Patents by Inventor Yair Eran
Yair Eran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Process monitoring system and method for processing a large number of sub-micron measurement targets
Patent number: 7587700Abstract: The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets. The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.Type: GrantFiled: April 1, 2004Date of Patent: September 8, 2009Assignee: Applied Materials, Israel, Ltd.Inventors: Youval Nehmadi, Zamir Abraham, Gil Sod-Moriah, Yair Eran, Chen Ofek, Yaron Cohen, Ariel Ben-Porath -
Patent number: 7486814Abstract: A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.Type: GrantFiled: April 10, 2006Date of Patent: February 3, 2009Assignee: Applied Materials, Inc.Inventors: Yair Eran, Gad Greenberg, Ami Sade, Shirley Hemar
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Publication number: 20080092088Abstract: The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets. The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.Type: ApplicationFiled: April 1, 2004Publication date: April 17, 2008Inventors: Youval Nehmadi, Zamir Abraham, Gil Sod-Moriah, Yair Eran, Chen Ofek, Yaron Cohen, Ariel Ben-Porath
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Publication number: 20060251317Abstract: A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.Type: ApplicationFiled: April 10, 2006Publication date: November 9, 2006Applicant: APPLIED MATERIALS, INC.Inventors: Yair Eran, Gad Greenberg, Ami Sade, Shirley Hemar
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Patent number: 7133548Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.Type: GrantFiled: May 8, 2001Date of Patent: November 7, 2006Assignee: Applied Materials, Inc.Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
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Patent number: 7133549Abstract: A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.Type: GrantFiled: December 19, 2002Date of Patent: November 7, 2006Assignee: Applied Materials, Inc.Inventors: Yair Eran, Gad Greenberg, Ami Sade, Shirley Hemar
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Publication number: 20030174876Abstract: A method and apparatus for inspecting a reticle measures line widths using an inspection tool that images the reticle and compares the image with a design database to detect errors in real time. The differences between the line widths of patterns on the reticle and the design database are stored during the inspection procedure. The difference (or “bias”) information is then processed off-line to create a map of all the local line-width deviation values (i.e., bias) of every feature on the reticle. The resultant local bias map can be used as a feedback mechanism to improve the reticle manufacturing process, as a “go/no go” criteria for the validity of the reticle, and as a standard report shipped together with the mask to the wafer fabrication facility, where it can be used as a yield-enhancing tool.Type: ApplicationFiled: December 19, 2002Publication date: September 18, 2003Applicant: APPLIED MATERIALS, INC.Inventors: Yair Eran, Gad Greenberg, Ami Sade, Shirley Hemar
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Patent number: 6360005Abstract: A defect detection system for inspecting objects such as reticles, photomasks, semiconductor wafers, flat panel displays and other patterned objects has two or more stages, whereby the object is examined separately for fine defects, by inspecting a binary level representation of the object, and for ultra fine defects, by inspecting a gray level representation of the object. The system also includes re-inspection apparatus for re-inspection of detected defects, thereby to reduce the false alarm rate, and for classifying the remaining defects by size, area and type.Type: GrantFiled: July 12, 1996Date of Patent: March 19, 2002Assignee: Applied Materials, Inc.Inventors: Meir Aloni, Amir Alon, Yair Eran, Itzhak Katz, Yigal Katzir, Gideon Rosenfeld
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Publication number: 20010019625Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.Type: ApplicationFiled: May 8, 2001Publication date: September 6, 2001Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
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Patent number: 6268093Abstract: A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.Type: GrantFiled: October 13, 1999Date of Patent: July 31, 2001Assignee: Applied Materials, Inc.Inventors: Boaz Kenan, Yair Eran, Avner Karpol, Emanuel Elyasaf, Ehud Tirosh
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Patent number: 6072897Abstract: In a system for real-time inspection of patterns formed on a base, the pattern including surfaces and edges. The system provides for a detector that includes: (i) two input channels for receiving streams of pixels representing the patterns. Each pixel representing the surface and/or edge of the pattern in sub-pixel boundary, (ii) two line width measurement devices being responsive to the streams of pixels for processing in real time the pixels in a manner that corresponds to a predetermined direction in the patterns, so as to measure, in sub-pixel boundary, line width data between two edges. This measurement is effected by executing the following steps: (i) detecting an opening edge, (ii) successively updating line width; and (iii) providing a line width measurement in response to detecting a closing edge.Type: GrantFiled: September 18, 1997Date of Patent: June 6, 2000Assignee: Applied Materials, Inc.Inventors: Gad Greenberg, Yair Eran, Amnon Joseph
