Patents by Inventor Yakov Weinberg
Yakov Weinberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230045580Abstract: The present invention relates to a stereo eye tracking technique. The eye tracking device comprises a processing unit configured and operable for receiving at least one image being indicative of a user's eye; identifying in the image a first data being indicative of pupil's parameters; receiving a second data being indicative of an alternative eye tracking, wherein the second data is more accurate than the first data; and correlating between the first and second data and determining a three-dimensional position and gaze direction of the user's eye.Type: ApplicationFiled: January 6, 2021Publication date: February 9, 2023Inventors: Yakov WEINBERG, Alexandr LOGVINENKO, Jacob KAGAN, Uri KOROGODSKY, Albert KASHCHENEVSKY, Elad EIZNER, Boris GREENBERG
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Publication number: 20220100268Abstract: The presently disclosed subject matter relates to an eye tracking method and device. The method can include receiving image data indicative of at least two images of a user's eye, identifying, in each image, regions related to the eye limbus; determining geometrical representation of the limbus structure, and determining a three-dimensional position and gaze direction of the user's eye (i.e. full six degrees of freedom of the eye) by triangulation of the geometrical representation of the limbus structure of at least two images.Type: ApplicationFiled: January 27, 2020Publication date: March 31, 2022Inventors: Yakov WEINBERG, Albert KASHCHENEVSKY, Erez YEHEZKEL, Uri KOROGODSKY, Igor TOKHONENKOV, Jacob KAGAN
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Patent number: 10354376Abstract: A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.Type: GrantFiled: March 12, 2018Date of Patent: July 16, 2019Assignee: APPLIED MATERIALS ISRAEL LTD.Inventors: Yakov Weinberg, Ishai Schwarzband, Roman Kris, Itay Zauer, Ran Goldman, Olga Novak, Dhananjay Singh Rathore, Ofer Adan, Shimon Levi
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Publication number: 20180268539Abstract: A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.Type: ApplicationFiled: March 12, 2018Publication date: September 20, 2018Inventors: Yakov WEINBERG, Ishai SCHWARZBAND, Roman KRIS, Itay ZAUER, Ran GOLDMAN, Olga NOVAK, Dhananjay Singh RATHORE, Ofer ADAN, Shimon LEVI
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Patent number: 9916652Abstract: A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.Type: GrantFiled: December 26, 2016Date of Patent: March 13, 2018Assignee: Applied Materials Israel Ltd.Inventors: Yakov Weinberg, Ishai Schwarzband, Roman Kris, Itay Zauer, Ran Goldman, Olga Novak, Dhananjay Singh Rathore, Ofer Adan, Shimon Levi
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Patent number: 9824852Abstract: A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.Type: GrantFiled: December 31, 2015Date of Patent: November 21, 2017Assignee: Applied Materials Israel LtdInventors: Roman Kris, Yakov Weinberg, Yan Ivanchenko, Ishai Schwarzband, Dan Lange, Arbel Englander, Efrat Noifeld, Ran Goldman, Ori Shoval
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Publication number: 20170243343Abstract: A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.Type: ApplicationFiled: December 26, 2016Publication date: August 24, 2017Inventors: Yakov WEINBERG, Ishai SCHWARZBAND, Roman KRIS, Itay ZAUER, Ran GOLDMAN, Olga NOVAK, Dhananjay Singh RATHORE, Ofer ADAN, Shimon LEVI
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Publication number: 20170194125Abstract: A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.Type: ApplicationFiled: December 31, 2015Publication date: July 6, 2017Inventors: Roman KRIS, Yakov WEINBERG, Yan IVANCHENKO, Ishai SCHWARZBAND, Dan LANGE, Arbel ENGLANDER, Efrat NOIFELD, Ran GOLDMAN, Ori SHOVAL
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Patent number: 9674536Abstract: A technique for visualizing elements in images by applying a color coding procedure to data which comprises an initial image and segmentation results based on N labels. The segmentation results comprise information on segmentation uncertainty. The color coding procedure constructs a resulting colored image based on the initial image and N pre-selected base colors, and in such a manner that colors in the resulting colored image are modified by using intensity of the initial image and the information on segmentation uncertainty.Type: GrantFiled: November 10, 2015Date of Patent: June 6, 2017Assignee: Applied Materials Israel, Ltd.Inventors: Yakov Weinberg, Hagai Kirshner, Ishai Schwarzband
