Abstract: The present invention relates to electrode tabs and batteries. The electrode tab includes a first metal strip and a metal connector connected to the first metal strip. A melting point of the metal connector is lower than a melting point of the first metal strip, or a solidus temperature of the metal connector is lower than a solidus temperature of the first metal strip, or a liquidus temperature of the metal connector is lower than a liquidus temperature of the first metal strip. The electrode tab has the advantages of regular shape, which are not only easy to install and assemble, saving assembly costs, but also not easy to be damaged in the process of assembly, transportation and storage. The electrode tab does not affect an overall size of the battery, is more suitable for use in scenarios such as small miniature batteries and power batteries.

Abstract: Disclosed are a color filter substrate and a manufacturing method thereof. The color filter substrate includes a substrate, a color filter layer, a light shielding layer and a common electrode layer. The color filter layer includes a red color block, a green color block and a blue color block. The light shielding layer is disposed on the color filter layer. The light shielding layer includes light shielding blocks. The common electrode layer is disposed on the light shielding layer. Positions of intersections between any two of the red color block, the green color block and the blue color block correspond to positions of the light shielding blocks. A reflection intensity of ambient light from a liquid crystal display panel can be effectively reduced.

Abstract: A method and apparatus for improving display contrast, the method includes: providing a display array substrate having a metal layer; forming a photoresist layer on a surface of the metal layer; performing an exposure and development processes on the photoresist layer to expose a portion of the metal layer; performing an etching process on the portion of the metal layer to form metal wires; and subjecting an oxidation treatment to sidewalls of the metal wires to generate an oxide on the sidewalls of the metal wires.

Abstract: A method and apparatus for improving display contrast, the method includes: providing a display array substrate having a metal layer; forming a photoresist layer on a surface of the metal layer; performing an exposure and development processes on the photoresist layer to expose a portion of the metal layer; performing an etching process on the portion of the metal layer to form metal wires; and subjecting an oxidation treatment to sidewalls of the metal wires to generate an oxide on the sidewalls of the metal wires.

Abstract: The present invention provides a method for manufacturing an array substrate, including a metal oxidation process after a step of removing a photoresist layer and before a step of forming an insulating film by a CVD device to form metallic oxides on side surfaces of patterned metal lines. Oxidation of metals is completed by the CVD device, thereby reducing the leakage of light to improve the contrast of an LCD panel, and improving the production efficiency and productivity of the LCD panel.

Abstract: The present disclosure discloses a color film substrate and a method for manufacturing the same as well as a liquid crystal display panel. The color film substrate includes: a substrate, a black matrix disposed on the substrate, and an antireflection layer disposed between the substrate and the black matrix. The refractive index of the antireflection layer is about 1.6˜2.0, and the thickness of the antireflection layer is greater than 100 nm; or the refractive index of the antireflection layer is about 1.5˜2.4, and the thickness of the antireflection layer is less than 60 nm. In the aforesaid way, the present disclosure can decrease the reflectance of the liquid crystal display panel in a simpler manner and at a lower cost, thereby improving the display quality of the liquid crystal display panel under the environment of strong light.

Abstract: A method for designing an ultrahigh-resolution photonic-crystal superprism, including the following steps: selecting a medium material, and determining a structure type and parameter of a photonic crystal, obtaining the photonic crystal's equifrequency graph, and looking for an auto-collimation area; obtaining the group velocity distribution of points in the equifrequency graph, and looking for a low group velocity area; optimizing the photonic crystal's structure parameter, facilitating the auto-collimation and the low group velocity area in the photonic crystal's equifrequency graph to be overlapped as much as possible, and defining overlapping area as a work area; obtaining an equal incidence-angle line, rotating the photonic crystal to intersect the equal incidence-angle line with the work area, and selecting the appropriate incidence angle in an intersection point to complete the design of the photonic-crystal superprism.

Abstract: A photonic crystal supporting highly frequency-sensitive self-collimation phenomenon, which is formed by at least two kinds of materials, and has a periodic distribution of refractive index, the photonic crystal has straight equi-frequency contours or flat equi-frequency surfaces in a certain band in the first Brillouin zone of wave-vector space, and the frequency-sensitivity of self-collimation is at least 50 times higher than the change rate of curvatures of the equi-frequency contours or the equi-frequency surfaces with frequencies in a vacuum.

Abstract: A method for designing an ultrahigh-resolution photonic-crystal superprism, including the following steps: selecting a medium material, and determining a structure type and parameter of a photonic crystal, obtaining the photonic crystal's equifrequency graph, and looking for an auto-collimation area; obtaining the group velocity distribution of points in the equifrequency graph, and looking for a low group velocity area; optimizing the photonic crystal's structure parameter, facilitating the auto-collimation and the low group velocity area in the photonic crystal's equifrequency graph to be overlapped as much as possible, and defining overlapping area as a work area; obtaining an equal incidence-angle line, rotating the photonic crystal to intersect the equal incidence-angle line with the work area, and selecting the appropriate incidence angle in an intersection point to complete the design of the photonic-crystal superprism.

Abstract: The present invention provides a photonic crystal supporting high frequency sensitivity self-collimation phenomenon and design method and use thereof. The photonic crystal supporting high frequency sensitivity self-collimation phenomenon has a periodic distribution of refractive index formed by at least two kinds of materials; there exists straight equi-frequency contours or flat equi-frequency surfaces in a certain band in a dispersion space of the photonic crystal, and the change rate of curvatures of the equi-frequency contours or the equi-frequency surfaces with frequencies around the frequency of straight equi-frequency contours or flat equi-frequency surfaces is at least increased at least 50 times than the change rate in vacuum. For the photonic crystal of the present invention is used for controlling diffracted intensity of light beam, detecting refractive index and the like.