Patents by Inventor Yair Ein-Eli
Yair Ein-Eli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11826705Abstract: Provided herein is forward osmosis-based water purification process, that includes contacting a solution of a soluble draw agent with a dehydrated insoluble draw agent, separating the now hydrated insoluble draw agent from the now concentrated draw solution, and exerting a stimulus on the hydrated insoluble draw agent for extracting water therefrom, thereby regenerating a dehydrated insoluble draw agent, wherein the osmotic concentration (osmolality) of the insoluble draw agent is greater than the osmotic concentration of the diluted draw solution, and the insoluble draw agent is impermeable to the soluble draw agent.Type: GrantFiled: March 3, 2022Date of Patent: November 28, 2023Assignee: Technion Research & Development Foundation LimitedInventors: Alexander Kraytsberg, Yair Ein-Eli
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Patent number: 11688845Abstract: Disclosed is a method for activating a surface of metals, such as self-passivated metals, and of metal-oxide dissolution, effected using a fluoroanion-containing composition. Also disclosed is an electrochemical cell utilizing an aluminum-containing anode material and a fluoroanion-containing electrolyte, characterized by high efficiency, low corrosion, and optionally mechanical or electrochemical rechargeability. Also disclosed is a process for fusing (welding, soldering etc.) a self-passivated metal at relatively low temperature and ambient atmosphere, and a method for electrodepositing a metal on a self-passivated metal using metal-oxide source.Type: GrantFiled: April 7, 2020Date of Patent: June 27, 2023Assignee: Technion Research & Development Foundation LimitedInventors: Yair Ein-Eli, Danny Gelman, Boris Shvartsev, Alexander Kraytsberg
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Publication number: 20220223314Abstract: Provided herein are composite conductors, characterized by having copper deposits inside the bulk rather than on the outer surface of a non-metallic conductive porous matrix, such as CNT fabric, as well as a process for obtaining the same. The composite conductors provided herein are also characterized by a low specific weight and a high ampacity compared to metal conductors of similar size and shape.Type: ApplicationFiled: May 14, 2020Publication date: July 14, 2022Applicant: Technion Research & Development Foundation LimitedInventors: Yair EIN-ELI, Neta YITZHACK, Nina SEZIN, David STAROSVETSKY
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Publication number: 20220184554Abstract: Provided herein is forward osmosis-based water purification process, that includes contacting a solution of a soluble draw agent with a dehydrated insoluble draw agent, separating the now hydrated insoluble draw agent from the now concentrated draw solution, and exerting a stimulus on the hydrated insoluble draw agent for extracting water therefrom, thereby regenerating a dehydrated insoluble draw agent, wherein the osmotic concentration (osmolality) of the insoluble draw agent is greater than the osmotic concentration of the diluted draw solution, and the insoluble draw agent is impermeable to the soluble draw agent.Type: ApplicationFiled: March 3, 2022Publication date: June 16, 2022Applicant: Technion Research & Development Foundation LimitedInventors: Alexander KRAYTSBERG, Yair EIN-ELI
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Patent number: 11318418Abstract: Provided herein is forward osmosis-based water purification process, that includes contacting a solution of a soluble draw agent with a dehydrated insoluble draw agent, separating the now hydrated insoluble draw agent from the now concentrated draw solution, and exerting a stimulus on the hydrated insoluble draw agent for extracting water therefrom, thereby regenerating a dehydrated insoluble draw agent, wherein the osmotic concentration (osmolality) of the insoluble draw agent is greater than the osmotic concentration of the diluted draw solution, and the insoluble draw agent is impermeable to the soluble draw agent.Type: GrantFiled: October 24, 2018Date of Patent: May 3, 2022Assignee: Technion Research & Development Foundation LimitedInventors: Alexander Kraytsberg, Yair Ein-Eli
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Publication number: 20200306695Abstract: Provided herein is forward osmosis-based water purification process, that includes contacting a solution of a soluble draw agent with a dehydrated insoluble draw agent, separating the now hydrated insoluble draw agent from the now concentrated draw solution, and exerting a stimulus on the hydrated insoluble draw agent for extracting water therefrom, thereby regenerating a dehydrated insoluble draw agent, wherein the osmotic concentration (osmolality) of the insoluble draw agent is greater than the osmotic concentration of the diluted draw solution, and the insoluble draw agent is impermeable to the soluble draw agent.Type: ApplicationFiled: October 24, 2018Publication date: October 1, 2020Applicant: Technion Research & Development Foundation LimitedInventors: Alexander KRAYTSBERG, Yair EIN-ELI