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Patent number: 5907628Abstract: A method for comparing first and second digital representations of an image, the method comprising the steps of: for each individual translation from among a plurality of translations from the first digital representation to the second digital representation: for each individual image location from among a plurality of image locations within a comparison entity within the first digital representation, determining a binary legitimacy value of the individual translation for the individual image location by comparing the individual image location to a location in the second digital representation defined by operating the individual translation on the individual image location; and combining the binary legitimacy values of image locations within the comparison entity, thereby to generate a comparison entity legitimacy value determining whether the individual translation is legitimate for the comparison entity; and announcing a defect for the comparison entity if none of the plurality of translations are legitimatType: GrantFiled: August 22, 1996Date of Patent: May 25, 1999Assignee: Orbot Instruments Ltd.Inventors: Joel Yolles, Meir Aloni, Yair Eran, Haim Kaplan
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Patent number: 5892579Abstract: This invention discloses an apparatus for optically inspecting an object having upper and lower faces for indicating the condition of the object, including a lighting system periodically reflecting a beam of light from one face of the object to produce a series of short-duration time-spaced reflected beams, and periodically transmitting a beam of light through both faces of the object to produce a series of short-duration time-spaced transmitted beams time-interlaced with the reflected beams, a sensor sensing the short-duration time-spaced reflected beams and transmitted beams, and generating electrical outputs corresponding thereto, and a processor receiving the electrical outputs and processing them to provide an indication of the condition of the object.A method of optically inspecting an object having upper and lower faces for indicating the condition of the object is also described.Type: GrantFiled: April 16, 1997Date of Patent: April 6, 1999Assignee: Orbot Instruments Ltd.Inventors: Emanuel Elyasaf, Yair Eran
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Patent number: 5619429Abstract: An inspection method including the steps of providing a patterned object to be inspected and compared with a reference, inspecting the patterned object and providing an output of information relating to the visual characteristics of the patterned object, comparing binary level information relating to the visual characteristics of the patterned object to binary level information relating to the visual characteristics of the reference, and comparing gray level information relating to the visual characteristics of the patterned object to gray level information relating to the visual characteristics of the reference.Type: GrantFiled: November 27, 1991Date of Patent: April 8, 1997Assignee: Orbot Instruments Ltd.Inventors: Meir Aloni, Amir Alon, Yair Eran, Itzhak Katz, Yigal Katzir, Gideon Rosenfeld
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Patent number: 5619588Abstract: A method for comparing first and second digital representations of an image, the method comprising the steps of: for each individual translation from among a plurality of translations from the first digital representation to the second digital representation: for each individual image location from among a plurality of image locations within a comparison entity within the first digital representation, determining a binary legitimacy value of the individual translation for the individual image location by comparing the individual image location to a location in the second digital representation defined by operating the individual translation on the individual image location; and combining the binary legitimacy values of image locations within the comparison entity, thereby to generate a comparison entity legitimacy value determining whether the individual translation is legitimate for the comparison entity; and announcing a defect for the comparison entity if none of the plurality of translations are legitimatType: GrantFiled: July 26, 1993Date of Patent: April 8, 1997Assignee: Orbot Instruments Ltd.Inventors: Joel Yolles, Meir Aloni, Yair Eran, Haim Kaplan
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Patent number: 5586058Abstract: The present invention seeks to provide an improved system for inspection of and detection of defects in objects such as reticles, photomasks, semiconductor wafers, flat panel displays and other patterned objects. Preferably, the system has two or more stages, whereby the object is examined separately for fine defects, preferably by inspecting a binary level representation of the object, and for ultra fine defects, preferably by inspecting a gray level representation of the object. The system also preferably includes reinspection apparatus for reinspection of detected defects, thereby to reduce the false alarm rate, and for classifying the remaining defects by size, area and type.Type: GrantFiled: April 21, 1992Date of Patent: December 17, 1996Assignee: Orbot Instruments Ltd.Inventors: Meir Aloni, Amir Alon, Yair Eran, Itzhak Katz, Yigal Katzir, Gideon Rosenfeld