Abstract: In one embodiment, a plasma etching system may include a process gas source, a plasma processing chamber, and a gas supply conduit. A plasma can be formed from a process gas recipe in the plasma processing chamber. The gas supply conduit may include a corrosion resistant layered structure forming an inner recipe contacting surface and an outer environment contacting surface. The corrosion resistant layered structure may include a protective silicon layer, a passivated coupling layer and a stainless steel layer. The inner recipe contacting surface can be formed by the protective silicon layer. The passivated coupling layer can be disposed between the protective silicon layer and the stainless steel layer. The passivated coupling layer can include chrome oxide and iron oxide. The chrome oxide can be more abundant in the passivated coupling layer than the iron oxide.

Abstract: A circuit protection device is provided and includes a first insulation layer, a second insulation layer, a thermal fuse, a diode, a first exterior electrode pad, a second exterior electrode pad, and a third exterior electrode pad. The second insulation layer is positioned above a top surface of the first insulation layer. The thermal fuse is packaged in the first insulation layer and having a first electrode end and a second electrode end positioned opposite to the first electrode end. The diode is packaged in the second insulation layer and having a first electrode surface and a second electrode surface positioned opposite to the first electrode surface. The first exterior electrode pad is positioned on a bottom surface of the first insulation layer and electrically connected to the first electrode surface and the first electrode end.

Abstract: A method of wet cleaning an aluminum part having bare aluminum surfaces and anodized aluminum surfaces. The method includes CO2 dry ice blasting the surfaces of the aluminum part at approximately 35 to approximately 45 psi, masking the aluminum part to conceal the bare aluminum surfaces, soaking the dry ice blasted and masked aluminum part in deionized water at or above approximately 60° C., scrubbing the aluminum part with an abrasive pad and deionized water after completion of the soaking in deionized water, and repeating the soaking and scrubbing in the recited order at least three additional times.

Abstract: A circuit protection device is provided and includes a first insulation layer, a second insulation layer, a thermal fuse, a diode, a first exterior electrode pad, a second exterior electrode pad, and a third exterior electrode pad. The second insulation layer is positioned above a top surface of the first insulation layer. The thermal fuse is packaged in the first insulation layer and having a first electrode end and a second electrode end positioned opposite to the first electrode end. The diode is packaged in the second insulation layer and having a first electrode surface and a second electrode surface positioned opposite to the first electrode surface. The first exterior electrode pad is positioned on a bottom surface of the first insulation layer and electrically connected to the first electrode surface and the first electrode end.

Abstract: CRISPR-Cas genome editing uses a guide RNA, which includes both a complementarity region, which binds the target DNA by base-pairing, and a Cas9-binding region, to direct a Cas9 nuclease to a target DNA. Further disclosed are methods for increasing specificity of RNA-guided genome editing using CRISPR/Cas9 systems by using truncated guide RNAs (tru-gRNAs).

Abstract: A method of removing an epoxy band from an electrostatic chuck includes securing the electrostatic chuck in a servicing fixture, applying a thermal source to the epoxy band to breakdown a plurality of adhesive bonds securing the epoxy band to the electrostatic chuck, forming a hole in the epoxy band and pulling the epoxy band from the electrostatic chuck. A system for removing an epoxy band from an electrostatic chuck is also described.

Abstract: The present invention provides a reliable, non-invasive, electrical test method for predicting satisfactory performance of electrostatic chucks (ESCs). In accordance with an aspect of the present invention, a parameter, e.g., impedance, of an ESC is measured over a frequency band to generate a parameter functions. This parameter function may be used to establish predetermined acceptable limits of the parameter within the frequency band.

Abstract: This invention involves two fields of photoelectron information materials and pharmaceuticals, especially refers to the self-assembly of conducting photoluminescence nanomedicine crystals and thin films and their preparation processes. In the invention, self-assembling unitary, binary, ternary and quaternary complexes of an antioxidase antioxidant, an agonist of the ?-adrenergic receptors, an agonist of the P2-purinergic receptors and an antagonist of benzalkonium-typed calcium channels is to employ an interaction of inelastic electron tunneling, which possesses photoelectron properties of inelastic electron tunneling and photoluminescence with the central wavelength ˜500 nm and the wavelength wide ˜200 nm in the size-controlled square or cubic geometrical complexes. The invention is not only beneficial for drug discovery targeted disease mechanisms, but also profitable for inventions of photoelectron sensing new materials.

Abstract: A method of wet cleaning an aluminum part having bare aluminum surfaces and anodized aluminum surfaces. The method includes CO2 dry ice blasting the surfaces of the aluminum part at approximately 35 to approximately 45 psi, masking the aluminum part to conceal the bare aluminum surfaces, soaking the dry ice blasted and masked aluminum part in deionized water at or above approximately 60° C., scrubbing the aluminum part with an abrasive pad and deionized water after completion of the soaking in deionized water, and repeating the soaking and scrubbing in the recited order at least three additional times.

Abstract: A tungsten carbide coated chamber component of semiconductor processing equipment includes a metal surface, optional intermediate nickel coating, and outer tungsten carbide coating. The component is manufactured by optionally depositing a nickel coating on a metal surface of the component and depositing a tungsten carbide coating on the metal surface or nickel coating to form an outermost surface.

