Patents by Inventor Yaping Chen
Yaping Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20260348370Abstract: The present disclosure relates to a diaphragm structure, a diaphragm assembly, and a diaphragm pump. The diaphragm structure includes a main body member made of an elastic material and a support member made of a rigid material. The support member has a first end and a second end arranged opposite to each other in a first direction. The first end at least partially has a flared structure and is integrally embedded in the main body member. The second end protrudes from the main body member and is provided with a fixing portion at an end portion thereof for detachably connecting a driving member. The support member is provided with an anchoring portion adjacent to the first end, the anchoring portion is embedded in the main body member and has a first outer circumferential surface. The first outer circumferential surface is tapered and forms an inwardly curved concave arc surface.Type: ApplicationFiled: July 15, 2026Publication date: November 5, 2026Applicant: SUZHOU KERUIDA INTELLIGENT TECHNOLOGY CO., LTD.Inventors: Huiyong LIU, Haiming LIU, Yaping CHEN, Rongjun JU, Jiwei GUO
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Publication number: 20260348376Abstract: Disclosed herein are a pump chamber structure and a diaphragm pump. The diaphragm pump includes a pump housing, an air inlet assembly, an air outlet assembly, a plurality of diaphragm structures, and a plurality of pump covers. The pump housing includes a plurality of shell plates and a side plate, the plurality of shell plates are sequentially connected along a circumferential direction of the pump housing and together with the side plate enclose a pump chamber, and each of the plurality of shell plates is provided with chamber openings extending therethrough for communicating with the pump chamber. The air inlet assembly and the air outlet assembly are disposed on the side plate and spaced apart from each other. The plurality of diaphragm structures are disposed on the chamber openings in a one-to-one correspondence, and a peripheral edge of each of the plurality of diaphragm structures is connected and fixed to the corresponding chamber opening.Type: ApplicationFiled: July 14, 2026Publication date: November 5, 2026Applicant: SUZHOU KERUIDA INTELLIGENT TECHNOLOGY CO., LTD.Inventors: Huiyong LIU, Haiming LIU, Yaping CHEN, Rongjun JU, Jiwei GUO
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Publication number: 20230212611Abstract: The present disclosure relates generally to a molecular delivery system and methods of using the molecular delivery system to deliver biomolecules into cells. In particular, the molecular delivery system comprises a nanotube (NT) array comprising a plurality of nanotubes (NTs) which are used to deliver biomolecules to cells. The NTs can be loaded with molecules that can be delivered into cells following contact (e.g. penetration) by the NTs.Type: ApplicationFiled: February 10, 2021Publication date: July 6, 2023Inventors: Nicolas Hans VOELCKER, Roey ELNATHAN, Stella ASLANOGLOU, Yaping CHEN
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Patent number: 10573553Abstract: Disclosed examples provide processes for fabricating a semiconductor product and for forming a patterned stack with an aluminum layer and a tungsten layer, including forming a first dielectric layer on a gate structure and on first and second regions of a substrate, forming a diffusion barrier layer on the first dielectric layer, forming a tungsten layer on the diffusion barrier layer, forming an aluminum layer on the tungsten layer, forming a hard mask on the aluminum layer, forming a patterned resist mask which covers the hard mask above the first region and exposes the hard mask layer above the second region, dry etching the hard mask and the aluminum layer above the second region using the patterned resist mask layer, removing the resist mask, and dry etching the tungsten layer using the hard mask layer to expose the first dielectric layer above the second region.Type: GrantFiled: January 7, 2019Date of Patent: February 25, 2020Assignee: TEXAS INSTRUMENTS INCORPORATEDInventors: Hong Yang, Abbas Ali, Yaping Chen, Chao Zuo, Seetharaman Sridhar, Yunlong Liu
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Patent number: 10417372Abstract: Systems and techniques for creating and displaying a circuit design view are described. A hardware description language (HDL) specification and a power intent specification of the circuit design can be analyzed to determine a correspondence between one or more signals in the HDL specification and one or more isolation cells in the power intent specification. The correspondence can be stored in a memory of a computer, and can be used for annotating a visual representation of a signal in a circuit design view based on a corresponding isolation cell. Next, the circuit design view with the annotated visual representation of the signal can be displayed.Type: GrantFiled: November 25, 2015Date of Patent: September 17, 2019Assignee: Synopsys, Inc.Inventors: Chih Neng Hsu, Yaping Chen
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Publication number: 20190157142Abstract: Disclosed examples provide processes for fabricating a semiconductor product and for forming a patterned stack with an aluminum layer and a tungsten layer, including forming a first dielectric layer on a gate structure and on first and second regions of a substrate, forming a diffusion barrier layer on the first dielectric layer, forming a tungsten layer on the diffusion barrier layer, forming an aluminum layer on the tungsten layer, forming a hard mask on the aluminum layer, forming a patterned resist mask which covers the hard mask above the first region and exposes the hard mask layer above the second region, dry etching the hard mask and the aluminum layer above the second region using the patterned resist mask layer, removing the resist mask, and dry etching the tungsten layer using the hard mask layer to expose the first dielectric layer above the second region.Type: ApplicationFiled: January 7, 2019Publication date: May 23, 2019Inventors: Hong YANG, Abbas ALI, Yaping CHEN, Chao ZUO, Seetharaman SRIDHAR, Yunlong LIU
