Patents by Inventor Ya-Lin Chang

Ya-Lin Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12278173
    Abstract: An electronic package is provided and includes a substrate structure, an electronic element disposed on the substrate structure and an encapsulation layer encapsulating the electronic element, where at least one functional circuit is formed on a surface of a substrate body of the substrate structure, and a wire having a smaller width is arranged on a boundary line at a junction between an encapsulation area and a peripheral area, so that when a mold for forming the encapsulation layer is formed to cover the substrate structure, the mold will create a gap around the wire to serve as an exhaust passage. Therefore, when the encapsulation layer is formed, the exhaust passage can be used to exhaust air, so as to avoid problems such as the occurrence of voids or overflows of the encapsulation layer.
    Type: Grant
    Filed: July 7, 2022
    Date of Patent: April 15, 2025
    Assignee: SILICONWARE PRECISION INDUSTRIES CO., LTD.
    Inventors: Wen-Chen Hsieh, Ya-Ting Chi, Chia-Wen Tsao, Hsin-Yin Chang, Yi-Lin Tsai, Hsiu-Fang Chien
  • Publication number: 20250046846
    Abstract: Disclosed are an electrolytic reduction system of a vanadium electrolyte and a method for producing the electrolyte. The electrolytic reduction system includes a separating device and an electrolytic tank. The separating device is configured to separate a mixture consisting of a vanadium pentoxide (V2O5) solid and a sulfate acid solution, thereby obtaining a vanadium solution from a liquid discharging port of the separating device and a vanadium solid from a solid discharging port. The vanadium solution includes pentavalent vanadium ions. The electrolytic tank connects to the liquid discharging port of the separating device to contain the vanadium solution. In the method for producing the vanadium electrolyte, other chemical reagents are unnecessarily to be added into the mixture, and the vanadium solution is subjected to an electrolytic reduction process, such that the pentavalent vanadium ions are reduced to tetravalent vanadium ions and trivalent vanadium ions in the electrolytic tank.
    Type: Application
    Filed: October 22, 2024
    Publication date: February 6, 2025
    Inventors: CHIN-LUNG HSIEH, CIAN-TONG LU, YA-HSIN CHANG, KAN-LIN HSUEH
  • Patent number: 11795058
    Abstract: The present invention relates to a silicon dioxide composite particle with far-infrared radioactivity, which is formed by the hydrolysis, condensation and polymerization of an organic silane precursor having the structure of the formula (I) with a tetra-alkoxysilane. The high stability of organic silane precursor compounds and the low biotoxicity of silicon dioxide composite particles make the present far-infrared radioactive silicon dioxide composite particles of great potential for extensive use in related bio-products.
    Type: Grant
    Filed: August 5, 2019
    Date of Patent: October 24, 2023
    Assignees: NATIONAL CHI NAN UNIVERSITY, GREAT CHAIN CHEMICAL LTD.
    Inventors: Long-Li Lai, Cheng-Hua Lee, Yao-Chih Lu, Ya-Lin Chang
  • Patent number: 11299504
    Abstract: A process for preparing a triazine-based precursor for producing a micro-particulate complex containing a far infrared-emissive silica particle comprises steps of: a) subjecting 2-4-6-trichloro-1,3,5-triazine and a first nucleophilic compound to a displacement reaction in the presence of a first solvent at a first temperature range to form an intermediate; and b) subjecting the intermediate and a second nucleophilic compound to a further displacement reaction in the presence of a second solvent at a second temperature range higher than the first temperature range.
    Type: Grant
    Filed: August 10, 2020
    Date of Patent: April 12, 2022
    Assignees: NATIONAL CHI NAN UNIVERSITY, GREAT CHAIN CHEMICAL LTD
    Inventors: Long-Li Lai, Cheng-Hua Lee, Jhih-Yuan Tong, Yan-Chih Lu, Yu-You Lin, Ya-Lin Chang
  • Publication number: 20200369687
    Abstract: A process for preparing a triazine-based precursor for producing a micro-particulate complex containing a far infrared-emissive silica particle comprises steps of: a) subjecting 2-4-6-trichloro-1,3,5-triazine and a first nucleophilic compound to a displacement reaction in the presence of a first solvent at a first temperature range to form an intermediate; and b) subjecting the intermediate and a second nucleophilic compound to a further displacement reaction in the presence of a second solvent at a second temperature range higher than the first temperature range.
    Type: Application
    Filed: August 10, 2020
    Publication date: November 26, 2020
    Inventors: Long-Li Lai, Cheng-Hua Lee, Jhih-Yuan Tong, Yan-Chih Lu, Yu-You Lin, Ya-Lin Chang
  • Publication number: 20200180967
    Abstract: The present invention relates to a silicon dioxide composite particle with far-infrared radioactivity, which is formed by the hydrolysis, condensation and polymerization of an organic silane precursor having the structure of the formula (I) with a tetra-alkoxysilane. The high stability of organic silane precursor compounds and the low biotoxicity of silicon dioxide composite particles make the present far-infrared radioactive silicon dioxide composite particles of great potential for extensive use in related bio-products.
    Type: Application
    Filed: August 5, 2019
    Publication date: June 11, 2020
    Inventors: Long-Li LAI, Cheng-Hua LEE, Yao-Chih LU, Ya-Lin CHANG
  • Publication number: 20190055270
    Abstract: A process for preparing a triazine-based precursor for producing a micro-particulate complex containing a far infrared-emissive silica particle comprises steps of: a) subjecting 2-4-6-trichloro-1,3,5-triazine and a first nucleophilic compound to a displacement reaction in the presence of a first solvent at a first temperature range to form an intermediate; and b) subjecting the intermediate and a second nucleophilic compound to a further displacement reaction in the presence of a second solvent at a second temperature range higher than the first temperature range.
    Type: Application
    Filed: May 11, 2018
    Publication date: February 21, 2019
    Inventors: Long-Li Lai, Cheng-Hua Lee, Jhih-Yuan Tong, Yan-Chih Lu, Yu-You Lin, Ya-Lin Chang