Abstract: The present invention relates to a flexible light source structure. The flexible light source structure includes a flexible insulating layer, a conductive trace layer formed on the flexible insulating layer, a plurality of light emitting diodes formed on the conductive trace layer and a packaging layer. The packaging layer covers the light emitting diodes and filling the gaps between the light emitting diodes.

Abstract: The present disclosure provides a light emitting diode (LED) element which includes a semiconductor layer, a plurality of electrodes, a plurality of microstructures, and a first protecting layer. The semiconductor layer has a light outputting surface. The electrodes are formed on the semiconductor layer and located opposite to the light outputting surface. The microstructures are formed on the light outputting surface. The first protecting layer covers the light outputting surface and fills between the microstructures, and the first protecting layer is transparent.

Abstract: A semiconductor light emitting device includes a semiconductor light emitting chip and a transparent conductive layer formed on the semiconductor light emitting chip. The semiconductor light emitting chip includes a substrate, and a first semiconductor layer, an active layer and a second semiconductor layer successively formed on the substrate. The transparent conductive layer is formed on the second semiconductor layer. A first electrode and a second electrode are respectively arranged on the transparent conductive layer and the first semiconductor layer. The transparent conductive layer has a roughened structure. A method of manufacturing a semiconductor light emitting device is also provided.

Abstract: A method for manufacturing a light emitting diode chip includes the following steps: providing an epitaxial structure having an epitaxial layer; forming a first electrode and a second electrode on the epitaxial layer; coating an inert layer on the epitaxial structure, the first electrode and the second electrode continuously; annealing the first electrode and the second electrode; and removing the inert layer coated on the first electrode and the second electrode to expose the first electrode and the second electrode.

Abstract: A light emitting diode (LED) epitaxy structure includes an N-type semiconductor layer; an active layer arranged on the N-type semiconductor layer, and a P-type semiconductor layer arranged on the active layer. A horizontal cross-sectional area defined by the active layer is a parallelogram, and none of the internal angles of the parallelogram is a right angle.

Abstract: A method for manufacturing a light emitting diode chip includes the following steps: providing an epitaxial structure having an epitaxial layer; forming a first electrode and a second electrode on the epitaxial layer; coating an inert layer on the epitaxial structure, the first electrode and the second electrode continuously; annealing the first electrode and the second electrode; and removing the inert layer coated on the first electrode and the second electrode to expose the first electrode and the second electrode.