Patents by Inventor Yajnanarayana H. R. Jois

Yajnanarayana H. R. Jois has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5928410
    Abstract: A supported gas separation membrane for separating a particular component from a mixture of gases, a process for its manufacture and the use of the membrane in the separation of gases are provided in which the supported gas separation membrane comprises (a) a porous polymeric support layer and (b) an asymmetric gas separation membrane layer formed from a polyimide having repeating units of the general formula: ##STR1## wherein R is: ##STR2## and x is an integer.
    Type: Grant
    Filed: December 9, 1997
    Date of Patent: July 27, 1999
    Assignee: Texaco Inc.
    Inventors: Yajnanarayana H. R. Jois, John Reale, Jr.
  • Patent number: 5194575
    Abstract: Polyamide compositions containing Reissert units can be formed by the reaction of an open chain bis Reissert compound or a mono Reissert compound with a diamine and a diacid chloride.
    Type: Grant
    Filed: April 22, 1991
    Date of Patent: March 16, 1993
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Harry W. Gibson, Yajnanarayana H. R. Jois
  • Patent number: 5191059
    Abstract: Poly (Reissert compounds) can be formed by reaction of a coupled bis(isoquinoline), e.g., a 4,4' -coupled bis(isoquinoline), a diacid chloride, e.g. adipoyl chloride, and a source of cyanide, e.g., trimethylsilyl cyanide.
    Type: Grant
    Filed: April 15, 1991
    Date of Patent: March 2, 1993
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Harry W. Gibson, Yajnanarayana H. R. Jois
  • Patent number: 5130456
    Abstract: A bis Reissert can be formed by the initial reaction of an aliphatic or aromatic aldehyde (e.g., propionaldehyde) and primary amine (e.g., methylamine) to form a reaction product which is then reacted with a diacid chloride (e.g., adipoyl chloride).
    Type: Grant
    Filed: April 15, 1991
    Date of Patent: July 14, 1992
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Harry W. Gibson, Yajnanarayana H. R. Jois
  • Patent number: 5066773
    Abstract: A poly Ressert can be formed by first reacting benzimidazole with an aliphatic diacid chloride to form bisbenzimidazole and then reacting the bisbenzimidazole with an aliphatic diacid chloride and cyanide to form the poly Reissert.
    Type: Grant
    Filed: October 6, 1989
    Date of Patent: November 19, 1991
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Harry W. Gibson, Yajnanarayana H. R. Jois
  • Patent number: 5041601
    Abstract: A bis Reissert can be formed by the initial reaction of an aromatic dialdehyde (e.g., terephthaldicaboxaldehyde) and primary amine (e.g., methylamine) to form a reaction product which is then reacted with an acid chloride (e.g., benzoyl chloride).
    Type: Grant
    Filed: October 6, 1989
    Date of Patent: August 20, 1991
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Harry W. Gibson, Yajnanarayana H. R. Jois
  • Patent number: 5021583
    Abstract: A Reissert compound of bisbenzimidazole can be formed by first reacting benzimidazole with an aliphatic diacid chloride to form bisbenzimidazole and then reacting the bisbenzimidazole with an aliphatic acid chloride and cyanide to form the Reissert compound thereof.
    Type: Grant
    Filed: September 21, 1990
    Date of Patent: June 4, 1991
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Harry V. Gibson, Yajnanarayana H. R. Jois
  • Patent number: 5001239
    Abstract: The Reissert compound of 1-benzoylbenzimidazole can be formed by reaction of an acid chloride (e.g., benzoyl chloride) and cyanide (e.g., trimethylsilyl cyanide) with benzoyl benzimidazole. It has the formula: ##STR1## and is useful as an intermediate in organic synthesis.
    Type: Grant
    Filed: October 6, 1989
    Date of Patent: March 19, 1991
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Harry W. Gibson, Yajnanarayana H. R. Jois
  • Patent number: 4996346
    Abstract: Bis Reissert compounds can be formed by reaction of a cyanohydrin, formed by reaction of an aldehyde and a diamine, with benzoyl chloride in the presence of an amine acid acceptor.
    Type: Grant
    Filed: October 6, 1989
    Date of Patent: February 26, 1991
    Assignee: Virginia Tech Intellectual Properties, Inc.
    Inventors: Harry W. Gibson, Yajnanarayana H. R. Jois
  • Patent number: 4977271
    Abstract: A Reissert compound of bisbenzimidazole can be formed by first reacting benzimidazole with an aliphatic diacid chloride to form bisbenzimidazole and then reacting the bisbenzimidazole with an aliphatic acid chloride and cyanide to form the Reissert compound thereof.
    Type: Grant
    Filed: October 6, 1989
    Date of Patent: December 11, 1990
    Assignee: Virginia Tech Intellectual Properties Inc.
    Inventors: Harry W. Gibson, Yajnanarayana H. R. Jois
  • Patent number: 4929713
    Abstract: An open chain poly Reissert can be formed by the initial reaction of an aromatic dialdehyde (e.g., terephthaldicaboxaldehyde) and primary amine (e.g., methylamine) to form a reaction product which is then reacted with an aliphatic acid chloride (e.g., adipoyl chloride).
    Type: Grant
    Filed: October 6, 1989
    Date of Patent: May 29, 1990
    Assignee: Virginia Polytechnic Institute and State University
    Inventors: Harry W. Gibson, Yajnanarayana H. R. Jois