Abstract: An array substrate, comprising a substrate and a data line and a gate line formed on the substrate. The data line and gate line cross each other to define a pixel region and the pixel region comprises a reflective region and a transparent region. The pixel region further comprises: a pixel electrode, formed with a transparent conductive film on the substrate and provided at least in the transparent region; a thin film transistor, formed on the substrate, the transparent conductive film being retained below the gate line and a gate electrode of the thin film transistor; a planarization film, covering the thin film transistor on the substrate; and a reflective layer, formed on the planarization film and disposed in the reflective region of the pixel region. A method of manufacturing the array substrate is provided.

Abstract: A thin film patterning method comprising: depositing a first thin film and applying a photoresist layer on the first thin film; exposing and developing the photoresist layer to define first, second and third regions, wherein the photoresist layer in the first region is thicker than that in the second region, and no photoresist layer is left in the third region; over-etching to remove the first thin film in the third region and form an over-etched region in the peripheral region of the first region; removing a part of the photoresist layer to expose the first thin film in the second region; depositing a second thin film so that the first thin film contacts the second thin film in the second region; and lifting off the photoresist layer to remove the second thin film in the first region and exposing the substrate in the over-etched region of the first region.