Patents by Inventor Ya-Wen Lee

Ya-Wen Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130335665
    Abstract: An integrated gate driver circuit includes a control circuit, a plurality of drive stages and a plurality of discharge transistors. The control circuit is configured to output a plurality of clock signals within a frame period and to output a discharge enabling signal within a blanking period of the frame period. Each of the drive stages receives the clock signals and includes an output terminal configured to output a gate driving signal. Each of the discharge transistors is coupled to the output terminal of one of the drive stages and discharges the output terminal according to the discharge enabling signal thereby eliminating the voltage fluctuation of the output terminal in the blanking period.
    Type: Application
    Filed: February 20, 2013
    Publication date: December 19, 2013
    Applicant: HannStar Display Corp.
    Inventors: Chun-Chin TSENG, Ya-Wen Lee, Kuo-Wen Pan
  • Patent number: 7849314
    Abstract: A method and a system for secure authentication in a wireless network are provided. The method comprises the following steps. First, a network device and a client device of a wireless network authenticate each other with EAP-TLS. Wherein, the network device mentioned above is a gateway or an access point. Then, the network device and the client device generate a TLS master secret jointly. In addition, the method uses a distributed mechanism to prevent the consequences of the failure of a single AAA server, and to alleviate the consequences resulting from a violated network device. Furthermore, the method includes a multiple time digital signature mechanism achieved by performing multiple times of one-way hash operation to enable verification and revocation of certificate.
    Type: Grant
    Filed: April 24, 2006
    Date of Patent: December 7, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Min-Chih Kao, Ya-Wen Lee, Yi-Shiung Yeh, Chen-Hwa Song
  • Patent number: 7838386
    Abstract: Disclosed is a method and a system for forming alignment marks on a transparent substrate. A light reflective layer is deposited over an optically transparent substrate of a wafer. A region is defined around an alignment mark on the optically transparent substrate. The light reflective layer is removed from a substantial portion of the transparent substrate excluding the region. In addition, a micro electro-mechanical systems device is disclosed. The device comprises an optically transparent substrate, at least one optically partially transparent alignment mark on the optically transparent substrate, and a plurality of reflective elements or imaging pixels attached to the optically transparent substrate.
    Type: Grant
    Filed: September 23, 2008
    Date of Patent: November 23, 2010
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ruei-Hung Jang, Ya-Wen Lee, Tzu-Yang Wu, Sheng-Liang Pan, Chin-Hsiang Lin, Tsai-Sheng Gau
  • Publication number: 20090098283
    Abstract: Disclosed is a method and a system for forming alignment marks on a transparent substrate. A light reflective layer is deposited over an optically transparent substrate of a wafer. A region is defined around an alignment mark on the optically transparent substrate. The light reflective layer is removed from a substantial portion of the transparent substrate excluding the region. In addition, a micro electro-mechanical systems device is disclosed. The device comprises an optically transparent substrate, at least one optically partially transparent alignment mark on the optically transparent substrate, and a plurality of reflective elements or imaging pixels attached to the optically transparent substrate.
    Type: Application
    Filed: September 23, 2008
    Publication date: April 16, 2009
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ruei-Hung JANG, Ya-Wen Lee, Tzu-Yang Wu, Sheng-Liang Pan, Chin-Hsiang Lin, Tsai-Sheng Gau
  • Patent number: 7494830
    Abstract: A method for wafer backside alignment overlay accuracy includes forming a buried layer on a front-side of a wafer; forming a conductive layer on the buried layer and patterning a first test structure and a second test structure therein; forming an etch stop layer on the conductive layer; etching through the wafer from the backside to perform an alignment process with the first test structure; and determining an overlay accuracy of the alignment process with the second test structure. The first test structure includes an optical vernier and the second test structure includes an electrical testing structure.
    Type: Grant
    Filed: April 6, 2007
    Date of Patent: February 24, 2009
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Sheng-Chieh Liu, Tzu-Yang Wu, Ya-Wen Lee, Jeffery Chu, Hsueh-Liang Chou, Chia-Hung Kao
  • Patent number: 7450296
    Abstract: Disclosed is a method and a system for forming alignment marks on a transparent substrate. A light reflective layer is deposited over an optically transparent substrate of a wafer. A region is defined around an alignment mark on the optically transparent substrate. The light reflective layer is removed from a substantial portion of the transparent substrate excluding the region. In addition, a micro electro-mechanical systems device is disclosed. The device comprises an optically transparent substrate, at least one optically partially transparent alignment mark on the optically transparent substrate, and a plurality of reflective elements or imaging pixels attached to the optically transparent substrate.
    Type: Grant
    Filed: April 10, 2006
    Date of Patent: November 11, 2008
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ruei-Hung Jang, Ya-Wen Lee, Tzu-Yang Wu, Sheng-Liang Pan, Chin-Hsiang Lin, Tsai-Sheng Gau
  • Publication number: 20080248600
    Abstract: A method for wafer backside alignment overlay accuracy includes forming a buried layer on a front-side of a wafer; forming a conductive layer on the buried layer and patterning a first test structure and a second test structure therein; forming an etch stop layer on the conductive layer; etching through the wafer from the backside to perform an alignment process with the first test structure; and determining an overlay accuracy of the alignment process with the second test structure. The first test structure includes an optical vernier and the second test structure includes an electrical testing structure.
    Type: Application
    Filed: April 6, 2007
    Publication date: October 9, 2008
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Sheng-Chieh Liu, Tzu-Yang Wu, Ya-Wen Lee, Jeffrey Chu, Hsueh-Liang Chou, Chia-Hung Kao
  • Publication number: 20070177244
    Abstract: Disclosed is a method and a system for forming alignment marks on a transparent substrate. A light reflective layer is deposited over an optically transparent substrate of a wafer. A region is defined around an alignment mark on the optically transparent substrate. The light reflective layer is removed from a substantial portion of the transparent substrate excluding the region. In addition, a micro electro-mechanical systems device is disclosed. The device comprises an optically transparent substrate, at least one optically partially transparent alignment mark on the optically transparent substrate, and a plurality of reflective elements or imaging pixels attached to the optically transparent substrate.
    Type: Application
    Filed: April 10, 2006
    Publication date: August 2, 2007
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Ruei-Hung Jang, Ya-Wen Lee, Tzu-Yang Wu, Sheng-Liang Pan, Chin-Hsiang Lin, Tsai-Sheng Gau
  • Publication number: 20070162958
    Abstract: A method and a system for secure authentication in a wireless network are provided. The method comprises the following steps. First, a network device and a client device of a wireless network authenticate each other with EAP-TLS. Wherein, the network device mentioned above is a gateway or an access point. Then, the network device and the client device generate a TLS master secret jointly. In addition, the method uses a distributed mechanism to prevent the consequences of the failure of a single AAA server, and to alleviate the consequences resulting from a violated network device. Furthermore, the method includes a multiple time digital signature mechanism achieved by performing multiple times of one-way hash operation to enable verification and revocation of certificate.
    Type: Application
    Filed: April 24, 2006
    Publication date: July 12, 2007
    Inventors: Min-Chih Kao, Ya-Wen Lee, Yi-Shiung Yeh, Chen-Hwa Song