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Publication number: 20200235374Abstract: Disclosed is a method for activating a surface of metals, such as self-passivated metals, and of metal-oxide dissolution, effected using a fluoroanion-containing composition. Also disclosed is an electrochemical cell utilizing an aluminum-containing anode material and a fluoroanion-containing electrolyte, characterized by high efficiency, low corrosion, and optionally mechanical or electrochemical rechargeability. Also disclosed is a process for fusing (welding, soldering etc.) a self-passivated metal at relatively low temperature and ambient atmosphere, and a method for electrodepositing a metal on a self-passivated metal using metal-oxide source.Type: ApplicationFiled: April 7, 2020Publication date: July 23, 2020Applicant: Technion Research & Development Foundation LimitedInventors: Yair EIN-ELI, Danny GELMAN, Boris SHVARTSEV, Alexander KRAYTSBERG
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Patent number: 10644304Abstract: Disclosed is a method for activating a surface of metals, such as self-passivated metals, and of metal-oxide dissolution, effected using a fluoroanion-containing composition. Also disclosed is an electrochemical cell utilizing an aluminum-containing anode material and a fluoroanion-containing electrolyte, characterized by high efficiency, low corrosion, and optionally mechanical or electrochemical rechargeability. Also disclosed is a process for fusing (welding, soldering etc.) a self-passivated metal at relatively low temperature and ambient atmosphere, and a method for electrodepositing a metal on a self-passivated metal using metal-oxide source.Type: GrantFiled: March 31, 2015Date of Patent: May 5, 2020Assignee: Technion Research & Development Foundation LimitedInventors: Yair Ein-Eli, Danny Gelman, Boris Shvartsev, Alexander Kraytsberg
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Publication number: 20180233770Abstract: Provided herein is a method of reducing the charge/discharge capacity fade rate of a rechargeable lithium-ion battery (LIB) during cycling, and extending the life and the number of discharge/recharge cycles thereof, effected by coating particles of lithium intercalation materials used for making the electrodes of the LIB, with a uniform layer of a metal fluoride effected by atomic layer deposition (ALD). Also provided are coated particulate lithium intercalation materials, electrodes and lithium-ion batteries having electrodes made with particulate lithium intercalation materials coated with a uniform later of a metal fluoride using ALD.Type: ApplicationFiled: August 8, 2016Publication date: August 16, 2018Inventors: Yair EIN-ELI, Alexander KRAYTSBERG, Haika DREZNER
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Publication number: 20170179464Abstract: Disclosed is a method for activating a surface of metals, such as self-passivated metals, and of metal-oxide dissolution, effected using a fluoroanion-containing composition. Also disclosed is an electrochemical cell utilizing an aluminum-containing anode material and a fluoroanion-containing electrolyte, characterized by high efficiency, low corrosion, and optionally mechanical or electrochemical rechargeability. Also disclosed is a process for fusing (welding, soldering etc.) a self-passivated metal at relatively low temperature and ambient atmosphere, and a method for electrodepositing a metal on a self-passivated metal using metal-oxide source.Type: ApplicationFiled: March 31, 2015Publication date: June 22, 2017Inventors: Yair EIN-ELI, Danny GELMAN, Boris SHVARTSEV, Alexander KRAYTSBERG
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Patent number: 9159995Abstract: Silicon-oxygen batteries comprising a silicon anode as chemical fuel, an air-cathode for dissociating oxygen and a non-aqueous electrolyte, and applications using the same are provided. The silicon-batteries may utilize air for generating oxygen.Type: GrantFiled: February 11, 2010Date of Patent: October 13, 2015Assignees: Technion Research & Development Foundation Limited, The Penn State Research FoundationInventors: Yair Ein-Eli, Digby Donald MacDonald
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Patent number: 9145341Abstract: A novel process of preparing a Grignard reagent is disclosed. The process is effected by electrochemically reacting a Grignard precursor with an electrode which comprises a metal for forming the Grignard reagent, in the presence an electrolyte solution that comprises a room temperature ionic liquid (RTIL). Electrochemical cells and systems for performing the process, and uses thereof in various applications are also disclosed.Type: GrantFiled: November 19, 2013Date of Patent: September 29, 2015Assignee: Technion Research & Development Foundation LimitedInventors: Yair Ein-Eli, Daniel Luder, Alexander Kraytsberg
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Patent number: 8835060Abstract: Silicon-oxygen batteries comprising a silicon anode as chemical fuel, an air-cathode for dissociating oxygen, and an electrolyte, and applications using the same are provided. The silicon-batteries may utilize air for generating oxygen.Type: GrantFiled: February 11, 2010Date of Patent: September 16, 2014Assignees: Technion Research & Development Foundation Limited, The Penn State Research FoundationInventors: Yair Ein-Eli, Digby Donald MacDonald
