Patents by Inventor Xuechang ZHOU

Xuechang ZHOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170009396
    Abstract: The present application provides a type of fabric with a surface cooling function and a preparation method therefor. The preparation method comprises the following steps: S1. using a surface cooling material to generate a polymer-modified surface cooling material by in-situ polymerization; S2. dispersing the polymer-modified surface cooling material in a finishing solvent to obtain a functionalized fabric finishing solution; and S3. absorbing the functionalized fabric finishing solution into the fabric and then finishing the fabric with the polymer-modified surface cooling material by thermal treatment, so as to obtain the fabric with the surface cooling function. The fabric with the surface cooling function in the present application feels good and is breathable. The solution of the preparation method for the fabric with the surface cooling function in the present application is simple and feasible and applicable to large-scale production.
    Type: Application
    Filed: December 10, 2014
    Publication date: January 12, 2017
    Inventors: Zijian Zheng, Yi Li, Haozhong Xin, Allan Chan, Hong Hu, Xuechang Zhou, Zhilu Liu
  • Patent number: 9079338
    Abstract: A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip,; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.
    Type: Grant
    Filed: May 9, 2012
    Date of Patent: July 14, 2015
    Assignee: THE HONG KONG POLYTECHNIC UNIVERSITY
    Inventors: Zijian Zheng, Youde Shen, Xuechang Zhou, Xie Zhuang
  • Publication number: 20130302464
    Abstract: A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.
    Type: Application
    Filed: May 9, 2012
    Publication date: November 14, 2013
    Applicant: THE HONG KONG POLYTECHNIC UNIVERSITY
    Inventors: Zijian ZHENG, Youde SHEN, Xuechang ZHOU, Xie ZHUANG