Patents by Inventor Ya-Qian Chen

Ya-Qian Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11914292
    Abstract: The photosensitive resin composition includes an alkali-soluble resin (A), an ethylenically-unsaturated monomer (B), a photopolymerization initiator (C), a solvent (D), and a pigment (E). The alkali- soluble resin (A) includes an alkali-soluble resin (A-1), wherein the alkali-soluble resin (A-1) includes a structural unit represented by formula (I-1) and a structural unit represented by formula (I-2). The photopolymerization initiator (C) includes an acylphosphine oxide compound represented by formula (III-1).
    Type: Grant
    Filed: May 5, 2021
    Date of Patent: February 27, 2024
    Assignee: eChem Solutions Corp.
    Inventors: Ya-Qian Chen, Yu-Chun Chen
  • Publication number: 20240018379
    Abstract: A photosensitive resin composition, a cured product and a manufacturing method thereof, a light conversion layer and a light emitting device are provided. The photosensitive resin composition includes a resin (A), an ethylenically unsaturated monomer (B), a photopolymerization initiator (C), a pigment (D) and a solvent (E). The resin (A) includes an alkali-soluble resin (A-1), other resin (A-2) or the combination thereof. The alkali-soluble resin (A-1) includes a structural unit represented by the following formula (A1). The photopolymerization initiator (C) includes a compound represented by the following formula (C1). In formula (A1) and formula (C1), the definition of each substituent is the same as that in the detailed description.
    Type: Application
    Filed: July 13, 2023
    Publication date: January 18, 2024
    Applicant: Advanced Echem Materials Company Limited
    Inventors: Chun-Kuan Tai, Ya-Qian Chen, Yu-Chun Chen
  • Publication number: 20240019780
    Abstract: A photosensitive resin composition, a cured film and a microlens array are provided. The photosensitive resin composition includes resin (A), an ethylenically unsaturated monomer (B) and a photopolymerization initiator (C). The resin (A) includes an alkali-soluble resin (A-1). The alkali-soluble resin (A-1) includes a structural unit represented by following Formula (A1), a structural unit represented by following Formula (A2) or a combination thereof. The ethylenically unsaturated monomer (B) includes a compound represented by following Formula (B1). In Formula (A1), Formula (A2) and Formula (B1), the definition of R1 to R6, X1, Y1, Y2, m, n and * are the same as defined in the detailed description.
    Type: Application
    Filed: July 13, 2023
    Publication date: January 18, 2024
    Applicant: Advanced Echem Materials Company Limited
    Inventors: Ya-Qian Chen, Yu-Chun Chen
  • Publication number: 20230107355
    Abstract: A resin composition and a cured film are provided. The resin composition includes a monomer mixture (A), a siloxane compound (B), a curing agent (C), and inorganic particles (D). The monomer mixture (A) includes a bisphenol fluorene compound (A-1) represented by Formula (I-1). The siloxane compound (B) has a group represented by Formula (II-a).
    Type: Application
    Filed: September 28, 2022
    Publication date: April 6, 2023
    Applicant: eChem Solutions Corp.
    Inventors: Ya-Qian Chen, Yu-Chun Chen
  • Publication number: 20210382389
    Abstract: A photosensitive resin composition for a development process, a spacer, a light conversion layer, and a light-emitting device are provided. The photosensitive resin composition includes an alkali-soluble resin (A), an ethylenically-unsaturated monomer (B), a photopolymerization initiator (C), a solvent (D), and a pigment (E). The alkali-soluble resin (A) includes an alkali-soluble resin (A-1), wherein the alkali-soluble resin (A-1) includes a structural unit represented by formula (I-1) and a structural unit represented by formula (I-2). The photopolymerization initiator (C) includes an acylphosphine oxide compound represented by formula (III-1).
    Type: Application
    Filed: May 5, 2021
    Publication date: December 9, 2021
    Applicant: eChem Solutions Corp.
    Inventors: Ya-Qian Chen, Yu-Chun Chen