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Patent number: 10211096Abstract: Disclosed examples provide processes for fabricating a semiconductor product and for forming a patterned stack with an aluminum layer and a tungsten layer, including forming a first dielectric layer on a gate structure and on first and second regions of a substrate, forming a diffusion barrier layer on the first dielectric layer, forming a tungsten layer on the diffusion barrier layer, forming an aluminum layer on the tungsten layer, forming a hard mask on the aluminum layer, forming a patterned resist mask which covers the hard mask above the first region and exposes the hard mask layer above the second region, dry etching the hard mask and the aluminum layer above the second region using the patterned resist mask layer, removing the resist mask, and dry etching the tungsten layer using the hard mask layer to expose the first dielectric layer above the second region.Type: GrantFiled: March 22, 2018Date of Patent: February 19, 2019Assignee: TEXAS INSTRUMENTS INCORPORATEDInventors: Hong Yang, Abbas Ali, Yaping Chen, Chao Zuo, Seetharaman Sridhar, Yunlong Liu
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Publication number: 20170279321Abstract: A steel magnet body assembly comprises a first magnetizer (1) and a second magnetizer (2) that are magnetically conductive, and comprises multiple steel magnets (3). A magnetically insulative fixing member (4) used for fixing the steel magnets (3) is disposed between the first magnetizer (1) and the second magnetizer (2). The first magnetizer (1), the fixing member (4) and the second magnetizer (2) are sequentially stacked. The multiple steel magnets (3) are fixed in the fixing member (4) in an evenly spaced manner. Each steel magnet (3) is a column having an N magnetic pole and an S magnetic pole, and the N magnetic pole and the S magnetic pole of the steel magnets (3) are relatively disposed on two sides of a plane where the central axis of the column of the steel magnet (3) is located.Type: ApplicationFiled: August 28, 2014Publication date: September 28, 2017Inventors: Shugang GONG, Shiwei HU, Yaping CHEN, Jigao ZHAO, Changliang LI
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Publication number: 20170147720Abstract: Systems and techniques for creating and displaying a circuit design view are described. A hardware description language (HDL) specification and a power intent specification of the circuit design can be analyzed to determine a correspondence between one or more signals in the HDL specification and one or more isolation cells in the power intent specification. The correspondence can be stored in a memory of a computer, and can be used for annotating a visual representation of a signal in a circuit design view based on a corresponding isolation cell. Next, the circuit design view with the annotated visual representation of the signal can be displayed.Type: ApplicationFiled: November 25, 2015Publication date: May 25, 2017Applicant: Synopsys, Inc.Inventors: Chih Neng Hsu, Yaping Chen
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Patent number: 6197568Abstract: Methods and compositions for the isolation, diagnosis and treatment of microorganisms such as flaviviruses and other hemorrhagic fever viruses are based on the sulfated polyanion-dependent interaction of flaviviruses and hemorrhagic fever viruses, in particular dengue virus, with target cells. The cellular receptors targeted by these viruses have been identified as sulfated polyanionic glycoproteins, that include highly sulfated heparan sulfate glycosaminoglycans for some target cell types, and as a sulfated mucin on vascular endothelium. Compounds such as heparin, highly sulfated heparan sulfate, and synthetic polyanions such as Suramin, inhibit the interaction between the microorganisms and target cells, thereby disrupting the infective process.Type: GrantFiled: July 28, 1998Date of Patent: March 6, 2001Assignee: The Regents of the University of MichiganInventors: Rory M. Marks, Yaping Chen, Terence Maguire, Robert J. Linhardt
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Patent number: D914548Type: GrantFiled: October 25, 2019Date of Patent: March 30, 2021Assignee: Foshan Zhengbu Technology Co., Ltd.Inventor: Yaping Chen
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Patent number: D914549Type: GrantFiled: October 28, 2019Date of Patent: March 30, 2021Assignee: Foshan Zhengbu Technology Co., Ltd.Inventor: Yaping Chen
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Patent number: D933538Type: GrantFiled: July 6, 2020Date of Patent: October 19, 2021Assignee: Foshan Zhengbu Technology Co., Ltd.Inventor: Yaping Chen
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Patent number: D991839Type: GrantFiled: October 18, 2021Date of Patent: July 11, 2023Assignee: Foshan Zhengbu Technology Co., Ltd.Inventor: Yaping Chen
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Patent number: D1008886Type: GrantFiled: March 10, 2022Date of Patent: December 26, 2023Assignee: Foshan Zhengbu Technology Co., Ltd.Inventor: Yaping Chen
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Patent number: D1093218Type: GrantFiled: April 9, 2025Date of Patent: September 16, 2025Assignee: Guangzhou Siluo Information Technology Co., Ltd.Inventor: Yaping Chen
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Patent number: D1097892Type: GrantFiled: February 4, 2024Date of Patent: October 14, 2025Assignee: HK ZBLUEBIKE LIMITEDInventor: Yaping Chen
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Patent number: D1130199Type: GrantFiled: September 12, 2024Date of Patent: June 16, 2026Inventor: Yaping Chen
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Patent number: D1142050Type: GrantFiled: November 14, 2025Date of Patent: August 18, 2026Inventor: Yaping Chen