Abstract: A display substrate, a display panel and a display apparatus are provided. The display substrate comprises a base substrate, which includes a display area and a non-display area on one side of the display area; an encapsulation dam in the non-display area and arranged around the display area, where an organic insulating layer has a groove structure on the side of the packaging dam away from the display area; and a touch structure, which is located on the side of the organic insulating layer facing away from the base substrate, and which comprises a plurality of touch lines extending to the non-display area; an inorganic insulating layer has a hollow structure on the side of the packaging dam away from the display area, and the hollow structure covers the groove structure and does not overlap with the orthographic projection of the plurality of touch lines.

Abstract: A manufacturing method for a display panel, the display panel, and a display device are provided. The manufacturing method includes: providing a driving backplane; forming an inorganic encapsulation layer on the driving backplane using a vapor deposition method, so that the inorganic encapsulation layer includes a main encapsulation layer covering the display area and a part of the peripheral area and an infiltration layer extending from the main encapsulation layer towards a direction away from the display area; forming an inorganic layer on a side of the inorganic encapsulation layer away from the driving backplane, so that the inorganic layer includes a first inorganic layer covering the main encapsulation layer and a second inorganic layer extending from the first inorganic layer towards the direction away from the display area; and simultaneously etching the second inorganic layer and the infiltration layer using a same mask to remove them.

Abstract: Embodiments of the present invention disclose a coating method, comprising determining a coating state of a current substrate being an uncoated state in which none of a predetermined coating is coated thereon, a coating underway state in which a part of the predetermined coating is coated thereon or a coating completion state in which all of the predetermined coating is coated thereon, when a coating suspension is detected during coating the current substrate; in a case that the current substrate is in the uncoated state, further coating the current substrate or starting coating a next substrate; and in a case that the current substrate is in the coating underway state or the coating completion state, starting coating a next substrate.

Abstract: A mask plate, a method for manufacturing a color film substrate and a color film substrate for decreasing the segment difference of the color filter layer are disclosed. The mask plate includes a plurality of first regions, each of the plurality of first regions corresponding to each subpixel unit; and a second region between two adjacent first regions. Each first region is respectively provided with one first subregion for forming a color filter layer pattern within an opening region of a black matrix layer, and two second subregions for forming a color filter layer pattern within a non-opening region of the black matrix layer. The first subregion is between the two second subregions. In each second subregion: along the direction away from the first subregion, the transmittance of the second subregion gradually decreases or increases.

Abstract: The present disclosure provides a method for exposure and development, a system for controlling exposure and a system for exposure and development. The method for exposure and development is configured to expose and develop a substrate when the substrate having a size larger than that of a mask. The method includes: exposing and developing a plurality of different regions of the substrate by means of the mask respectively, wherein the plurality of different regions are pieced to form an entire region which needs to be exposed and developed.

Abstract: The present disclosure provides a method for exposure and development, a system for controlling exposure and a system for exposure and development. The method for exposure and development is configured to expose and develop a substrate when the substrate having a size larger than that of a mask. The method includes: exposing and developing a plurality of different regions of the substrate by means of the mask respectively, wherein the plurality of different regions are pieced to form an entire region which needs to be exposed and developed.

Abstract: A coating machine and a controlling method thereof are disclosed. The coating machine includes: a coating platform, configured to support a substrate to be placed thereon; a supporting device, configured to support the coating platform and adjust height; a detecting device, configured to detect a levelness of a supporting plane formed by the supporting device; a driving device, configured to drive the supporting device to adjust the supporting plane; a control device, configured to compare the levelness of the supporting plane detected by the detecting devices with a preset threshold range of levelness. If the detected levelness of the supporting plane is beyond the preset threshold range of levelness, the control device adjusts the supporting devices until the levelness of the supporting plane is within the preset threshold range of levelness.

Abstract: Embodiments of the present invention disclose a coating method, comprising determining a coating state of a current substrate being an uncoated state in which none of a predetermined coating is coated thereon, a coating underway state in which a part of the predetermined coating is coated thereon or a coating completion state in which all of the predetermined coating is coated thereon, when a coating suspension is detected during coating the current substrate; in a case that the current substrate is in the uncoated state, further coating the current substrate or starting coating a next substrate; and in a case that the current substrate is in the coating underway state or the coating completion state, starting coating a next substrate.

Abstract: The embodiments of the present invention provide a mask plate, a method for manufacturing a color film substrate and a color film substrate for decreasing the segment difference of the color filter layer, improving the transmittance of the color film substrate, thereby improving the display effect of the display substrate. Wherein the mask plate comprises: a plurality of first regions, each of the plurality of first regions corresponds to each subpixel unit; and a second region between two adjacent first regions; wherein each first region is respectively provided with one first subregion for forming a color filter layer pattern within a opening region of a black matrix layer, and two second subregions for forming a color filter layer pattern within a non-opening region of the black matrix layer; the first subregion is between the two second subregions; and in each second subregion: along the direction away from the first subregion, the transmittance of the second subregion gradually decreases or increases.