Patents by Inventor Xuejue Huang

Xuejue Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6661281
    Abstract: A method reduces noise resulting from a current surge in a circuit. A plurality of loading elements, parallel with the circuit being protected, are connected sequentially and disconnected. The connection of the loading elements results in a ramping up of current through the circuit without a sudden surge. In a preferred embodiment, an apparatus for slowing a current change in a circuit is described. The apparatus comprises a plurality of loading elements placed in parallel with the circuit, each of the elements providing a path for current flow, and a control circuit for selectively opening or closing at least one of said paths to prevent or enable current flow through the at least one of the paths.
    Type: Grant
    Filed: November 29, 2001
    Date of Patent: December 9, 2003
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Osamu Samuel Nakagawa, Norman Chang, Shen Lin, Weize Xie, Xuejue Huang
  • Publication number: 20030098742
    Abstract: A method reduces noise resulting from a current surge in a circuit. A plurality of loading elements, parallel with the circuit being protected, are connected sequentially and disconnected. The connection of the loading elements results in a ramping up of current through the circuit without a sudden surge. In a preferred embodiment, an apparatus for slowing a current change in a circuit is described. The apparatus comprises a plurality of loading elements placed in parallel with the circuit, each of the elements providing a path for current flow, and a control circuit for selectively opening or closing at least one of said paths to prevent or enable current flow through the at least one of the paths.
    Type: Application
    Filed: November 29, 2001
    Publication date: May 29, 2003
    Inventors: Osamu Samuel Nakagawa, Norman Chang, Shen Lin, Weize Xie, Xuejue Huang
  • Patent number: 6413802
    Abstract: A FinFET device is fabricated using conventional planar MOSFET technology. The device is fabricated in a silicon layer overlying an insulating layer (e.g., SIMOX) with the device extending from the insulating layer as a fin. Double gates are provided over the sides of the channel to provide enhanced drive current and effectively suppress short channel effects. A plurality of channels can be provided between a source and a drain for increased current capacity. In one embodiment two transistors can be stacked in a fin to provide a CMOS transistor pair having a shared gate.
    Type: Grant
    Filed: October 23, 2000
    Date of Patent: July 2, 2002
    Assignee: The Regents of the University of California
    Inventors: Chenming Hu, Tsu-Jae King, Vivek Subramanian, Leland Chang, Xuejue Huang, Yang-Kyu Choi, Jakub Tadeusz Kedzierski, Nick Lindert, Jeffrey Bokor, Wen-Chin Lee