Patents by Inventor Yain-Ming Chen

Yain-Ming Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6773246
    Abstract: An atomizing apparatus for the production of powders or spray deposits, having an atomization device for receiving a liquid stream of molten metal or metal alloy to be atomized; at least two primary atomization gas jets for directing an atomization gas at an angle into the liquid stream in an atomization zone at an impinging point of the atomization jets to break the stream into atomized droplets; and at least two secondary jets for direction a controlling fluid at a pressure, flow rate and direction, the jets being aimed at the atomization gas jet or into the atomization zone, wherein said secondary jets control a backpressure generated by the primary atomization gas jets. The apparatus also includes means for in-situ controlling at least one of the relative positions among the primary atomization jets, the secondary jets, and the liquid delivery nozzle.
    Type: Grant
    Filed: September 19, 2001
    Date of Patent: August 10, 2004
    Inventors: Chi-yuan A. Tsao, Yain-Hauw Su, Yain-Ming Chen, Ray-Wen Lin
  • Publication number: 20020076458
    Abstract: A method and apparatus for atomizing a liquid stream of metal or metal alloy. This invention relates to producing powders as well as to spray deposition process. During atomizing, a backpressure is created below the exit of the liquid delivery nozzle by the impingement of the atomization gas jets around the atomizdtion zone. And this may block further atomization. The present invention provides a method of atomizing and an atomizing apparatus to control the backpressure. During atomizing, the intensities and directions of the atomization gas jets affects the atomization characteristics. The present invention provides a method of atomizing and an atomizing apparatus to control both the intensities and directions of the atomization gas jets. This invention relates to a method and apparatus for atomizing a liquid stream of metal or metal alloy. This invention relates to producing powders as well as to spray deposition process.
    Type: Application
    Filed: September 19, 2001
    Publication date: June 20, 2002
    Inventors: Chi-Yuan A. Tsao, Yain-Hauw Su, Yain-Ming Chen, Ray-Wen Lin
  • Patent number: 5993509
    Abstract: This invention relates to a method and apparatus for atomizing a liquid stream of metal or metal alloy. This invention relates to producing powders as well as to spray deposition process. During atomizing, a backpressure is created below the exit of the liquid delivery nozzle by the impingement of the atomization gas jets around the atomization zone. And this may block further atomization. The present invention provides a method of atomizing and an atomizing apparatus to control the backpressure. During atomizing, the intensities and directions of the atomization gas jets affects the atomization characteristics. The present invention provides a method of atomizing and an atomizing apparatus to control both the intensities and directions of the atomization gas jets.
    Type: Grant
    Filed: November 19, 1996
    Date of Patent: November 30, 1999
    Inventors: Chi-Yuan Albert Tsao, Yain-Hauw Su, Yain-Ming Chen, Ray-Wen Lin