Abstract: A liquid metal self-assembly film and a preparation method therefor, the method includes steps of providing a surfactant solution and a liquid metal, among them a solvent of the surfactant solution is an organic solvent, a density of the solvent of the surfactant solution is less than a density of water, the solvent of the surfactant solution is immiscible with water; adding the liquid metal into a quantity of water to obtain a liquid metal solution; adding the surfactant solution into the liquid metal solution for an ultrasonic mixing to obtain a liquid metal self-assembly seed solution; mixing the liquid metal self-assembly seed solution and a quantity of water to obtain a mixture, among them a lower layer of the mixture is a water phase, and an upper layer of the mixture is an oil phase; and obtaining the liquid metal self-assembly film at oil-water interface.

Abstract: The present application provides a type of fabric with a surface cooling function and a preparation method therefor. The preparation method comprises the following steps: S1. using a surface cooling material to generate a polymer-modified surface cooling material by in-situ polymerization; S2. dispersing the polymer-modified surface cooling material in a finishing solvent to obtain a functionalized fabric finishing solution; and S3. absorbing the functionalized fabric finishing solution into the fabric and then finishing the fabric with the polymer-modified surface cooling material by thermal treatment, so as to obtain the fabric with the surface cooling function. The fabric with the surface cooling function in the present application feels good and is breathable. The solution of the preparation method for the fabric with the surface cooling function in the present application is simple and feasible and applicable to large-scale production.

Abstract: A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip,; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.

Abstract: A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.