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Publication number: 20140142332Abstract: A novel process of preparing a Grignard reagent is disclosed. The process is effected by electrochemically reacting a Grignard precursor with an electrode which comprises a metal for forming the Grignard reagent, in the presence an electrolyte solution that comprises a room temperature ionic liquid (RTIL). Electrochemical cells and systems for performing the process, and uses thereof in various applications are also disclosed.Type: ApplicationFiled: November 19, 2013Publication date: May 22, 2014Applicant: Technion Research & Development Foundation LimitedInventors: Yair Ein-Eli, Daniel Luder, Alexander Kraytsberg
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Publication number: 20120299550Abstract: Silicon-oxygen batteries comprising a silicon anode as chemical fuel, an air-cathode for dissociating oxygen and a non-aqueous electrolyte, and applications using the same are provided. The silicon-batteries may utilize air for generating oxygen.Type: ApplicationFiled: February 11, 2010Publication date: November 29, 2012Applicants: The Penn State Research Foundation, Technio Research & Development Foundation Ltd.Inventors: Yair Ein-Eli, Digby Donald MacDonald
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Publication number: 20120028073Abstract: A process for electroplating high adhesion copper layer on a surface of a highly oxidizable metal in an invariable container, and products produced by this process are provided.Type: ApplicationFiled: February 11, 2010Publication date: February 2, 2012Applicant: Technion Research & Development Foundation Ltd.Inventors: Yair Ein-Eli, Nina Sezin, David Starosvetsky
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Publication number: 20110318657Abstract: Silicon-oxygen batteries comprising a silicon anode as chemical fuel, an air-cathode for dissociating oxygen, and an electrolyte, and applications using the same are provided. The silicon-batteries may utilize air for generating oxygen.Type: ApplicationFiled: February 11, 2010Publication date: December 29, 2011Applicant: THE PENN STATE RESEARCH FOUNDATIONInventors: Yair Ein-Eli, Digby Donald Macdonald
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Patent number: 7964005Abstract: A composition that rapidly passivates copper-containing surface to yield a uniform layer of insoluble copper oxide, the composition being useful in chemical-mechanical planarization of copper-containing surfaces is disclosed. The composition is a solution having a pH of equal to or greater than 9 and having an oxidation potential sufficient to oxidize the surface to form non-soluble copper oxides. Also disclosed are methods of making and using the composition.Type: GrantFiled: April 4, 2004Date of Patent: June 21, 2011Assignee: Technion Research & Development Foundation Ltd.Inventors: Yair Ein-Eli, David Starosvetsky, Esta Abelev, Eugene Rabkin
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Patent number: 7494936Abstract: A method for electrochemical etching of a semiconductor material using positive potential dissolution (PPD) in solutions that do not contain hydrofluoric acid (HF-free solutions). The method includes immersing an as-cut semiconductor material in an etching solution, and positive biasing at atypically highly positive (anodic) potentials, thereby significantly increasing the value of the anodic current density (measured as A/cm2) of the semiconductor material. The application of positive biasing at atypically highly positive (anodic) potentials, is combined with specifically controlling and directing illumination on the semiconductor material surface contacted and wetted by the etching solution. This is done for a necessary and sufficient period of time to enable a positive synergistic effect on the rate and extent of etching of the semiconductor material therefrom.Type: GrantFiled: May 16, 2005Date of Patent: February 24, 2009Assignee: Technion Research & Development Foundation Ltd.Inventors: Yair Ein-Eli, David Starosvetsky, Joseph Yahalom
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Publication number: 20080110759Abstract: A method of performing electrochemical deposition is provided to minimize overburden. A constant plating voltage (and a variable plating current) is applied across a semiconductor structure (e.g., patterned dielectric layer) and a metal electrode, which are both submerged in an electrolyte that contains both suppressor and accelerator molecules. The constant plating voltage is selected such that the suppressor molecules are predominantly active on the flat upper surface of the patterned dielectric layer, and the accelerator molecules are predominantly active within the patterned features of the patterned dielectric layer. As a result, metal is deposited at a relatively high rate within the patterned features, and at a relatively low rate on the flat upper surface areas of the patterned dielectric layer. Consequently, the patterned features are filled with metal before significant overburden can be formed over the flat upper surface areas of the patterned dielectric layer.Type: ApplicationFiled: November 14, 2006Publication date: May 15, 2008Applicant: Tower Semiconductor Ltd.Inventors: David Sarosvetsky, Nina Sezin, Yair Ein-Eli, Mark Kovler