Abstract: A method of removing an epoxy band from an electrostatic chuck includes securing the electrostatic chuck in a servicing fixture, applying a thermal source to the epoxy band to breakdown a plurality of adhesive bonds securing the epoxy band to the electrostatic chuck, forming a hole in the epoxy band and pulling the epoxy band from the electrostatic chuck. A system for removing an epoxy band from an electrostatic chuck is also described.

Abstract: A bi-stable quantum wire array of self-assembled nano-medicine and its process present in the invention. The bi-stable quantum wire array with quantum bit and kondo effect is prepared by self-assembling an oxygen radical antagonist of antioxidase, a ?-receptor agonist, a P2 receptor agonist, a calcium antagonist of phenyl alkyl amines, and/or a nucleotide monomer of purines and its binary, ternary, quaternary or quinary compounds and using the interaction of inelastic electron tunneling. The invention not only benefits mechanisms-targeted multifunctional device discoveries, but also profits inventions of nanometer structures, novel materials, quantum calculation devices, biosensors and quantum bit magnetic random access memories (MRAM).

Abstract: A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following removal of the surface from the DSP solution; soaking the surface in a dilute nitric acid (HNO3) solution; spray rinsing the surface with water following removal of the surface from the dilute nitric acid solution; and repeating at least twice the steps of soaking the surface in dilute nitric acid followed by spray rinsing the surface.

Abstract: A demolding mechanism for demolding a molded article with internal thread is provided. The demolding mechanism includes an outer sleeve and a core. The sleeve includes a number of spring legs and a body. Each spring leg has an external thread. The core includes an end portion and a cylindrical shank. The end portion includes a central portion and a number of evenly spaced ribs. The diameter of the core is smaller than that of the sleeve. The sleeve is slidable along the core. When the spring legs move away and disengage from the ribs, the spring legs are configured to deflect inwardly, thereby enabling the external thread thereof to disengage from the inner thread of the molded article.

Abstract: In one embodiment, a plasma processing device may include a plasma processing chamber, a plasma region, an energy source, and a corrosion resistant component. The plasma processing chamber can be maintained at a vacuum pressure and can confine a plasma processing gas. The energy source can transmit energy into the plasma processing chamber and transform at least a portion of the plasma processing gas into plasma within the plasma region. The corrosion resistant component can be located within the plasma processing chamber. The corrosion resistant component can be exposed to the plasma processing gas and is not coincident with the plasma region. The corrosion resistant component may include an inner layer of stainless steel that is coated with an outer layer of Tantalum (Ta).

Abstract: A method of cleaning a surface of a component of a plasma chamber, wherein the component has an aluminum or anodized aluminum surface, the method including the steps of: soaking the surface of the component in a diluted sulfuric peroxide (DSP) solution; spray rinsing the surface with water following removal of the surface from the DSP solution; soaking the surface in a dilute nitric acid (HNO3) solution; spray rinsing the surface with water following removal of the surface from the dilute nitric acid solution; and repeating at least twice the steps of soaking the surface in dilute nitric acid followed by spray rinsing the surface.

Abstract: In one embodiment, a plasma etching system may include a process gas source, a plasma processing chamber, and a gas supply conduit. A plasma can be formed from a process gas recipe in the plasma processing chamber. The gas supply conduit may include a corrosion resistant layered structure forming an inner recipe contacting surface and an outer environment contacting surface. The corrosion resistant layered structure may include a protective silicon layer, a passivated coupling layer and a stainless steel layer. The inner recipe contacting surface can be formed by the protective silicon layer. The passivated coupling layer can be disposed between the protective silicon layer and the stainless steel layer. The passivated coupling layer can include chrome oxide and iron oxide. The chrome oxide can be more abundant in the passivated coupling layer than the iron oxide.

Abstract: A self-directed and self-assembled nanomedicine of quantized conductive junction and its preparation process are introduced. In the present disclosure, bio-organic medicine proteins are prepared into a quantized conductive junction with a nanostructure quantum dot and a polymer monolayer on an inorganic silicon surface by seven cooperative modes; and the preparation process of this inorganic-organic-biological hetero-polymer nano-structure component with free radical electrons, aromatic hetercycle structures, bio-fluorescence, and redox bioactivity is consist of making unitary, binary, ternary, and/or quaternary liquid biochemical medicines ingredients of an antioxidase antioxidant, a ?-adrenergic receptor agonist, a P2-purinergic receptor agonist, and/or a phenylalkylamine calcium channel blocker into a solid state quantized conductance junctions using L16(2)15 and L9(3)4 orthogonal protocol.

Abstract: Preparation of oxidation-reduction (redox) nano-medicine quantum dot room temperature superconductor quantum bit (qubit) networks includes processes of making unitary, binary, ternary, an d/or quaternary liquid pharmaceutical ingredients of an antioxidase antioxidant, a ?-adrenergic receptor agonist, a P2-purinergic receptor agonist, and/or a phenylalkylamine calcium channel blocker in combination with either 1:20 xanthine oxidase (XO):xanthine (X) or X alone in a liquid phase by using the L16(2)15 and L9(3)4 orthogonal optimization design protocols and modulating spatial distance constraint from about 0.1 ? to about 200 ? as well as a 10 class clean bottom-up self-assembly approach.

Abstract: In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of reciprocating electrode supports. The multi-component electrode is positioned in the electrode accommodating aperture of the carrier frame. The backing plate of the electrode comprises a plurality of mounting recesses formed about its periphery. The reciprocating electrode supports can be reciprocated into and out of the mounting recesses. Additional embodiments of broader and narrower scope are contemplated.