Patents by Inventor Y. H. Chen

Y. H. Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9727348
    Abstract: Objects shown on a display interface can be collected for a running application. Identifications (IDs) representing the objects can also be collected. A determination can be made concerning whether there are object identifications of objects with help contents associated. A transparent layer can be displayed on the display interface. All the objects associated with help contents of the layer can be visually indicated in the transparent layer. The visual indicators can indicate that help is available for a corresponding object. When no help is available, no visual indicator is shown in the transparent layer proximate to corresponding object.
    Type: Grant
    Filed: April 29, 2011
    Date of Patent: August 8, 2017
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Sean Y H Chen, Jeffrey C H Liu, Joey H Y Tseng
  • Patent number: 8919274
    Abstract: A submersible vehicle with increased payload and energy savings, more particularly, a submersible vehicle, which may be an unmanned underwater vehicle, with high maneuvering cyclic-pitch postswirl propulsors. The high maneuvering cyclic-pitch postswirl propulsor arrangements are a bow thrust vectoring arrangement and a stern thrust vectoring arrangement. The bow thrust vectoring arrangement is a two-part arrangement having a forward/reverse element and a turning element. Similarly, the stern thrust vectoring arrangement is also a two-part arrangement having a forward/reverse element and a turning element.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: December 30, 2014
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Benjamin Y. - H. Chen, Stephen K. Neely
  • Patent number: 7208065
    Abstract: The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.
    Type: Grant
    Filed: June 25, 2004
    Date of Patent: April 24, 2007
    Assignee: Industrial Technology Research Institute
    Inventors: Jing-Hung Chiou, Kai-Hsiang Yen, Chin-Horng Wang, Chao-Chiun Liang, Stella Y. H. Chen
  • Patent number: 6828164
    Abstract: The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.
    Type: Grant
    Filed: April 1, 2003
    Date of Patent: December 7, 2004
    Assignee: Industrial Technology Research Institute
    Inventors: Jing-Hung Chiou, Kai-Hsiang Yen, Chin-Horng Wang, Chao-Chiun Liang, Stella Y. H. Chen
  • Publication number: 20040231796
    Abstract: The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.
    Type: Application
    Filed: June 25, 2004
    Publication date: November 25, 2004
    Applicant: Industrial Technology Research Institute
    Inventors: Jing-Hung Chiou, Kai-Hsiang Yen, Chin-Horng Wang, Chao-Chiun Liang, Stella Y.H. Chen
  • Publication number: 20040113148
    Abstract: The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.
    Type: Application
    Filed: April 1, 2003
    Publication date: June 17, 2004
    Inventors: Jing-Hung Chiou, Kai-Hsiang Yen, Chin-Horng Wang, Chao-Chiun Liang, Stella Y.H. Chen
  • Patent number: 5863397
    Abstract: Target mounting apparatus for use in a conventional physical vapor deposition system includes a target assembly, a source mounting plate, means for removably mounting the target assembly on the source mounting plate, and a keying system for preventing mounting of a target assembly which is incompatible with the deposition process intended to be carried out. The keying system includes a male portion formed on either the target assembly or the source mounting plate, and a female portion formed on the other of the target assembly and the source mounting plate. Keying of the target assembly to the source mounting plate is achieved by either forming the male and female portions with unique, mating cross sectional shapes, or by varying the spatial orientation or alignment of the male and female portions. In an alternate embodiment, a key pin is positionable in any of a plurality of positions on the source mounting plate, respectively corresponding to differing target assemblies.
    Type: Grant
    Filed: July 11, 1997
    Date of Patent: January 26, 1999
    Assignee: Taiwan Semiconductor Manufacturing Co Ltd.
    Inventors: C.C. Tu, Y.H. Chen
  • Patent number: 5786262
    Abstract: A new method is disclosed to form a shallow trench isolation with a ozone-TEOS as a gapfilling material. The formation of the shallow trench isolation described herein includes a pad layer, a silicon nitride layer formed on a semiconductor substrate. A thermal oxide layer is subsequently formed on the silicon nitride layer. Then a shallow trench is created via photolithography and dry etching steps to etch the thermal oxide layer, the silicon nitride layer and the pad layer. After photoresist is removed, an ozone-TEOS layer is form in the shallow trench and on the top of the thermal oxide layer for the purpose of isolation. A CMP is perform to make the surface of the substrate with a planar surface. Then, a thermal annealing is used for densification of the ozone-TEOS layer and for forming a lining oxide to provide better isolation.
    Type: Grant
    Filed: April 9, 1997
    Date of Patent: July 28, 1998
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: S. M. Jang, Y. H. Chen, C. H. Yu
  • Patent number: 5746462
    Abstract: The present invention discloses a flexible vacuum pick-up device for use in wafer processing that includes a handle portion adapted for holding by a human hand, the handle portion has a passage therein for fluid communication, a flexible conduit for providing a connection between the handle portion and a pick-up head and for providing a vacuum passage therethrough, and a vacuum pick-up head that has an extended planar surface adapted for making intimate contact with a substantially flat wafer.
    Type: Grant
    Filed: December 12, 1996
    Date of Patent: May 5, 1998
    Assignee: Taiwan Semiconductor Manufacturing Company,Ltd.
    Inventors: C. H. Lee, Y. H. Chen
  • Patent number: 5632658
    Abstract: In accordance with one embodiment of the present invention a surface ship having at least one tractor podded propulsor is provided. The vessel having a tractor podded propulsor system comprises a hull means and at least one tractor podded propulsor unit attached to the aft section of the hull means. The at least one tractor podded propulsor unit comprises an axisymmetric pod having a longitudinal centerline associated therewith, at least one propeller mounted for rotation to a forward end of the pod, and a substantially vertically aligned streamlined strut connected at a top end to the aft section of the hull means and connected at a bottom end to the pod. The pod has a forward end and a tapered aft end. Mounted within the pod is at least one rotatably mounted propeller shaft that extends forward of the pod forward end, shaft seals, thrust bearings, and power means functioning to rotate the at least one propeller shaft.
    Type: Grant
    Filed: May 21, 1996
    Date of Patent: May 27, 1997
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Benjamin Y.-H. Chen, Carol L. Tseng
  • Patent number: 5445105
    Abstract: A torque balanced propulsor unit for a submersible vehicle of the type having a bow, a stern, a longitudinally extending central section axisymmetric about a longitudinal axis of the vehicle and including therein a maximum diameter of the vehicle, and a tapered aft section axisymmetric about the longitudinal axis is provided. The torque balanced propulsor unit includes a rotor for providing a forward thrust to the vehicle. The rotor includes a central axisymmetric hub and a plurality of circumferentially spaced apart impeller blades extending radially from the central hub. The rotor is rotationally mounted to the tapered aft section of the vehicle. The rotor has a first torque associated therewith. The torque balanced propulsor unit further includes a stator for producing a second torque on the vehicle. The stator is secured to the vehicle at a location aft of the rotor.
    Type: Grant
    Filed: September 30, 1994
    Date of Patent: August 29, 1995
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Benjamin Y.-H. Chen, Carol L. Tseng, Frank B. Peterson