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Publication number: 20170134735Abstract: A technique for visualizing elements in images by applying a color coding procedure to data which comprises an initial image and segmentation results based on N labels. The segmentation results comprise information on segmentation uncertainty. The color coding procedure constructs a resulting colored image based on the initial image and N pre-selected base colors, and in such a manner that colors in the resulting colored image are modified by using intensity of the initial image and the information on segmentation uncertainty.Type: ApplicationFiled: November 10, 2015Publication date: May 11, 2017Inventors: Yakov WEINBERG, Hagai KIRSHNER, Ishai SCHWARZBAND
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Publication number: 20170018066Abstract: A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.Type: ApplicationFiled: July 13, 2015Publication date: January 19, 2017Inventors: Yakov WEINBERG, Ishai SCHWARZBAND, Roman KRIS, Itay ZAUER, Ran GOLDMAN, Olga NOVAK, Dhananjay Singh RATHORE, Ofer ADAN, Shimon LEVI
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Patent number: 9530199Abstract: A method for determining overlay between layers of a multilayer structure may include obtaining a given image representing the multilayer structure, obtaining expected images for layers of the multilayer structure, providing a combined expected image of the multilayer structure as a combination of the expected images of said layers, performing registration of the given image against the combined expected image, and providing segmentation of the given image, thereby producing a segmented image, and maps of the layers of said multilayered structure. The method may further include determining overlay between any two selected layers of the multilayer structure by processing the maps of the two selected layers together with the expected images of said two selected layers.Type: GrantFiled: July 13, 2015Date of Patent: December 27, 2016Assignee: Applied Materials Israel LtdInventors: Yakov Weinberg, Ishai Schwarzband, Roman Kris, Itay Zauer, Ran Goldman, Olga Novak, Dhananjay Singh Rathore, Ofer Adan, Shimon Levi
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Patent number: 9378923Abstract: A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.Type: GrantFiled: January 30, 2015Date of Patent: June 28, 2016Assignee: Applied Materials Israel, Ltd.Inventors: Ishai Schwarzband, Yakov Weinberg
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Publication number: 20150136960Abstract: A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.Type: ApplicationFiled: January 30, 2015Publication date: May 21, 2015Inventors: Ishai Schwarzband, Yakov Weinberg
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Patent number: 8946627Abstract: A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.Type: GrantFiled: November 15, 2013Date of Patent: February 3, 2015Assignee: Applied Materials Israel, Ltd.Inventors: Ishai Schwarzband, Yakov Weinberg
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Publication number: 20140074419Abstract: A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.Type: ApplicationFiled: November 15, 2013Publication date: March 13, 2014Applicant: Applied Materials Israel, Ltd.Inventors: Ishai Schwarzband, Yakov Weinberg
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Patent number: 8604427Abstract: A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.Type: GrantFiled: February 2, 2012Date of Patent: December 10, 2013Assignee: Applied Materials Israel, Ltd.Inventors: Ishai Schwarzband, Yakov Weinberg
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Publication number: 20130200255Abstract: A method includes irradiating a surface of a sample, which is made-up of multiple types of materials, with a beam of primary electrons. Emitted electrons emitted from the irradiated sample are detected using multiple detectors that are positioned at respective different positions relative to the sample, so as to produce respective detector outputs. Calibration factors are computed to compensate for variations in emitted electron yield among the types of the materials, by identifying, for each material type, one or more horizontal regions on the surface that are made-up of the material type, and computing a calibration factor for the material type based on at least one of the detector outputs at the identified horizontal regions. The calibration factors are applied to the detector outputs. A three-dimensional topographical model of the surface is calculated based on the detector outputs to which the calibration factors are applied.Type: ApplicationFiled: February 2, 2012Publication date: August 8, 2013Applicant: Applied Materials Israel, Ltd.Inventors: Ishai Schwarzband, Yakov Weinberg