Patents by Inventor Y. H. Chen
Y. H. Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9727348Abstract: Objects shown on a display interface can be collected for a running application. Identifications (IDs) representing the objects can also be collected. A determination can be made concerning whether there are object identifications of objects with help contents associated. A transparent layer can be displayed on the display interface. All the objects associated with help contents of the layer can be visually indicated in the transparent layer. The visual indicators can indicate that help is available for a corresponding object. When no help is available, no visual indicator is shown in the transparent layer proximate to corresponding object.Type: GrantFiled: April 29, 2011Date of Patent: August 8, 2017Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Sean Y H Chen, Jeffrey C H Liu, Joey H Y Tseng
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Patent number: 8919274Abstract: A submersible vehicle with increased payload and energy savings, more particularly, a submersible vehicle, which may be an unmanned underwater vehicle, with high maneuvering cyclic-pitch postswirl propulsors. The high maneuvering cyclic-pitch postswirl propulsor arrangements are a bow thrust vectoring arrangement and a stern thrust vectoring arrangement. The bow thrust vectoring arrangement is a two-part arrangement having a forward/reverse element and a turning element. Similarly, the stern thrust vectoring arrangement is also a two-part arrangement having a forward/reverse element and a turning element.Type: GrantFiled: May 21, 2013Date of Patent: December 30, 2014Assignee: The United States of America as represented by the Secretary of the NavyInventors: Benjamin Y. - H. Chen, Stephen K. Neely
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Patent number: 7208065Abstract: The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.Type: GrantFiled: June 25, 2004Date of Patent: April 24, 2007Assignee: Industrial Technology Research InstituteInventors: Jing-Hung Chiou, Kai-Hsiang Yen, Chin-Horng Wang, Chao-Chiun Liang, Stella Y. H. Chen
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Patent number: 6828164Abstract: The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.Type: GrantFiled: April 1, 2003Date of Patent: December 7, 2004Assignee: Industrial Technology Research InstituteInventors: Jing-Hung Chiou, Kai-Hsiang Yen, Chin-Horng Wang, Chao-Chiun Liang, Stella Y. H. Chen
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Publication number: 20040231796Abstract: The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.Type: ApplicationFiled: June 25, 2004Publication date: November 25, 2004Applicant: Industrial Technology Research InstituteInventors: Jing-Hung Chiou, Kai-Hsiang Yen, Chin-Horng Wang, Chao-Chiun Liang, Stella Y.H. Chen
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Publication number: 20040113148Abstract: The specification discloses a structure and method for measuring the etching speed. A test layer is connected with several resistors. Etching the metal layer disconnects in order the resistors from the circuit. The equivalent resistance of the sensing resistor system is measured to obtain the etching speed. In consideration of the errors of the resistors, the invention also provides a structure that utilizes an IC layout technique to put an interdigitized dummy resistor beside the sensing resistors. By taking the ratio of the equivalent resistance of the sensing resistors and the dummy resistor, the invention can compute to obtain the etching speed.Type: ApplicationFiled: April 1, 2003Publication date: June 17, 2004Inventors: Jing-Hung Chiou, Kai-Hsiang Yen, Chin-Horng Wang, Chao-Chiun Liang, Stella Y.H. Chen
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Patent number: 5863397Abstract: Target mounting apparatus for use in a conventional physical vapor deposition system includes a target assembly, a source mounting plate, means for removably mounting the target assembly on the source mounting plate, and a keying system for preventing mounting of a target assembly which is incompatible with the deposition process intended to be carried out. The keying system includes a male portion formed on either the target assembly or the source mounting plate, and a female portion formed on the other of the target assembly and the source mounting plate. Keying of the target assembly to the source mounting plate is achieved by either forming the male and female portions with unique, mating cross sectional shapes, or by varying the spatial orientation or alignment of the male and female portions. In an alternate embodiment, a key pin is positionable in any of a plurality of positions on the source mounting plate, respectively corresponding to differing target assemblies.Type: GrantFiled: July 11, 1997Date of Patent: January 26, 1999Assignee: Taiwan Semiconductor Manufacturing Co Ltd.Inventors: C.C. Tu, Y.H. Chen
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Patent number: 5786262Abstract: A new method is disclosed to form a shallow trench isolation with a ozone-TEOS as a gapfilling material. The formation of the shallow trench isolation described herein includes a pad layer, a silicon nitride layer formed on a semiconductor substrate. A thermal oxide layer is subsequently formed on the silicon nitride layer. Then a shallow trench is created via photolithography and dry etching steps to etch the thermal oxide layer, the silicon nitride layer and the pad layer. After photoresist is removed, an ozone-TEOS layer is form in the shallow trench and on the top of the thermal oxide layer for the purpose of isolation. A CMP is perform to make the surface of the substrate with a planar surface. Then, a thermal annealing is used for densification of the ozone-TEOS layer and for forming a lining oxide to provide better isolation.Type: GrantFiled: April 9, 1997Date of Patent: July 28, 1998Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: S. M. Jang, Y. H. Chen, C. H. Yu
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Patent number: 5746462Abstract: The present invention discloses a flexible vacuum pick-up device for use in wafer processing that includes a handle portion adapted for holding by a human hand, the handle portion has a passage therein for fluid communication, a flexible conduit for providing a connection between the handle portion and a pick-up head and for providing a vacuum passage therethrough, and a vacuum pick-up head that has an extended planar surface adapted for making intimate contact with a substantially flat wafer.Type: GrantFiled: December 12, 1996Date of Patent: May 5, 1998Assignee: Taiwan Semiconductor Manufacturing Company,Ltd.Inventors: C. H. Lee, Y. H. Chen
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Patent number: 5632658Abstract: In accordance with one embodiment of the present invention a surface ship having at least one tractor podded propulsor is provided. The vessel having a tractor podded propulsor system comprises a hull means and at least one tractor podded propulsor unit attached to the aft section of the hull means. The at least one tractor podded propulsor unit comprises an axisymmetric pod having a longitudinal centerline associated therewith, at least one propeller mounted for rotation to a forward end of the pod, and a substantially vertically aligned streamlined strut connected at a top end to the aft section of the hull means and connected at a bottom end to the pod. The pod has a forward end and a tapered aft end. Mounted within the pod is at least one rotatably mounted propeller shaft that extends forward of the pod forward end, shaft seals, thrust bearings, and power means functioning to rotate the at least one propeller shaft.Type: GrantFiled: May 21, 1996Date of Patent: May 27, 1997Assignee: The United States of America as represented by the Secretary of the NavyInventors: Benjamin Y.-H. Chen, Carol L. Tseng
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Patent number: 5445105Abstract: A torque balanced propulsor unit for a submersible vehicle of the type having a bow, a stern, a longitudinally extending central section axisymmetric about a longitudinal axis of the vehicle and including therein a maximum diameter of the vehicle, and a tapered aft section axisymmetric about the longitudinal axis is provided. The torque balanced propulsor unit includes a rotor for providing a forward thrust to the vehicle. The rotor includes a central axisymmetric hub and a plurality of circumferentially spaced apart impeller blades extending radially from the central hub. The rotor is rotationally mounted to the tapered aft section of the vehicle. The rotor has a first torque associated therewith. The torque balanced propulsor unit further includes a stator for producing a second torque on the vehicle. The stator is secured to the vehicle at a location aft of the rotor.Type: GrantFiled: September 30, 1994Date of Patent: August 29, 1995Assignee: The United States of America as represented by the Secretary of the NavyInventors: Benjamin Y.-H. Chen, Carol L. Tseng, Frank B. Peterson