Patents by Inventor YA-HSUAN WU

YA-HSUAN WU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250029161
    Abstract: A method for customizing an appearance of a merchandise which is suitable for being performed by a computing device in order to customize a customized choice result selected by a user includes a designed image and a merchandise information. The method includes receiving the designed image, receiving the merchandise information, overlappingly displaying the designed image on a virtual merchandise image corresponding to the merchandise information, receiving at least one edit operation for at least one designed element in the designed image, and editing for the designed element in the designed image according to the edit operation and then generating a customizing virtual image. Thereby, the method can be used for customizing an appearance of a merchandise and directly customize the designed image that has been arranged. In addition, a computing device and a non-transitory computer-readable recording medium for customizing the appearance of the merchandise are also provided.
    Type: Application
    Filed: June 3, 2024
    Publication date: January 23, 2025
    Applicant: EVOLUTIVE LABS CO., LTD.
    Inventors: TZI-HUEI LAI, YA-HSUAN CHANG, XIN-YING YOU, WEN-YAO TSAI, JUN-QI WANG, CHI-EN WU, YU-TING LIANG, YEONG-JYI LEI
  • Patent number: 11320742
    Abstract: The present disclosure provides a method and a system for generating photomask patterns. The system obtains a design layout image, and generates a hotspot image corresponding to the design layout image based on a hotspot detection model. The system generates two photomask patterns based on the hotspot image. The at least two photomask patterns are transferred onto a semiconductor substrate.
    Type: Grant
    Filed: June 6, 2019
    Date of Patent: May 3, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Yen-Tung Hu, Kuan-Chi Chen, Ya-Hsuan Wu, Shiuan-Li Lin, Chih-Chung Huang, Chi-Ming Tsai
  • Publication number: 20200133134
    Abstract: The present disclosure provides a method and a system for generating photomask patterns. The system obtains a design layout image, and generates a hotspot image corresponding to the design layout image based on a hotspot detection model. The system generates two photomask patterns based on the hotspot image. The at least two photomask patterns are transferred onto a semiconductor substrate.
    Type: Application
    Filed: June 6, 2019
    Publication date: April 30, 2020
    Inventors: YEN-TUNG HU, KUAN-CHI CHEN, YA-HSUAN WU, SHIUAN-LI LIN, CHIH-CHUNG HUANG, CHI-MING TSAI
  • Patent number: D1013224
    Type: Grant
    Filed: July 15, 2021
    Date of Patent: January 30, 2024
    Assignee: MAXZONE VEHICLE LIGHTING CORP.
    Inventors: Yu-Yuan Huang, Chun-Ting Chen, Ya-Hsuan Wu