanotubes from the growing substrate, wherein the first plurality of carbon nanotubes are brought above the receiving substrate by the gas flow; and (e) stopping the introducing the carbonaceous gas such that the first plurality of carbon nanotubes deposits on the receiving substrate.

Abstract: A method for making a thin film transistor, the method comprising: applying a gate electrode on an insulating substrate; covering the gate electrode with an insulating layer; forming a carbon nanotube layer on a growing substrate, wherein the carbon nanotube layer comprises a plurality of carbon nanotubes; transfer printing the carbon nanotube layer from the growing substrate onto the insulating layer, wherein the insulating layer insulates the carbon nanotube layer from the gate electrode; and placing a source electrode and a drain electrode spaced from each other and electrically connected to two opposite ends of at least one of the plurality of carbon nanotubes.

Abstract: Processing automation scripts used for testing pages includes running the automation scripts using a processor, searching for an element on the page according to locating information in an instruction of the automation scripts, collecting element-related information of the element in response to finding of the element on the page according to the locating information, and associating the collected element-related information of the element with the instruction of the automation scripts. The element-related information associated with the instruction is saved.

Abstract: Processing automation scripts used for testing pages includes running the automation scripts using a processor, searching for an element on the page according to locating information in an instruction of the automation scripts, collecting element-related information of the element in response to finding of the element on the page according to the locating information, and associating the collected element-related information of the element with the instruction of the automation scripts. The element-related information associated with the instruction is saved.