Abstract: A display substrate and a preparation method thereof, and a display device. The display substrate comprises a display area (100), a bonding area (200), and a side bezel region (310) at least including a first bezel region (310-1) and a second bezel region (310-2), the first bezel region (310-1) is located on a side of the second bezel region (310-2) close to the bonding area (200); the display substrate comprises a base substrate (101) and a drive circuit layer (102), the base substrate (101) at least comprises a first connection line (70), the drive circuit layer (102) at least comprises a data signal line (60), a second connection line (80) connected to the first connection line through a first lap via (DV1), the data signal line is connected to the second connection line through a second lap via (DV2), the first lap via is provided in the first bezel region.

Abstract: A device is for surface strengthening of a metal plate based ultrasonic vibration is provided. The device includes an ultrasonic vibration tool holder and a cutting tool. The ultrasonic vibration tool holder is internally provided with an ultrasonic transducer and an ultrasonic booster; the ultrasonic transducer is configured to transmit vibration to the ultrasonic booster, the ultrasonic booster is configured to drive longitudinal torsion vibration of the cutting tool; an end of the ultrasonic booster facing towards the cutting tool is provided with an adjustment assembly configured for adjusting a longitudinal torsion angle and a rotation speed. Since the device includes the adjustment assembly, the longitudinal torsion angle and the rotation speed of the device can be adjusted according to different processing requirements, so as to perform ultrasonic vibration extrusion strengthening on surfaces of titanium alloy plates and improve surface integrity including microhardness and residual stress.

Abstract: A device is for surface strengthening of a metal plate based ultrasonic vibration. The device includes an ultrasonic vibration tool holder and a cutting tool. The ultrasonic vibration tool holder is internally provided with an ultrasonic transducer and an ultrasonic booster; the ultrasonic transducer is configured to transmit vibration to the ultrasonic booster, the ultrasonic booster is configured to drive longitudinal torsion vibration of the cutting tool; an end of the ultrasonic booster facing towards the cutting tool is provided with an adjustment assembly configured for adjusting a longitudinal torsion angle and a rotation speed. Since the device includes the adjustment assembly, the longitudinal torsion angle and the rotation speed of the device can be adjusted according to different processing requirements, so as to perform ultrasonic vibration extrusion strengthening on surfaces of titanium alloy plates and improve surface integrity including microhardness and residual stress.

Abstract: A set of primers and probes for simultaneous detection of Cymbidium mosaic virus (CymMV), Odontoglossum ringspot virus (ORSV), and Cymbidium ringspot virus (CymRSV) and a method for detecting CymMV, ORSV, and CymRSV, along with a method for their detection, are disclosed. The method involves designing multiplex real-time quantitative PCR detection primers and probes for CymMV, ORSV, and CymRSV and applying these primers and probes to the real-time quantitative PCR simultaneous detection of CymMV, ORSV, and CymRSV. It allows for faster detection of CymMV, ORSV, and CymRSV, taking only one-third of the time compared to uniplex real-time quantitative PCR technology, thereby reducing testing costs by approximately ? to ½ for each sample. The primers and probes are highly specific and sensitive, with a sensitivity as low as 1 to 10 copies. It provides an efficient and feasible detection method for early detection and prevention of CymMV, ORSV, and CymRSV.

Abstract: An air conditioner control method includes: determining whether a local air conditioner detects a positioning marker; when the local air conditioner detects the positioning marker, determining whether there are any other air conditioner which detect the positioning marker simultaneously with the local air conditioner; and if so, obtaining a position relation between the local air conditioner and the other air conditioners according to the positioning marker.

Abstract: Methods for designing heterobifunctional small molecules which selectively degrade/disrupt CDK4/6 and compositions and methods of using such degraders/disruptors to treat CDK4/6-mediated cancer are provided.

Abstract: The present disclosure provides a loading apparatus and a physical vapor deposition (PVD) apparatus. The loading apparatus includes a pedestal configured to support a workpiece; and a first support member placed on the pedestal and configured to push up a cover ring when the pedestal is at an operation position to prevent an overlapping portion of a cover ring and the workpiece from contacting each other. In the loading apparatus and the PVD apparatus, the first support member supports the cover ring, such that the cover ring does not contact the workpiece, thereby reducing stress forces on the workpiece by external components.

Abstract: Methods for designing heterobifunctional small molecules which selectively degrade/disrupt CDK4/6 and compositions and methods of using such degraders/disruptors to treat CDK4/6-mediated cancer are provided.

Abstract: Methods for designing heterobifunctional small molecules which selectively degrade/disrupt CDK4/6 and compositions and methods of using such degraders/disruptors to treat CDK4/6-mediated cancer are provided.

Abstract: An air conditioner control method includes: determining whether a local air conditioner detects a positioning marker; when the local air conditioner detects the positioning marker, determining whether there are any other air conditioner which detect the positioning marker simultaneously with the local air conditioner; and if so, obtaining a position relation between the local air conditioner and the other air conditioners according to the positioning marker.

