Abstract: An apparatus and method of an attachment device for interfacing with an on-board diagnostic system of a vehicle is provided. The device includes an application processor configured to receive input from a terminal, control processing of the input by the on-board diagnostic system, transmit a result of the processing of the input by the on-board diagnostic system to the terminal, and a secure element interposed in the communication path between the application processor and the on-board diagnostic system, the secure element configured to filter the input of an on-board diagnostic operation that is untrusted.

Abstract: A method for detecting an optical signal-to-noise ratio (OSNR). A wavelength label loading end (11) loads a wavelength label signal in an optical signal, and sends a loading modulation depth of the wavelength label signal to an OSNR detection end (12) through a wavelength label channel or an optical monitoring channel. The OSNR detection end (12) obtains a loading modulation depth of a wavelength label signal loaded in each wavelength optical signal, parses the wavelength label signal to obtain a current modulation depth of the wavelength label signal, and obtains an OSNR value of each wavelength optical signal according to the loading modulation depth and the current modulation depth of the wavelength label signal. A system and device for detecting an OSNR applicable to OSNR tests of present optical signals with high rates of 40 G, 100 G, etc., and in particular to OSNR tests of polarization multiplexing optical signals.

Abstract: A tool storage device includes a housing, a linkage unit, a biasing member and a locking member. The linkage unit includes a driving member, multiple storing members, and a linkage mechanism interconnecting the storing members and the driving member. The linkage unit is convertible between a retracted position, where the storing members are accommodated in the housing, and an opening position, where the storing members are driven by the driving member via the linkage mechanism to pivot so that ends of the storing members are away from the housing with different orientations. The biasing member biases the linkage unit toward the expanded position. The locking member is disposed for locking releasably the linkage unit in the retracted position.

Abstract: A method for verifying data integrity of a block device is provided. The method includes providing a secure world execution environment configured to monitor changes to data blocks of a block device, within the secure world execution environment, generating a hash for changed data blocks of the block device, and within the secure world execution environment, verifying and generating a cryptographic signature.

Abstract: The invention relates to a method and technical means for rotating an original image in an image frame by an angle to have a rotated image in said image frame, wherein said image frame comprising said rotated image having empty corners lacking image data; comparing the rotated image to the original image to identify remaining corners; adding content of the remaining corners to the empty corners of the image frame comprising said rotated image.

Abstract: A method for detecting an optical signal-to-noise ratio (OSNR). A wavelength label loading end (11) loads a wavelength label signal in an optical signal, and sends a loading modulation depth of the wavelength label signal to an OSNR detection end (12) through a wavelength label channel or an optical monitoring channel. The OSNR detection end (12) obtains a loading modulation depth of a wavelength label signal loaded in each wavelength optical signal, parses the wavelength label signal to obtain a current modulation depth of the wavelength label signal, and obtains an OSNR value of each wavelength optical signal according to the loading modulation depth and the current modulation depth of the wavelength label signal. A system and device for detecting an OSNR applicable to OSNR tests of present optical signals with high rates of 40 G, 100 G, etc., and in particular to OSNR tests of polarization multiplexing optical signals.

Abstract: A tool storage device includes a housing, a linkage unit, a biasing member and a locking member. The linkage unit includes a driving member, multiple storing members, and a linkage mechanism interconnecting the storing members and the driving member. The linkage unit is convertible between a retracted position, where the storing members are accommodated in the housing, and an opening position, where the storing members are driven by the driving member via the linkage mechanism to pivot so that ends of the storing members are away from the housing with different orientations. The biasing member biases the linkage unit toward the expanded position. The locking member is disposed for locking releasably the linkage unit in the retracted position.

Abstract: In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.

Abstract: A computer may assign a master device and at least one slave device. A program may direct the master device to broadcast counts based on its data acquisition clock. Then at least one slave device may receive the broadcast count and determine the difference between the clock count of the slave and the clock count of the master. The slave may use the difference of the counts to control the slave's voltage-controlled crystal oscillator.

Abstract: In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.

Abstract: A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns enable monitoring of associated process condition parameters for signs of process drift, analyzing of the process condition parameters to determine which are limiting and affecting the chip yields, analyzing the changes in the process condition parameters to determine the corrections that should be fed back into the lithography process or forwarded to an etch process, identifying specific masks that do not transfer the intended pattern to wafers as intended, and identifying groups of masks that share common characteristics and behave in a similar manner with respect to changes in process condition parameters when transferring the pattern to the wafer.

Abstract: In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.

Abstract: There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.

Abstract: A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns enable monitoring of associated process condition parameters for signs of process drift, analyzing of the process condition parameters to determine which are limiting and affecting the chip yields, analyzing the changes in the process condition parameters to determine the corrections that should be fed back into the lithography process or forwarded to an etch process, identifying specific masks that do not transfer the intended pattern to wafers as intended, and identifying groups of masks that share common characteristics and behave in a similar manner with respect to changes in process condition parameters when transferring the pattern to the wafer.

Abstract: A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns enable monitoring of associated process condition parameters for signs of process drift, analyzing of the process condition parameters to determine which are limiting and affecting the chip yields, analyzing the changes in the process condition parameters to determine the corrections that should be fed back into the lithography process or forwarded to an etch process, identifying specific masks that do not transfer the intended pattern to wafers as intended, and identifying groups of masks that share common characteristics and behave in a similar manner with respect to changes in process condition parameters when transferring the pattern to the wafer.

Abstract: There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the present invention is a system and method that accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques.

Abstract: A system has been developed for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/or systems, and/or individual functions performed thereby or components used therein. In one embodiment, the system accelerates lithography simulation, inspection, characterization and/or evaluation of the optical characteristics and/or properties, as well as the effects and/or interactions of lithographic systems and processing techniques. In this regard, in one embodiment, the system employs a lithography simulation system architecture, including application-specific hardware accelerators, and a processing technique to accelerate and facilitate verification, characterization and/or inspection of a mask design, for example, RET design, including detailed simulation and characterization of the entire lithography process to verify that the design achieves and/or provides the desired results on final wafer pattern.

Abstract: A daisy chained ethernet network data acquisition system for use in industrial processes is shown. The system employs standard category five twisted-pair connectors, each having four twisted-pairs associated therewith. Two of the twisted-pairs are employed for transmitting and receiving command signals and data, while the remaining two are employed for transmitting a common clock and synchronizing signal to each of the various stages of the processing line at which data is to be acquired. The system thus allows for the time correlated acquisition of data from a plurality of stages or stations of a lengthy processing line by employing ethernet interconnection.

Abstract: A method for identifying process window signature patterns in a device area of a mask is disclosed. The signature patterns collectively provide a unique response to changes in a set of process condition parameters to the lithography process. The signature patterns enable monitoring of associated process condition parameters for signs of process drift, analyzing of the process condition parameters to determine which are limiting and affecting the chip yields, analyzing the changes in the process condition parameters to determine the corrections that should be fed back into the lithography process or forwarded to an etch process, identifying specific masks that do not transfer the intended pattern to wafers as intended, and identifying groups of masks that share common characteristics and behave in a similar manner with respect to changes in process condition parameters when transferring the pattern to the wafer.