Abstract: The present disclosure provides a deposition apparatus, including a first chamber, a second chamber and a third chamber. The first chamber is configured to load a substrate. The second chamber is configured to provide a high temperature environment in which a degas process and a sputtering process are performed on the substrate. The third chamber is provided between the first chamber and the second chamber. The third chamber is configured to transfer the substrate from the first chamber to the second chamber via the third chamber.

Abstract: A heating device and a heating chamber are provided, comprising a base plate (21), at least three supporting columns (22) and a heating assembly, where the at least three supporting columns are arranged vertically on the base plate and are distributed at intervals along a circumferential direction of the base plate Top ends of the at least three supporting columns form a bearing surface for supporting a to-be-heated member (23). The heating assembly includes a heating light tube (24) and a thermal radiation shielding assembly, where the heating light tube is disposed above the base plate and below the bearing surface. A projection of an effective heating area formed by uniform distribution of the heating light tube on the base plate covers a projection of the bearing surface on the base plate. The thermal radiation shielding assembly shields heat radiated by the heating light tube towards surroundings and bottom.

Abstract: The present disclosure provides a loading apparatus and a physical vapor deposition (PVD) apparatus. The loading apparatus includes a pedestal configured to support a workpiece; and a first support member placed on the pedestal and configured to push up a cover ring when the pedestal is at an operation position to prevent an overlapping portion of a cover ring and the workpiece from contacting each other. In the loading apparatus and the PVD apparatus, the first support member supports the cover ring, such that the cover ring does not contact the workpiece, thereby reducing stress forces on the workpiece by external components.

Abstract: A sample adding system for automatically adding a sputum digestion liquid includes a weighing device provided with a weight sensor and a sample adding device. A liquid inlet of a sample adding tube goes deep into the sputum digestion liquid reagent bottle, and a liquid outlet of the sample adding tube extends to a position above the weighing device. A sample adding needle is connected to the liquid outlet of the sample adding tube. The sample adding tube is equipped with a quantitative sample adding pump. A signal output end of the weight sensor is electrically connected to a signal input end of a single-chip microcomputer, and a control output end of the single-chip microcomputer is electrically connected to a control input end of the quantitative sample adding pump.

Abstract: Methods for designing heterobifunctional small molecules which selectively degrade/disrupt CDK4/6 and compositions and methods of using such degraders/disruptors to treat CDK4/6-mediated cancer are provided.

Abstract: Embodiments of the invention provide a chamber for semiconductor processing, which includes a chamber body and an isolation window, the chamber body being of a tubby structure and having an upper end which is an open end, and the isolation window being arranged at the open end of the chamber body and used for sealing the chamber. The chamber further includes an isolation window fixing structure used for fixing the isolation window at the open end of the chamber body and a first fixing part and a second fixing part connected with each other, the first fixing part being fixedly connected with an edge area of an upper surface of the isolation window, and the second fixing part being fixedly connected with the chamber body.

Abstract: The present disclosure provides a deposition apparatus, including a first chamber, a second chamber and a third chamber. The first chamber is configured to load a substrate. The second chamber is configured to provide a high temperature environment in which a degas process and a sputtering process are performed on the substrate. The third chamber is provided between the first chamber and the second chamber. The third chamber is configured to transfer the substrate from the first chamber to the second chamber via the third chamber.

Abstract: A heating device and a heating chamber are provided, comprising a base plate (21), at least three supporting columns (22) and a heating assembly, where the at least three supporting columns are arranged vertically on the base plate and are distributed at intervals along a circumferential direction of the base plate Top ends of the at least three supporting columns form a bearing surface for supporting a to-be-heated member (23). The heating assembly includes a heating light tube (24) and a thermal radiation shielding assembly, where the heating light tube is disposed above the base plate and below the bearing surface. A projection of an effective heating area formed by uniform distribution of the heating light tube on the base plate covers a projection of the bearing surface on the base plate. The thermal radiation shielding assembly shields heat radiated by the heating light tube towards surroundings and bottom.

Abstract: Embodiments of the invention provide a chamber for semiconductor processing, which includes a chamber body and an isolation window, the chamber body being of a tubby structure and having an upper end which is an open end, and the isolation window being arranged at the open end of the chamber body and used for sealing the chamber. The chamber further includes an isolation window fixing structure used for fixing the isolation window at the open end of the chamber body and a first fixing part and a second fixing part connected with each other, the first fixing part being fixedly connected with an edge area of an upper surface of the isolation window, and the second fixing part being fixedly connected with the chamber body.

Abstract: Provided is a magnetron source, which comprises a target material, a magnetron located thereabove and a scanning mechanism connected to the magnetron for controlling the movement of the magnetron above the target material. The scanning mechanism comprises a peach-shaped track, with the magnetron movably disposed thereon; a first driving shaft, with the bottom end thereof connected with the origin of the polar coordinates of the peach-shaped track, for driving the peach-shaped track to rotate about the axis of the first driving shaft; a first driver connected to the first driving shaft for driving the first driving shaft to rotate; and a second driver for driving the magnetron to move along the peach-shaped track via a transmission assembly. A magnetron sputtering device including the magnetron and a method for magnetron sputtering using the magnetron sputtering device are also provided.